DE60001691T2 - Katadioptrisches optisches System und Projektionsbelichtungsvorrichtung mit einem solchen System - Google Patents

Katadioptrisches optisches System und Projektionsbelichtungsvorrichtung mit einem solchen System Download PDF

Info

Publication number
DE60001691T2
DE60001691T2 DE60001691T DE60001691T DE60001691T2 DE 60001691 T2 DE60001691 T2 DE 60001691T2 DE 60001691 T DE60001691 T DE 60001691T DE 60001691 T DE60001691 T DE 60001691T DE 60001691 T2 DE60001691 T2 DE 60001691T2
Authority
DE
Germany
Prior art keywords
optical system
catadioptric optical
catadioptric
light
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60001691T
Other languages
German (de)
English (en)
Other versions
DE60001691D1 (de
Inventor
Yutaka Suenaga
Tomohiro Miyashita
Kotaro Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of DE60001691D1 publication Critical patent/DE60001691D1/de
Application granted granted Critical
Publication of DE60001691T2 publication Critical patent/DE60001691T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60001691T 1999-07-13 2000-07-13 Katadioptrisches optisches System und Projektionsbelichtungsvorrichtung mit einem solchen System Expired - Lifetime DE60001691T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP19946799A JP4717974B2 (ja) 1999-07-13 1999-07-13 反射屈折光学系及び該光学系を備える投影露光装置
JP19946799 1999-07-13

Publications (2)

Publication Number Publication Date
DE60001691D1 DE60001691D1 (de) 2003-04-24
DE60001691T2 true DE60001691T2 (de) 2004-02-12

Family

ID=16408298

Family Applications (2)

Application Number Title Priority Date Filing Date
DE60001691T Expired - Lifetime DE60001691T2 (de) 1999-07-13 2000-07-13 Katadioptrisches optisches System und Projektionsbelichtungsvorrichtung mit einem solchen System
DE60026623T Expired - Lifetime DE60026623T2 (de) 1999-07-13 2000-07-13 Katadioptrisches optisches System und Belichtungsvorrichtung mit einem solchem System

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE60026623T Expired - Lifetime DE60026623T2 (de) 1999-07-13 2000-07-13 Katadioptrisches optisches System und Belichtungsvorrichtung mit einem solchem System

Country Status (4)

Country Link
US (1) US7079314B1 (https=)
EP (2) EP1069448B1 (https=)
JP (1) JP4717974B2 (https=)
DE (2) DE60001691T2 (https=)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001050171A1 (de) * 1999-12-29 2001-07-12 Carl Zeiss Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
WO2002044786A2 (en) 2000-11-28 2002-06-06 Carl Zeiss Smt Ag Catadioptric projection system for 157 nm lithography
JP2001228401A (ja) 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
JP4245286B2 (ja) 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
JP2002217095A (ja) 2000-11-14 2002-08-02 Canon Inc 露光装置、半導体デバイス製造方法、半導体製造工場及び露光装置の保守方法並びに位置検出装置
DE10127227A1 (de) * 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
US6912042B2 (en) 2002-03-28 2005-06-28 Carl Zeiss Smt Ag 6-mirror projection objective with few lenses
JP3977214B2 (ja) 2002-09-17 2007-09-19 キヤノン株式会社 露光装置
JP3984898B2 (ja) 2002-09-18 2007-10-03 キヤノン株式会社 露光装置
JP2004205188A (ja) * 2002-11-07 2004-07-22 Tokyo Elex Kk 廃棄物の処理方法及び処理装置
SG10201405231YA (en) 2003-05-06 2014-09-26 Nippon Kogaku Kk Projection optical system, exposure apparatus, and exposure method
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
US7463422B2 (en) * 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
KR101407204B1 (ko) 2004-01-14 2014-06-13 칼 짜이스 에스엠티 게엠베하 투영 대물렌즈
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
WO2005098504A1 (en) * 2004-04-08 2005-10-20 Carl Zeiss Smt Ag Imaging system with mirror group
KR101376931B1 (ko) 2004-05-17 2014-03-25 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US8064041B2 (en) 2004-06-10 2011-11-22 Carl Zeiss Smt Gmbh Projection objective for a microlithographic projection exposure apparatus
DE602005018648D1 (de) 2004-07-14 2010-02-11 Zeiss Carl Smt Ag Katadioptrisches projektionsobjektiv
US7184124B2 (en) 2004-10-28 2007-02-27 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
DE102005042005A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
JP2006309220A (ja) 2005-04-29 2006-11-09 Carl Zeiss Smt Ag 投影対物レンズ
EP1746463A2 (de) 2005-07-01 2007-01-24 Carl Zeiss SMT AG Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv
JP2009508150A (ja) 2005-09-13 2009-02-26 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影光学系、ある機器を製造するための方法、光学面を設計する方法
JP5068271B2 (ja) 2006-02-17 2012-11-07 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ照明システム、及びこの種の照明システムを含む投影露光装置
DE102006014380A1 (de) 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
US7738188B2 (en) * 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
US7920338B2 (en) * 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
EP1852745A1 (en) * 2006-05-05 2007-11-07 Carl Zeiss SMT AG High-NA projection objective
DE102006022958A1 (de) 2006-05-11 2007-11-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs
EP1890191A1 (en) 2006-08-14 2008-02-20 Carl Zeiss SMT AG Catadioptric projection objective with pupil mirror
US20090323739A1 (en) * 2006-12-22 2009-12-31 Uv Tech Systems Laser optical system
DE102007023411A1 (de) 2006-12-28 2008-07-03 Carl Zeiss Smt Ag Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik
DE102007019570A1 (de) 2007-04-25 2008-10-30 Carl Zeiss Smt Ag Spiegelanordnung, Kontaktierungsanordnung und optisches System
US7760425B2 (en) 2007-09-05 2010-07-20 Carl Zeiss Smt Ag Chromatically corrected catadioptric objective and projection exposure apparatus including the same
US8345350B2 (en) 2008-06-20 2013-01-01 Carl Zeiss Smt Gmbh Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
JP5360529B2 (ja) * 2008-07-01 2013-12-04 株式会社ニコン 投影光学系、露光装置、およびデバイス製造方法
JP2014194552A (ja) * 2014-04-28 2014-10-09 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
JP6358242B2 (ja) * 2015-11-30 2018-07-18 株式会社ニコン 露光装置、露光方法、デバイス製造方法およびパターン形成方法
JP6830469B2 (ja) * 2017-11-20 2021-02-17 富士フイルム株式会社 結像光学系、投写型表示装置、および撮像装置
JP6525069B2 (ja) * 2018-01-09 2019-06-05 株式会社ニコン 露光装置、露光方法およびデバイス製造方法

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4293186A (en) 1977-02-11 1981-10-06 The Perkin-Elmer Corporation Restricted off-axis field optical system
US4241390A (en) 1978-02-06 1980-12-23 The Perkin-Elmer Corporation System for illuminating an annular field
US4812028A (en) 1984-07-23 1989-03-14 Nikon Corporation Reflection type reduction projection optical system
JPS61156737A (ja) 1984-12-27 1986-07-16 Canon Inc 回路の製造方法及び露光装置
GB9020902D0 (en) * 1990-09-26 1990-11-07 Optics & Vision Ltd Optical systems,telescopes and binoculars
US5734496A (en) 1991-06-03 1998-03-31 Her Majesty The Queen In Right Of New Zealand Lens system
JP3298131B2 (ja) 1991-10-24 2002-07-02 株式会社ニコン 縮小投影レンズ
US5212593A (en) 1992-02-06 1993-05-18 Svg Lithography Systems, Inc. Broad band optical reduction system using matched multiple refractive element materials
JP3278896B2 (ja) 1992-03-31 2002-04-30 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
US5287218A (en) * 1992-04-07 1994-02-15 Hughes Aircraft Company Re-imaging optical system including refractive and diffractive optical elements
US5636066A (en) 1993-03-12 1997-06-03 Nikon Corporation Optical apparatus
US5515207A (en) 1993-11-03 1996-05-07 Nikon Precision Inc. Multiple mirror catadioptric optical system
DE4417489A1 (de) 1994-05-19 1995-11-23 Zeiss Carl Fa Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie
US5488229A (en) * 1994-10-04 1996-01-30 Excimer Laser Systems, Inc. Deep ultraviolet microlithography system
JPH08203812A (ja) 1995-01-30 1996-08-09 Nikon Corp 反射屈折縮小投影光学系及び露光装置
US5815310A (en) 1995-12-12 1998-09-29 Svg Lithography Systems, Inc. High numerical aperture ring field optical reduction system
US5737137A (en) 1996-04-01 1998-04-07 The Regents Of The University Of California Critical illumination condenser for x-ray lithography
JPH1020197A (ja) * 1996-06-28 1998-01-23 Nikon Corp 反射屈折光学系及びその調整方法
US5717518A (en) 1996-07-22 1998-02-10 Kla Instruments Corporation Broad spectrum ultraviolet catadioptric imaging system
US5999310A (en) * 1996-07-22 1999-12-07 Shafer; David Ross Ultra-broadband UV microscope imaging system with wide range zoom capability
DE19639586A1 (de) 1996-09-26 1998-04-02 Zeiss Carl Fa Katadioptrisches Mikrolithographie-Reduktionsobjektiv
US6169627B1 (en) * 1996-09-26 2001-01-02 Carl-Zeiss-Stiftung Catadioptric microlithographic reduction objective
US5956192A (en) * 1997-09-18 1999-09-21 Svg Lithography Systems, Inc. Four mirror EUV projection optics
EP1079253A4 (en) 1998-04-07 2004-09-01 Nikon Corp DEVICE AND PROCESS FOR PROJECTION EXPOSURE, AND OPTICAL SYSTEM WITH REFLECTION AND REFRACTION
US6600608B1 (en) 1999-11-05 2003-07-29 Carl-Zeiss-Stiftung Catadioptric objective comprising two intermediate images
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
JP2001228401A (ja) 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法

Also Published As

Publication number Publication date
US7079314B1 (en) 2006-07-18
JP4717974B2 (ja) 2011-07-06
DE60026623T2 (de) 2007-01-04
DE60001691D1 (de) 2003-04-24
EP1069448A1 (en) 2001-01-17
JP2001027727A (ja) 2001-01-30
EP1069448B1 (en) 2003-03-19
EP1318425B1 (en) 2006-03-08
EP1318425A3 (en) 2003-10-29
DE60026623D1 (de) 2006-05-04
EP1318425A2 (en) 2003-06-11

Similar Documents

Publication Publication Date Title
DE60001691T2 (de) Katadioptrisches optisches System und Projektionsbelichtungsvorrichtung mit einem solchen System
DE69125328T2 (de) Feldkompensierte Linse
EP1855160B1 (de) Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs
DE69531153T2 (de) Optisches Projektionssystem mit Belichtungsgerät
EP1035445B1 (de) Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
DE69837358T2 (de) Beleuchtungssystem und Belichtungsapparat
EP1282011B1 (de) Reflektives Projektionsobjektiv für EUV-Photolithographie
DE69306428T2 (de) Optisches Breitbandverkleinerungssystem mit angepassten refraktiven Materialien
EP0783137B1 (de) REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
EP1122608B1 (de) Projektionsbelichtungsanlage mit reflektivem Retikel
EP1260845A2 (de) Katadioptrisches Reduktionsobjektiv
DE69923376T2 (de) Belichtungsprojektionsapparat mit einem optischen catadioptrischen Belichtungssystem
DE19902336A1 (de) Optisches Projektionssystem und dieses verwendende Belichtungsvorrichtung und Belichtungsverfahren
DE19546795A1 (de) Katadioptrisches System und ein dieses benützendes Belichtungsgerät
DE102005042005A1 (de) Hochaperturiges Objektiv mit obskurierter Pupille
DE19923609A1 (de) Ringfeld-4-Spiegelsysteme mit konvexem Primärspiegel für die EUV-Lithographie
DE102014208770A1 (de) Projektionsoptik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik
EP1199590A1 (de) 8-Spiegel-Mikrolithographie-Projektionsobjektiv
EP1686405A1 (de) Mikrolithographisches Reduktionsobjektiv mit fünf Linsengruppen
DE19833481A1 (de) Optisches Projektionssystem, dieses verwendende Belichtungsvorrichtung und Belichtungsverfahren
EP1102100A2 (de) Katadioptrisches Objektiv mit physikalischem Strahlteiler
DE19726058A1 (de) Katadioptrisches System zur Photolithographie
DE60303173T2 (de) Katoptrisches Projektionssystem, Belichtungsvorrichtung und Herstellungsprozess mit deren Verwendung
DE102018214437A1 (de) Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
DE10104177A1 (de) Katadioptrisches Reduktionsobjektiv

Legal Events

Date Code Title Description
8364 No opposition during term of opposition