DE60142054D1 - Verfahren und zusammensetzung zur entfernung von natrium enthaltendem material von mikroschaltungssubstraten - Google Patents

Verfahren und zusammensetzung zur entfernung von natrium enthaltendem material von mikroschaltungssubstraten

Info

Publication number
DE60142054D1
DE60142054D1 DE60142054T DE60142054T DE60142054D1 DE 60142054 D1 DE60142054 D1 DE 60142054D1 DE 60142054 T DE60142054 T DE 60142054T DE 60142054 T DE60142054 T DE 60142054T DE 60142054 D1 DE60142054 D1 DE 60142054D1
Authority
DE
Germany
Prior art keywords
composition
microscopy
substrates
containing material
removing sodium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60142054T
Other languages
German (de)
English (en)
Inventor
George Schwartzkopf
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Avantor Performance Materials LLC
Original Assignee
Mallinckrodt Baker Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mallinckrodt Baker Inc filed Critical Mallinckrodt Baker Inc
Application granted granted Critical
Publication of DE60142054D1 publication Critical patent/DE60142054D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3245—Aminoacids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/265—Carboxylic acids or salts thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5009—Organic solvents containing phosphorus, sulfur or silicon, e.g. dimethylsulfoxide
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5013—Organic solvents containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/24—Hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/34—Organic compounds containing sulfur
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31127—Etching organic layers
    • H01L21/31133—Etching organic layers by chemical means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE60142054T 2000-03-20 2001-03-19 Verfahren und zusammensetzung zur entfernung von natrium enthaltendem material von mikroschaltungssubstraten Expired - Lifetime DE60142054D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US19007100P 2000-03-20 2000-03-20
PCT/US2001/008772 WO2001071429A1 (en) 2000-03-20 2001-03-19 Method and composition for removing sodium-containing material from microcircuit substrates

Publications (1)

Publication Number Publication Date
DE60142054D1 true DE60142054D1 (de) 2010-06-17

Family

ID=22699906

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60142054T Expired - Lifetime DE60142054D1 (de) 2000-03-20 2001-03-19 Verfahren und zusammensetzung zur entfernung von natrium enthaltendem material von mikroschaltungssubstraten

Country Status (15)

Country Link
EP (1) EP1307786B1 (enExample)
JP (1) JP4671575B2 (enExample)
KR (1) KR100876067B1 (enExample)
CN (1) CN1230718C (enExample)
AT (1) ATE467154T1 (enExample)
AU (1) AU2001245861A1 (enExample)
CA (1) CA2403730C (enExample)
DE (1) DE60142054D1 (enExample)
ES (1) ES2345872T3 (enExample)
IL (2) IL151792A0 (enExample)
MY (1) MY129673A (enExample)
NZ (1) NZ522079A (enExample)
PL (1) PL195792B1 (enExample)
TW (1) TWI239435B (enExample)
WO (1) WO2001071429A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6326130B1 (en) 1993-10-07 2001-12-04 Mallinckrodt Baker, Inc. Photoresist strippers containing reducing agents to reduce metal corrosion
PL207297B1 (pl) * 2002-06-07 2010-11-30 Mallinckrodt Baker Inc Bezkrzemianowa kompozycja czyszcząca i zastosowanie bezkrzemianowej kompozycji czyszczącej
AU2003257636A1 (en) 2002-08-22 2004-03-11 Daikin Industries, Ltd. Removing solution
JP4005092B2 (ja) * 2004-08-20 2007-11-07 東京応化工業株式会社 洗浄除去用溶剤

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5417802A (en) 1994-03-18 1995-05-23 At&T Corp. Integrated circuit manufacturing
JPH10171130A (ja) * 1996-12-10 1998-06-26 Fuji Film Oorin Kk フォトレジスト剥離液
ATE436043T1 (de) 1998-05-18 2009-07-15 Mallinckrodt Baker Inc Alkalische, silikat enthaltende reinigungslösungen für mikroelektronische substrate

Also Published As

Publication number Publication date
CN1230718C (zh) 2005-12-07
KR100876067B1 (ko) 2008-12-26
EP1307786A1 (en) 2003-05-07
PL357383A1 (en) 2004-07-26
JP2003528353A (ja) 2003-09-24
CN1418330A (zh) 2003-05-14
PL195792B1 (pl) 2007-10-31
AU2001245861A1 (en) 2001-10-03
EP1307786B1 (en) 2010-05-05
JP4671575B2 (ja) 2011-04-20
IL151792A0 (en) 2003-04-10
MY129673A (en) 2007-04-30
CA2403730C (en) 2009-09-08
IL151792A (en) 2006-07-05
KR20030051416A (ko) 2003-06-25
NZ522079A (en) 2004-06-25
ATE467154T1 (de) 2010-05-15
ES2345872T3 (es) 2010-10-05
WO2001071429A1 (en) 2001-09-27
CA2403730A1 (en) 2001-09-27
TWI239435B (en) 2005-09-11

Similar Documents

Publication Publication Date Title
MY117049A (en) Composition for stripping photoresist and organic materials from substrate surfaces
DE60045416D1 (de) Verfahren zur behandlung von mikroelektroniksubstraten
DE69928916D1 (de) Prozess zur entfernung von organischem material
DE60028962D1 (de) Zusammensetzungen zur reinigung und entfernung von organischen sowie plasmaätzrückständen auf halbleitervorrichtungen
DE60216447D1 (de) Vorrichtung und verfahren zur bearbeitung biologischer proben
DE60128501D1 (de) Zusammensetzung zur Entschichtung von Photoresist
DE60042184D1 (de) Verfahren und Zusammensetzung zur Entschichtung von Photoresist
DE60045636D1 (de) Verfahren zur behandlung eines halbleitersubstrats
DE59806929D1 (de) Verfahren zur Behandlung von Oberflächen von Substraten aus Kunststoff
DE60117977D1 (de) Vorrichtungen zur behandlung von harninkontinenz
ATE203545T1 (de) Substrate und inhibitoren von proteolytischen enzymen
DE60232071D1 (de) Verfahren zur bindung von acma-typ protein anker fusionen an mikroorganismen zellwandmaterialien
DE50209503D1 (de) Verfahren zur extraktion und analyse von inhaltsstoffen aus organischem material
ATE471366T1 (de) Mittel zur entfernung von wasser aus einem substrat, verfahren zur wasserentfernung und trocknungsverfahren damit
EP1443820A4 (en) COMPOSITION AND METHOD FOR TREATING REACTION OF GRAFT AGAINST HOST
DE69934326D1 (de) Verfahren zur entfernung organischen materials von trägern
DE69306843D1 (de) Verfahren zur Entfernung von Siloxan; gelöst in dem bei der Herstellung von Trimethoxysilan aus Methanol und Silizium verwendetem Lösungsmittel
DE60142054D1 (de) Verfahren und zusammensetzung zur entfernung von natrium enthaltendem material von mikroschaltungssubstraten
ATE111003T1 (de) Verfahren zur entfernung von beschichtungen empfindlicher substrate und werfmedia dazu.
DE60207229D1 (de) Verfahren zur verminderung von schlechten gerüchen in hydrotropen zusammensetzungen
ATE441626T1 (de) Azeotropähnliche zusammensetzungen und deren verwendung
DE60044609D1 (de) Keramisches produkt zur verwendung im wasser und ein verfahren zur entfernung von schmutzablagerungen von diesem produkt
DE69918708D1 (de) Verfahren zum fixieren von bio-molekülen an eine probestelle
ATE436041T1 (de) Unter biokompatiblen bedingungen verarbeitbare fotoresists zur erzeugung von biomolekül-mustern
ATE245431T1 (de) Verfahren zur lösungsmittelextraktion von aktiven verbindungen aus zichorie

Legal Events

Date Code Title Description
8364 No opposition during term of opposition