ATE467154T1 - Verfahren und zusammensetzung zur entfernung von natrium enthaltendem material von mikroschaltungssubstraten - Google Patents

Verfahren und zusammensetzung zur entfernung von natrium enthaltendem material von mikroschaltungssubstraten

Info

Publication number
ATE467154T1
ATE467154T1 AT01918830T AT01918830T ATE467154T1 AT E467154 T1 ATE467154 T1 AT E467154T1 AT 01918830 T AT01918830 T AT 01918830T AT 01918830 T AT01918830 T AT 01918830T AT E467154 T1 ATE467154 T1 AT E467154T1
Authority
AT
Austria
Prior art keywords
composition
removal
containing material
sodium containing
microcircuit
Prior art date
Application number
AT01918830T
Other languages
English (en)
Inventor
George Schwartzkopf
Original Assignee
Mallinckrodt Baker Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mallinckrodt Baker Inc filed Critical Mallinckrodt Baker Inc
Application granted granted Critical
Publication of ATE467154T1 publication Critical patent/ATE467154T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3245—Aminoacids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/265—Carboxylic acids or salts thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5009—Organic solvents containing phosphorus, sulfur or silicon, e.g. dimethylsulfoxide
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5013—Organic solvents containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/24—Hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/34—Organic compounds containing sulfur
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
    • H10P50/286—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of organic materials
    • H10P50/287—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of organic materials by chemical means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
AT01918830T 2000-03-20 2001-03-19 Verfahren und zusammensetzung zur entfernung von natrium enthaltendem material von mikroschaltungssubstraten ATE467154T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US19007100P 2000-03-20 2000-03-20
PCT/US2001/008772 WO2001071429A1 (en) 2000-03-20 2001-03-19 Method and composition for removing sodium-containing material from microcircuit substrates

Publications (1)

Publication Number Publication Date
ATE467154T1 true ATE467154T1 (de) 2010-05-15

Family

ID=22699906

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01918830T ATE467154T1 (de) 2000-03-20 2001-03-19 Verfahren und zusammensetzung zur entfernung von natrium enthaltendem material von mikroschaltungssubstraten

Country Status (15)

Country Link
EP (1) EP1307786B1 (de)
JP (1) JP4671575B2 (de)
KR (1) KR100876067B1 (de)
CN (1) CN1230718C (de)
AT (1) ATE467154T1 (de)
AU (1) AU2001245861A1 (de)
CA (1) CA2403730C (de)
DE (1) DE60142054D1 (de)
ES (1) ES2345872T3 (de)
IL (2) IL151792A0 (de)
MY (1) MY129673A (de)
NZ (1) NZ522079A (de)
PL (1) PL195792B1 (de)
TW (1) TWI239435B (de)
WO (1) WO2001071429A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6326130B1 (en) 1993-10-07 2001-12-04 Mallinckrodt Baker, Inc. Photoresist strippers containing reducing agents to reduce metal corrosion
KR100958068B1 (ko) * 2002-06-07 2010-05-14 말린크로트 베이커, 인코포레이티드 마이크로일렉트로닉 세정 및 반사방지 코팅 제거제 조성물
EP1536291A4 (de) 2002-08-22 2008-08-06 Daikin Ind Ltd Entfernungslösung
JP4005092B2 (ja) * 2004-08-20 2007-11-07 東京応化工業株式会社 洗浄除去用溶剤

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5417802A (en) 1994-03-18 1995-05-23 At&T Corp. Integrated circuit manufacturing
JPH10171130A (ja) * 1996-12-10 1998-06-26 Fuji Film Oorin Kk フォトレジスト剥離液
ES2328309T3 (es) 1998-05-18 2009-11-11 Mallinckrodt Baker, Inc. Composiciones alcalinas que contienen silicato para limpiar sustratos microelectronicos.

Also Published As

Publication number Publication date
KR100876067B1 (ko) 2008-12-26
TWI239435B (en) 2005-09-11
CN1230718C (zh) 2005-12-07
CN1418330A (zh) 2003-05-14
JP2003528353A (ja) 2003-09-24
IL151792A0 (en) 2003-04-10
ES2345872T3 (es) 2010-10-05
PL195792B1 (pl) 2007-10-31
KR20030051416A (ko) 2003-06-25
MY129673A (en) 2007-04-30
DE60142054D1 (de) 2010-06-17
AU2001245861A1 (en) 2001-10-03
NZ522079A (en) 2004-06-25
CA2403730A1 (en) 2001-09-27
PL357383A1 (pl) 2004-07-26
EP1307786B1 (de) 2010-05-05
CA2403730C (en) 2009-09-08
JP4671575B2 (ja) 2011-04-20
WO2001071429A1 (en) 2001-09-27
EP1307786A1 (de) 2003-05-07
IL151792A (en) 2006-07-05

Similar Documents

Publication Publication Date Title
DE60045416D1 (de) Verfahren zur behandlung von mikroelektroniksubstraten
ATE438704T1 (de) Fluoridhaltige saure zusammensetzung zur entfernung von photolack- und ätzrückständen
DE60030877D1 (de) Nichtkorrosive reinigungszusammensetzung zur entfernung von plasmaätzrückständen
DE3679565D1 (de) Verfahren zur entfernung von fotoresist- und stripperresten von halbleitersubstraten.
DE60028962D1 (de) Zusammensetzungen zur reinigung und entfernung von organischen sowie plasmaätzrückständen auf halbleitervorrichtungen
DE69529705T2 (de) Verfahren und Lösung zur Reinigung eines Substrats von einer Metallkontamination
DE60045636D1 (de) Verfahren zur behandlung eines halbleitersubstrats
DE59806929D1 (de) Verfahren zur Behandlung von Oberflächen von Substraten aus Kunststoff
DE69812869D1 (de) Verfahren zur Substratbearbeitung
DE602004030121D1 (de) Reinigungsmittel, verfahren zur reinigung von halbleitersubstrat sowie verfahren zur ausbildung der leitungsbahnen auf halbleitersubstrat
DE69816070D1 (de) Verfahren zur Behandlung von Schredderstaub
DE60005013D1 (de) Verfahren zur wiedergewinnung von verbrauchten alkanolaminlösungen
DE69705838D1 (de) Substrate und inhibitoren von proteolytischen enzymen
EP1443820A4 (de) Zusammensetzung und verfahren zur behandlung der transplantat-wirt-reaktion
DE69306843D1 (de) Verfahren zur Entfernung von Siloxan; gelöst in dem bei der Herstellung von Trimethoxysilan aus Methanol und Silizium verwendetem Lösungsmittel
ATE347454T1 (de) Verfahren zur entfernung organischen materials von trägern
DE69012319D1 (de) Verfahren zur entfernung von beschichtungen empfindlicher substrate und werfmedia dazu.
DE60142054D1 (de) Verfahren und zusammensetzung zur entfernung von natrium enthaltendem material von mikroschaltungssubstraten
DE69610532D1 (de) Verfahren zur Entfernung von Quecksilber aus Böden
DE60207229D1 (de) Verfahren zur verminderung von schlechten gerüchen in hydrotropen zusammensetzungen
ATE108768T1 (de) Verfahren zur entfernung von schwefel aus organischen sulfiden.
DE60044609D1 (de) Keramisches produkt zur verwendung im wasser und ein verfahren zur entfernung von schmutzablagerungen von diesem produkt
DE60040252D1 (de) Verfahren zur Entfernung von Rückständen nach Photoresistveraschung
ATE245431T1 (de) Verfahren zur lösungsmittelextraktion von aktiven verbindungen aus zichorie
DE69806664D1 (de) Entlackungsmittel-Zusammensetzung

Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification

Ref document number: 1307786

Country of ref document: EP