DE4120941C2 - - Google Patents
Info
- Publication number
- DE4120941C2 DE4120941C2 DE4120941A DE4120941A DE4120941C2 DE 4120941 C2 DE4120941 C2 DE 4120941C2 DE 4120941 A DE4120941 A DE 4120941A DE 4120941 A DE4120941 A DE 4120941A DE 4120941 C2 DE4120941 C2 DE 4120941C2
- Authority
- DE
- Germany
- Prior art keywords
- crucible
- cathode
- deposition material
- anode
- acceleration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
- H01J27/14—Other arc discharge ion sources using an applied magnetic field
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2164184A JPH089774B2 (ja) | 1990-06-25 | 1990-06-25 | 薄膜形成装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE4120941A1 DE4120941A1 (de) | 1992-01-09 |
DE4120941C2 true DE4120941C2 (US08124630-20120228-C00152.png) | 1993-09-09 |
Family
ID=15788300
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE4120941A Granted DE4120941A1 (de) | 1990-06-25 | 1991-06-25 | Vorrichtung zum aufbringen von duennschichten |
Country Status (4)
Country | Link |
---|---|
US (1) | US5180477A (US08124630-20120228-C00152.png) |
JP (1) | JPH089774B2 (US08124630-20120228-C00152.png) |
DE (1) | DE4120941A1 (US08124630-20120228-C00152.png) |
GB (1) | GB2248340B (US08124630-20120228-C00152.png) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2278952B (en) * | 1993-06-12 | 1997-03-26 | James Harry Freeman | Improvements in or relating to surface ionisation ion sources |
DE10019720A1 (de) * | 2000-04-20 | 2001-10-31 | Atotech Deutschland Gmbh | Verfahren und Vorrichtung zum elektrischen Kontaktieren von plattenförmigem Behandlungsgut bei elektrolytischen Prozessen |
JP4728882B2 (ja) * | 2006-06-09 | 2011-07-20 | 長州産業株式会社 | 薄膜堆積用分子線源用坩堝の製造方法 |
CN101908458B (zh) * | 2009-06-05 | 2012-03-07 | 马利民 | 一种矩形刻蚀离子枪 |
KR101432514B1 (ko) * | 2013-01-29 | 2014-08-21 | 한국기초과학지원연구원 | 플라즈마 보조 물리 기상 증착원 |
DE102016114480B4 (de) * | 2016-08-04 | 2023-02-02 | VON ARDENNE Asset GmbH & Co. KG | Ionenstrahlquelle und Verfahren zur Ionenstrahlbehandlung |
US10600611B2 (en) * | 2017-12-12 | 2020-03-24 | Applied Materials, Inc. | Ion source crucible for solid feed materials |
US11404254B2 (en) | 2018-09-19 | 2022-08-02 | Varian Semiconductor Equipment Associates, Inc. | Insertable target holder for solid dopant materials |
US11170973B2 (en) | 2019-10-09 | 2021-11-09 | Applied Materials, Inc. | Temperature control for insertable target holder for solid dopant materials |
US10957509B1 (en) | 2019-11-07 | 2021-03-23 | Applied Materials, Inc. | Insertable target holder for improved stability and performance for solid dopant materials |
US11854760B2 (en) | 2021-06-21 | 2023-12-26 | Applied Materials, Inc. | Crucible design for liquid metal in an ion source |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB685269A (en) * | 1951-02-02 | 1952-12-31 | Nat Res Corp | Apparatus and process for coating a substrate with a metal |
BE762681A (nl) * | 1971-02-09 | 1971-07-16 | Bekaert Sa Nv | Inrichting voor het opdampen van een metalen deklaag op een langwerpig substraat met behulp van tenminste een elektronenkanon. |
US3908183A (en) * | 1973-03-14 | 1975-09-23 | California Linear Circuits Inc | Combined ion implantation and kinetic transport deposition process |
JPS5181791A (ja) * | 1975-01-13 | 1976-07-17 | Osaka Koon Denki Kk | Ionkapureeteinguhoho |
US4424104A (en) * | 1983-05-12 | 1984-01-03 | International Business Machines Corporation | Single axis combined ion and vapor source |
JPS6115965A (ja) * | 1984-07-03 | 1986-01-24 | Hitachi Ltd | クラスタイオンビ−ム発生方法およびその装置 |
JPS61174370A (ja) * | 1985-01-29 | 1986-08-06 | Mitsubishi Electric Corp | 蒸着装置 |
JPS6214416A (ja) * | 1985-07-12 | 1987-01-23 | Victor Co Of Japan Ltd | 薄膜形成装置 |
JPS63176460A (ja) * | 1987-01-13 | 1988-07-20 | Matsushita Electric Ind Co Ltd | 薄膜製造装置 |
GB8701414D0 (en) * | 1987-01-22 | 1987-02-25 | Matthews A | Heating enhancement in physical vapour deposition |
JPS63297559A (ja) * | 1987-08-22 | 1988-12-05 | Tokuda Seisakusho Ltd | 高周波電源を用いたグロ−放電装置のア−クしゃ断方法および装置 |
JP2619068B2 (ja) * | 1989-09-08 | 1997-06-11 | 三菱電機株式会社 | 薄膜形成装置 |
-
1990
- 1990-06-25 JP JP2164184A patent/JPH089774B2/ja not_active Expired - Lifetime
-
1991
- 1991-06-20 US US07/718,367 patent/US5180477A/en not_active Expired - Fee Related
- 1991-06-25 GB GB9113636A patent/GB2248340B/en not_active Expired - Fee Related
- 1991-06-25 DE DE4120941A patent/DE4120941A1/de active Granted
Also Published As
Publication number | Publication date |
---|---|
GB2248340A (en) | 1992-04-01 |
JPH089774B2 (ja) | 1996-01-31 |
GB9113636D0 (en) | 1991-08-14 |
DE4120941A1 (de) | 1992-01-09 |
GB2248340B (en) | 1994-09-28 |
JPH0456761A (ja) | 1992-02-24 |
US5180477A (en) | 1993-01-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OP8 | Request for examination as to paragraph 44 patent law | ||
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8339 | Ceased/non-payment of the annual fee |