DE60110995D1 - Verfahren und Vorrichtung zur schnellen Simulation eines Luftbildes - Google Patents

Verfahren und Vorrichtung zur schnellen Simulation eines Luftbildes

Info

Publication number
DE60110995D1
DE60110995D1 DE60110995T DE60110995T DE60110995D1 DE 60110995 D1 DE60110995 D1 DE 60110995D1 DE 60110995 T DE60110995 T DE 60110995T DE 60110995 T DE60110995 T DE 60110995T DE 60110995 D1 DE60110995 D1 DE 60110995D1
Authority
DE
Germany
Prior art keywords
aerial image
fast simulation
simulation
fast
aerial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60110995T
Other languages
English (en)
Other versions
DE60110995T2 (de
Inventor
Armin Liebchen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML MaskTools Netherlands BV
Original Assignee
ASML MaskTools Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML MaskTools Netherlands BV filed Critical ASML MaskTools Netherlands BV
Application granted granted Critical
Publication of DE60110995D1 publication Critical patent/DE60110995D1/de
Publication of DE60110995T2 publication Critical patent/DE60110995T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F8/00—Arrangements for software engineering
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Software Systems (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)
  • Lenses (AREA)
  • Complex Calculations (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60110995T 2000-09-12 2001-09-10 Verfahren und Vorrichtung zur schnellen Simulation eines Luftbildes Expired - Fee Related DE60110995T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US23195300P 2000-09-12 2000-09-12
US231953P 2000-09-12

Publications (2)

Publication Number Publication Date
DE60110995D1 true DE60110995D1 (de) 2005-06-30
DE60110995T2 DE60110995T2 (de) 2006-04-27

Family

ID=22871303

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60110995T Expired - Fee Related DE60110995T2 (de) 2000-09-12 2001-09-10 Verfahren und Vorrichtung zur schnellen Simulation eines Luftbildes

Country Status (6)

Country Link
US (1) US6738859B2 (de)
EP (1) EP1202119B1 (de)
JP (1) JP3636438B2 (de)
KR (1) KR100436831B1 (de)
DE (1) DE60110995T2 (de)
TW (1) TW552561B (de)

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Also Published As

Publication number Publication date
DE60110995T2 (de) 2006-04-27
TW552561B (en) 2003-09-11
JP3636438B2 (ja) 2005-04-06
US6738859B2 (en) 2004-05-18
KR20020021018A (ko) 2002-03-18
KR100436831B1 (ko) 2004-06-23
EP1202119A1 (de) 2002-05-02
EP1202119B1 (de) 2005-05-25
US20020062206A1 (en) 2002-05-23
JP2002184688A (ja) 2002-06-28

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