DE60134753D1 - Herstellungsverfahren für CMOS-Halbleiter-Bauelemente mit wählbaren Gatedicken - Google Patents

Herstellungsverfahren für CMOS-Halbleiter-Bauelemente mit wählbaren Gatedicken

Info

Publication number
DE60134753D1
DE60134753D1 DE60134753T DE60134753T DE60134753D1 DE 60134753 D1 DE60134753 D1 DE 60134753D1 DE 60134753 T DE60134753 T DE 60134753T DE 60134753 T DE60134753 T DE 60134753T DE 60134753 D1 DE60134753 D1 DE 60134753D1
Authority
DE
Germany
Prior art keywords
layer
manufacturing process
semiconductor devices
cmos semiconductor
disposable parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60134753T
Other languages
English (en)
Inventor
Malgorzata Jurczak
Emmanuel Augendre
Rita Rooyackers
Goncal Badenes
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Interuniversitair Microelektronica Centrum vzw IMEC
Original Assignee
Interuniversitair Microelektronica Centrum vzw IMEC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Interuniversitair Microelektronica Centrum vzw IMEC filed Critical Interuniversitair Microelektronica Centrum vzw IMEC
Application granted granted Critical
Publication of DE60134753D1 publication Critical patent/DE60134753D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
    • H01L21/8232—Field-effect technology
    • H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
    • H01L21/8238—Complementary field-effect transistors, e.g. CMOS
    • H01L21/823828—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of the gate conductors, e.g. particular materials, shapes
    • H01L21/82385—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of the gate conductors, e.g. particular materials, shapes gate conductors with different shapes, lengths or dimensions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H01L21/3215—Doping the layers
    • H01L21/32155—Doping polycristalline - or amorphous silicon layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
DE60134753T 2001-11-26 2001-11-26 Herstellungsverfahren für CMOS-Halbleiter-Bauelemente mit wählbaren Gatedicken Expired - Lifetime DE60134753D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP01204564A EP1315200B1 (de) 2001-11-26 2001-11-26 Herstellungsverfahren für CMOS-Halbleiter-Bauelemente mit wählbaren Gatedicken

Publications (1)

Publication Number Publication Date
DE60134753D1 true DE60134753D1 (de) 2008-08-21

Family

ID=8181311

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60134753T Expired - Lifetime DE60134753D1 (de) 2001-11-26 2001-11-26 Herstellungsverfahren für CMOS-Halbleiter-Bauelemente mit wählbaren Gatedicken

Country Status (5)

Country Link
US (1) US6855605B2 (de)
EP (1) EP1315200B1 (de)
JP (1) JP4751004B2 (de)
AT (1) ATE400892T1 (de)
DE (1) DE60134753D1 (de)

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KR100598038B1 (ko) * 2004-02-25 2006-07-07 삼성전자주식회사 다층 반사 방지막을 포함하는 고체 촬상 소자 및 그 다층반사 방지막의 제조 방법
US8399934B2 (en) * 2004-12-20 2013-03-19 Infineon Technologies Ag Transistor device
US8178902B2 (en) 2004-06-17 2012-05-15 Infineon Technologies Ag CMOS transistor with dual high-k gate dielectric and method of manufacture thereof
US7176090B2 (en) * 2004-09-07 2007-02-13 Intel Corporation Method for making a semiconductor device that includes a metal gate electrode
KR100594324B1 (ko) * 2005-02-19 2006-06-30 삼성전자주식회사 반도체 소자의 듀얼 폴리실리콘 게이트 형성방법
US7361538B2 (en) * 2005-04-14 2008-04-22 Infineon Technologies Ag Transistors and methods of manufacture thereof
US20070052037A1 (en) * 2005-09-02 2007-03-08 Hongfa Luan Semiconductor devices and methods of manufacture thereof
US20070052036A1 (en) * 2005-09-02 2007-03-08 Hongfa Luan Transistors and methods of manufacture thereof
US8188551B2 (en) 2005-09-30 2012-05-29 Infineon Technologies Ag Semiconductor devices and methods of manufacture thereof
JP2007096060A (ja) * 2005-09-29 2007-04-12 Matsushita Electric Ind Co Ltd 半導体装置及びその製造方法
US7510943B2 (en) * 2005-12-16 2009-03-31 Infineon Technologies Ag Semiconductor devices and methods of manufacture thereof
US20080237751A1 (en) * 2007-03-30 2008-10-02 Uday Shah CMOS Structure and method of manufacturing same
TW200842318A (en) * 2007-04-24 2008-11-01 Nanya Technology Corp Method for measuring thin film thickness
JP2009027083A (ja) * 2007-07-23 2009-02-05 Toshiba Corp 半導体装置及びその製造方法
KR100898220B1 (ko) * 2007-09-07 2009-05-18 주식회사 동부하이텍 반도체 소자 및 그 제조방법
KR20100082574A (ko) * 2009-01-09 2010-07-19 삼성전자주식회사 씨모스 트랜지스터의 제조 방법
CN102074582B (zh) * 2009-11-20 2013-06-12 台湾积体电路制造股份有限公司 集成电路结构及其形成方法
US8993451B2 (en) * 2011-04-15 2015-03-31 Freescale Semiconductor, Inc. Etching trenches in a substrate
CN102881592B (zh) * 2011-07-15 2015-08-26 中芯国际集成电路制造(北京)有限公司 半导体器件的制造方法
CN102881591B (zh) * 2011-07-15 2015-12-16 中芯国际集成电路制造(北京)有限公司 半导体器件的制造方法
US10283616B2 (en) * 2016-08-30 2019-05-07 United Microelectronics Corp. Fabricating method of semiconductor structure
US11646353B1 (en) * 2021-12-27 2023-05-09 Nanya Technology Corporation Semiconductor device structure

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Publication number Priority date Publication date Assignee Title
US4057895A (en) * 1976-09-20 1977-11-15 General Electric Company Method of forming sloped members of N-type polycrystalline silicon
US5021354A (en) * 1989-12-04 1991-06-04 Motorola, Inc. Process for manufacturing a semiconductor device
JP2924763B2 (ja) * 1996-02-28 1999-07-26 日本電気株式会社 半導体装置の製造方法
US6171897B1 (en) * 1997-03-28 2001-01-09 Sharp Kabushiki Kaisha Method for manufacturing CMOS semiconductor device
US6080629A (en) * 1997-04-21 2000-06-27 Advanced Micro Devices, Inc. Ion implantation into a gate electrode layer using an implant profile displacement layer
JP3077630B2 (ja) * 1997-06-05 2000-08-14 日本電気株式会社 半導体装置およびその製造方法
US5963803A (en) * 1998-02-02 1999-10-05 Advanced Micro Devices, Inc. Method of making N-channel and P-channel IGFETs with different gate thicknesses and spacer widths
JP2000058868A (ja) * 1998-08-07 2000-02-25 Mitsubishi Electric Corp 半導体装置
JP4245692B2 (ja) * 1998-08-11 2009-03-25 シャープ株式会社 デュアルゲートｃｍｏｓ型半導体装置およびその製造方法
JP3257533B2 (ja) * 1999-01-25 2002-02-18 日本電気株式会社 無機反射防止膜を使った配線形成方法
JP3348071B2 (ja) * 1999-04-20 2002-11-20 松下電器産業株式会社 半導体装置の製造方法
US6294460B1 (en) * 2000-05-31 2001-09-25 Advanced Micro Devices, Inc. Semiconductor manufacturing method using a high extinction coefficient dielectric photomask

Also Published As

Publication number Publication date
US6855605B2 (en) 2005-02-15
JP4751004B2 (ja) 2011-08-17
ATE400892T1 (de) 2008-07-15
EP1315200A1 (de) 2003-05-28
JP2003197557A (ja) 2003-07-11
EP1315200B1 (de) 2008-07-09
US20030099766A1 (en) 2003-05-29

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