DE60236436D1 - Einzelelektrontransistoren und verfahren zur herstellung - Google Patents
Einzelelektrontransistoren und verfahren zur herstellungInfo
- Publication number
- DE60236436D1 DE60236436D1 DE60236436T DE60236436T DE60236436D1 DE 60236436 D1 DE60236436 D1 DE 60236436D1 DE 60236436 T DE60236436 T DE 60236436T DE 60236436 T DE60236436 T DE 60236436T DE 60236436 D1 DE60236436 D1 DE 60236436D1
- Authority
- DE
- Germany
- Prior art keywords
- insulating layer
- electrode
- nanoparticle
- electrodes
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000002105 nanoparticle Substances 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 3
- 239000012491 analyte Substances 0.000 abstract 1
- 238000003491 array Methods 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 abstract 1
- 238000000206 photolithography Methods 0.000 abstract 1
- 230000009870 specific binding Effects 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/403—Cells and electrode assemblies
- G01N27/414—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
- G01N27/4146—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS involving nanosized elements, e.g. nanotubes, nanowires
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/7613—Single electron transistors; Coulomb blockade devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/902—Specified use of nanostructure
- Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
- Y10S977/936—Specified use of nanostructure for electronic or optoelectronic application in a transistor or 3-terminal device
- Y10S977/937—Single electron transistor
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Analytical Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Ceramic Engineering (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Molecular Biology (AREA)
- Computer Hardware Design (AREA)
- Electrochemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Thin Film Transistor (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Bipolar Transistors (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/905,319 US6483125B1 (en) | 2001-07-13 | 2001-07-13 | Single electron transistors in which the thickness of an insulating layer defines spacing between electrodes |
PCT/US2002/022137 WO2003007384A2 (en) | 2001-07-13 | 2002-07-12 | Single-electron transistors and fabrication methods |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60236436D1 true DE60236436D1 (de) | 2010-07-01 |
Family
ID=25420626
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60236436T Expired - Fee Related DE60236436D1 (de) | 2001-07-13 | 2002-07-12 | Einzelelektrontransistoren und verfahren zur herstellung |
Country Status (8)
Country | Link |
---|---|
US (2) | US6483125B1 (de) |
EP (1) | EP1407492B1 (de) |
JP (1) | JP4814487B2 (de) |
AT (1) | ATE468611T1 (de) |
AU (1) | AU2002322459A1 (de) |
DE (1) | DE60236436D1 (de) |
TW (1) | TW557546B (de) |
WO (1) | WO2003007384A2 (de) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9724642D0 (en) * | 1997-11-21 | 1998-01-21 | British Tech Group | Single electron devices |
US6653653B2 (en) * | 2001-07-13 | 2003-11-25 | Quantum Logic Devices, Inc. | Single-electron transistors and fabrication methods in which a projecting feature defines spacing between electrodes |
TW531890B (en) * | 2002-02-27 | 2003-05-11 | Ind Tech Res Inst | Single electron device fabricated from nanoparticle derivatives |
WO2004005587A2 (en) * | 2002-07-08 | 2004-01-15 | The Regents Of The University Of California | Surface nanopatterning |
US8070988B2 (en) | 2003-09-09 | 2011-12-06 | International Technology Center | Nano-carbon hybrid structures |
US7224039B1 (en) | 2003-09-09 | 2007-05-29 | International Technology Center | Polymer nanocomposite structures for integrated circuits |
JP2007526452A (ja) | 2003-11-20 | 2007-09-13 | バイオワーン・エルエルシー | 生物学的物質を検出する方法及び装置 |
KR100671813B1 (ko) * | 2004-10-15 | 2007-01-19 | 세이코 엡슨 가부시키가이샤 | 박막 패턴 형성 방법, 반도체 장치, 전기 광학 장치, 및전자 기기 |
JP4297106B2 (ja) * | 2005-02-23 | 2009-07-15 | セイコーエプソン株式会社 | 膜パターンの形成方法及びデバイスの製造方法、電気光学装置及び電子機器 |
US7309650B1 (en) | 2005-02-24 | 2007-12-18 | Spansion Llc | Memory device having a nanocrystal charge storage region and method |
US7378310B1 (en) | 2005-04-27 | 2008-05-27 | Spansion Llc | Method for manufacturing a memory device having a nanocrystal charge storage region |
US7335594B1 (en) | 2005-04-27 | 2008-02-26 | Spansion Llc | Method for manufacturing a memory device having a nanocrystal charge storage region |
JP4613314B2 (ja) * | 2005-05-26 | 2011-01-19 | 独立行政法人産業技術総合研究所 | 単結晶の製造方法 |
US20070202648A1 (en) * | 2006-02-28 | 2007-08-30 | Samsung Electronics Co. Ltd. | Memory device and method of manufacturing the same |
EP2248157B1 (de) * | 2008-02-11 | 2019-09-04 | Qucor Pty Ltd | Steuerung und auslesen von elektronen- oder löcherspinn |
CA2735735C (en) * | 2008-09-02 | 2016-11-22 | The Governing Council Of The University Of Toronto | Nanostructured microelectrodes and biosensing devices incorporating the same |
CA3021580A1 (en) | 2015-06-25 | 2016-12-29 | Barry L. Merriman | Biomolecular sensors and methods |
CN109328301B (zh) | 2016-01-28 | 2021-03-12 | 罗斯韦尔生物技术股份有限公司 | 大规模并行dna测序装置 |
JP7280590B2 (ja) | 2016-01-28 | 2023-05-24 | ロズウェル バイオテクノロジーズ,インコーポレイテッド | 大スケールの分子電子工学センサアレイを使用する被分析物を測定するための方法および装置 |
JP6854532B2 (ja) | 2016-02-09 | 2021-04-07 | ロズウェル バイオテクノロジーズ,インコーポレイテッド | 電子的、標識フリーのdnaおよびゲノムシークエンシング |
US10597767B2 (en) | 2016-02-22 | 2020-03-24 | Roswell Biotechnologies, Inc. | Nanoparticle fabrication |
US9829456B1 (en) | 2016-07-26 | 2017-11-28 | Roswell Biotechnologies, Inc. | Method of making a multi-electrode structure usable in molecular sensing devices |
KR102622275B1 (ko) | 2017-01-10 | 2024-01-05 | 로스웰 바이오테크놀로지스 인코포레이티드 | Dna 데이터 저장을 위한 방법들 및 시스템들 |
WO2018136148A1 (en) | 2017-01-19 | 2018-07-26 | Roswell Biotechnologies, Inc. | Solid state sequencing devices comprising two dimensional layer materials |
US10508296B2 (en) | 2017-04-25 | 2019-12-17 | Roswell Biotechnologies, Inc. | Enzymatic circuits for molecular sensors |
KR102692957B1 (ko) | 2017-04-25 | 2024-08-06 | 로스웰 엠이 아이엔씨. | 분자 센서들을 위한 효소 회로들 |
EP4023764A3 (de) | 2017-05-09 | 2022-09-21 | Roswell Biotechnologies, Inc. | Bindungssondenschaltungen für molekulare sensoren |
WO2019046589A1 (en) | 2017-08-30 | 2019-03-07 | Roswell Biotechnologies, Inc. | PROCESSIVE ENZYME MOLECULAR ELECTRONIC SENSORS FOR STORING DNA DATA |
WO2019075100A1 (en) | 2017-10-10 | 2019-04-18 | Roswell Biotechnologies, Inc. | METHODS, APPARATUS AND SYSTEMS FOR STORING DNA DATA WITHOUT AMPLIFICATION |
Family Cites Families (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8406955D0 (en) | 1984-03-16 | 1984-04-18 | Serono Diagnostics Ltd | Assay |
DE3513168A1 (de) | 1985-04-12 | 1986-10-16 | Thomas 8000 München Dandekar | Biosensor bestehend aus einem halbleiter auf silizium oder kohlenstoffbasis (elektronischer teil) und nukleinbasen (od. anderen biol. monomeren) |
US4894339A (en) | 1985-12-18 | 1990-01-16 | Seitaikinouriyou Kagakuhin Sinseizogijutsu Kenkyu Kumiai | Immobilized enzyme membrane for a semiconductor sensor |
JPS6350745A (ja) | 1986-08-20 | 1988-03-03 | Fuji Photo Film Co Ltd | 化学センサ− |
DE3827314C1 (de) | 1988-08-11 | 1989-10-19 | Christoff Prof. Dr. Braeuchle | |
US5219577A (en) | 1990-06-22 | 1993-06-15 | The Regents Of The University Of California | Biologically active composition having a nanocrystalline core |
AU2907092A (en) | 1991-10-21 | 1993-05-21 | James W. Holm-Kennedy | Method and device for biochemical sensing |
US5846708A (en) | 1991-11-19 | 1998-12-08 | Massachusetts Institiute Of Technology | Optical and electrical methods and apparatus for molecule detection |
US5405454A (en) * | 1992-03-19 | 1995-04-11 | Matsushita Electric Industrial Co., Ltd. | Electrically insulated silicon structure and producing method therefor |
US5420746A (en) | 1993-04-13 | 1995-05-30 | The United States Of America As Represented By The Secretary Of The Army | Single electron device including clusters of pure carbon atoms |
EP0756761B1 (de) * | 1994-04-19 | 1998-06-24 | Siemens Aktiengesellschaft | Mikroelektronisches bauelement und verfahren zu dessen herstellung |
JPH0878669A (ja) * | 1994-09-02 | 1996-03-22 | Hitachi Ltd | 半導体装置および半導体装置の製造方法 |
JP3149718B2 (ja) | 1995-02-03 | 2001-03-26 | 松下電器産業株式会社 | 単電子トランジスタ |
US5576563A (en) | 1995-04-24 | 1996-11-19 | Motorola Inc. | Chemical probe field effect transistor for measuring the surface potential of a gate electrode in response to chemical exposure |
DE19522351A1 (de) * | 1995-06-20 | 1997-01-09 | Max Planck Gesellschaft | Verfahren zur Herstellung von Quantenstrukturen, insbesondere von Quantenpunkten und Tunnelbarrieren sowie Bauelemente mit solchen Quantenstrukturen |
AU2579297A (en) | 1996-03-26 | 1997-10-17 | Samsung Electronics Co., Ltd. | Tunnelling device and method of producing a tunnelling device |
DE19621994C1 (de) | 1996-05-31 | 1997-06-12 | Siemens Ag | Einzelelektron-Speicherzellenanordnung |
US6066265A (en) | 1996-06-19 | 2000-05-23 | Kionix, Inc. | Micromachined silicon probe for scanning probe microscopy |
US5747839A (en) | 1996-09-30 | 1998-05-05 | Motorola, Inc. | Chemical sensing trench field effect transistor |
US5922537A (en) | 1996-11-08 | 1999-07-13 | N.o slashed.AB Immunoassay, Inc. | Nanoparticles biosensor |
US6103868A (en) | 1996-12-27 | 2000-08-15 | The Regents Of The University Of California | Organically-functionalized monodisperse nanocrystals of metals |
EP0865078A1 (de) | 1997-03-13 | 1998-09-16 | Hitachi Europe Limited | Verfahren zum Ablegen von nanometrischen Partikeln |
US5900729A (en) | 1997-03-20 | 1999-05-04 | International Business Machines Corporation | Magnetic force microscopy probe with integrated coil |
US5900728A (en) | 1997-03-20 | 1999-05-04 | International Business Machines Corporation | Alternating current magnetic force microscopy system with probe having integrated coil |
US6159620A (en) | 1997-03-31 | 2000-12-12 | The Regents Of The University Of California | Single-electron solid state electronic device |
EP1154493A3 (de) | 1997-05-30 | 2003-10-15 | Matsushita Electric Industrial Co., Ltd. | Lichtemittierende Halbleiteranordnung mit Quantenpunkten |
KR100223807B1 (ko) * | 1997-06-04 | 1999-10-15 | 구본준 | 반도체 소자의 제조방법 |
JP3452764B2 (ja) * | 1997-06-11 | 2003-09-29 | 科学技術振興事業団 | 超微細突起構造体の製造方法 |
US5892252A (en) | 1998-02-05 | 1999-04-06 | Motorola, Inc. | Chemical sensing trench field effect transistor and method for same |
EP1073902A2 (de) | 1998-04-20 | 2001-02-07 | University Of North Carolina At Chapel Hill | Naonometerpartikel mit reaktiver schicht |
US6211530B1 (en) * | 1998-06-12 | 2001-04-03 | Motorola, Inc. | Sparse-carrier devices and method of fabrication |
US6218175B1 (en) * | 1998-10-30 | 2001-04-17 | International Business Machines Corporation | Nano-devices using block-copolymers |
JP2000349275A (ja) * | 1999-06-01 | 2000-12-15 | Nec Corp | 単一電子素子とその製造方法 |
WO2001013432A1 (en) * | 1999-08-18 | 2001-02-22 | North Carolina State University | Sensing devices using chemically-gated single electron transistors |
US6410934B1 (en) * | 2001-02-09 | 2002-06-25 | The Board Of Trustees Of The University Of Illinois | Silicon nanoparticle electronic switches |
-
2001
- 2001-07-13 US US09/905,319 patent/US6483125B1/en not_active Expired - Fee Related
-
2002
- 2002-07-12 AT AT02756451T patent/ATE468611T1/de not_active IP Right Cessation
- 2002-07-12 EP EP02756451A patent/EP1407492B1/de not_active Expired - Lifetime
- 2002-07-12 AU AU2002322459A patent/AU2002322459A1/en not_active Abandoned
- 2002-07-12 WO PCT/US2002/022137 patent/WO2003007384A2/en active Application Filing
- 2002-07-12 DE DE60236436T patent/DE60236436D1/de not_active Expired - Fee Related
- 2002-07-12 TW TW091115527A patent/TW557546B/zh active
- 2002-07-12 JP JP2003513046A patent/JP4814487B2/ja not_active Expired - Fee Related
- 2002-09-17 US US10/244,860 patent/US6784082B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1407492B1 (de) | 2010-05-19 |
WO2003007384A3 (en) | 2003-05-08 |
JP2005526371A (ja) | 2005-09-02 |
JP4814487B2 (ja) | 2011-11-16 |
EP1407492A2 (de) | 2004-04-14 |
ATE468611T1 (de) | 2010-06-15 |
US6483125B1 (en) | 2002-11-19 |
US20030025133A1 (en) | 2003-02-06 |
AU2002322459A1 (en) | 2003-01-29 |
US6784082B2 (en) | 2004-08-31 |
WO2003007384A2 (en) | 2003-01-23 |
TW557546B (en) | 2003-10-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8339 | Ceased/non-payment of the annual fee |