JP4717974B2 - 反射屈折光学系及び該光学系を備える投影露光装置 - Google Patents

反射屈折光学系及び該光学系を備える投影露光装置 Download PDF

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Publication number
JP4717974B2
JP4717974B2 JP19946799A JP19946799A JP4717974B2 JP 4717974 B2 JP4717974 B2 JP 4717974B2 JP 19946799 A JP19946799 A JP 19946799A JP 19946799 A JP19946799 A JP 19946799A JP 4717974 B2 JP4717974 B2 JP 4717974B2
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Japan
Prior art keywords
optical system
catadioptric
light
catadioptric optical
reflecting surface
Prior art date
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Expired - Fee Related
Application number
JP19946799A
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English (en)
Japanese (ja)
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JP2001027727A5 (https=
JP2001027727A (ja
Inventor
豊 末永
智裕 宮下
弘太郎 山口
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Nikon Corp
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Nikon Corp
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Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP19946799A priority Critical patent/JP4717974B2/ja
Priority to US09/615,081 priority patent/US7079314B1/en
Priority to EP03000101A priority patent/EP1318425B1/en
Priority to DE60026623T priority patent/DE60026623T2/de
Priority to EP00305938A priority patent/EP1069448B1/en
Priority to DE60001691T priority patent/DE60001691T2/de
Publication of JP2001027727A publication Critical patent/JP2001027727A/ja
Publication of JP2001027727A5 publication Critical patent/JP2001027727A5/ja
Application granted granted Critical
Publication of JP4717974B2 publication Critical patent/JP4717974B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP19946799A 1999-07-13 1999-07-13 反射屈折光学系及び該光学系を備える投影露光装置 Expired - Fee Related JP4717974B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP19946799A JP4717974B2 (ja) 1999-07-13 1999-07-13 反射屈折光学系及び該光学系を備える投影露光装置
US09/615,081 US7079314B1 (en) 1999-07-13 2000-07-12 Catadioptric optical system and exposure apparatus equipped with the same
DE60026623T DE60026623T2 (de) 1999-07-13 2000-07-13 Katadioptrisches optisches System und Belichtungsvorrichtung mit einem solchem System
EP00305938A EP1069448B1 (en) 1999-07-13 2000-07-13 Catadioptric optical system and projection exposure apparatus equipped with the same
EP03000101A EP1318425B1 (en) 1999-07-13 2000-07-13 Catadioptric optical system and exposure apparatus equipped with the same
DE60001691T DE60001691T2 (de) 1999-07-13 2000-07-13 Katadioptrisches optisches System und Projektionsbelichtungsvorrichtung mit einem solchen System

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19946799A JP4717974B2 (ja) 1999-07-13 1999-07-13 反射屈折光学系及び該光学系を備える投影露光装置

Publications (3)

Publication Number Publication Date
JP2001027727A JP2001027727A (ja) 2001-01-30
JP2001027727A5 JP2001027727A5 (https=) 2008-02-28
JP4717974B2 true JP4717974B2 (ja) 2011-07-06

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP19946799A Expired - Fee Related JP4717974B2 (ja) 1999-07-13 1999-07-13 反射屈折光学系及び該光学系を備える投影露光装置

Country Status (4)

Country Link
US (1) US7079314B1 (https=)
EP (2) EP1069448B1 (https=)
JP (1) JP4717974B2 (https=)
DE (2) DE60001691T2 (https=)

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JP4245286B2 (ja) 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
JP2002217095A (ja) 2000-11-14 2002-08-02 Canon Inc 露光装置、半導体デバイス製造方法、半導体製造工場及び露光装置の保守方法並びに位置検出装置
DE10127227A1 (de) * 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
US6912042B2 (en) 2002-03-28 2005-06-28 Carl Zeiss Smt Ag 6-mirror projection objective with few lenses
JP3977214B2 (ja) 2002-09-17 2007-09-19 キヤノン株式会社 露光装置
JP3984898B2 (ja) 2002-09-18 2007-10-03 キヤノン株式会社 露光装置
JP2004205188A (ja) * 2002-11-07 2004-07-22 Tokyo Elex Kk 廃棄物の処理方法及び処理装置
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US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
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DE602005018648D1 (de) 2004-07-14 2010-02-11 Zeiss Carl Smt Ag Katadioptrisches projektionsobjektiv
US7184124B2 (en) 2004-10-28 2007-02-27 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
DE102005042005A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
JP2006309220A (ja) 2005-04-29 2006-11-09 Carl Zeiss Smt Ag 投影対物レンズ
EP1746463A2 (de) 2005-07-01 2007-01-24 Carl Zeiss SMT AG Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv
JP2009508150A (ja) 2005-09-13 2009-02-26 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影光学系、ある機器を製造するための方法、光学面を設計する方法
JP5068271B2 (ja) 2006-02-17 2012-11-07 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ照明システム、及びこの種の照明システムを含む投影露光装置
DE102006014380A1 (de) 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
US7738188B2 (en) * 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
US7920338B2 (en) * 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
EP1852745A1 (en) * 2006-05-05 2007-11-07 Carl Zeiss SMT AG High-NA projection objective
DE102006022958A1 (de) 2006-05-11 2007-11-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs
EP1890191A1 (en) 2006-08-14 2008-02-20 Carl Zeiss SMT AG Catadioptric projection objective with pupil mirror
US20090323739A1 (en) * 2006-12-22 2009-12-31 Uv Tech Systems Laser optical system
DE102007023411A1 (de) 2006-12-28 2008-07-03 Carl Zeiss Smt Ag Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik
DE102007019570A1 (de) 2007-04-25 2008-10-30 Carl Zeiss Smt Ag Spiegelanordnung, Kontaktierungsanordnung und optisches System
US7760425B2 (en) 2007-09-05 2010-07-20 Carl Zeiss Smt Ag Chromatically corrected catadioptric objective and projection exposure apparatus including the same
US8345350B2 (en) 2008-06-20 2013-01-01 Carl Zeiss Smt Gmbh Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
JP5360529B2 (ja) * 2008-07-01 2013-12-04 株式会社ニコン 投影光学系、露光装置、およびデバイス製造方法
JP2014194552A (ja) * 2014-04-28 2014-10-09 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
JP6358242B2 (ja) * 2015-11-30 2018-07-18 株式会社ニコン 露光装置、露光方法、デバイス製造方法およびパターン形成方法
JP6830469B2 (ja) * 2017-11-20 2021-02-17 富士フイルム株式会社 結像光学系、投写型表示装置、および撮像装置
JP6525069B2 (ja) * 2018-01-09 2019-06-05 株式会社ニコン 露光装置、露光方法およびデバイス製造方法

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Also Published As

Publication number Publication date
US7079314B1 (en) 2006-07-18
DE60026623T2 (de) 2007-01-04
DE60001691D1 (de) 2003-04-24
EP1069448A1 (en) 2001-01-17
DE60001691T2 (de) 2004-02-12
JP2001027727A (ja) 2001-01-30
EP1069448B1 (en) 2003-03-19
EP1318425B1 (en) 2006-03-08
EP1318425A3 (en) 2003-10-29
DE60026623D1 (de) 2006-05-04
EP1318425A2 (en) 2003-06-11

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