DE3854977D1 - Verfahren zur Abscheidung eines supraleitenden dünnen Filmes - Google Patents
Verfahren zur Abscheidung eines supraleitenden dünnen FilmesInfo
- Publication number
- DE3854977D1 DE3854977D1 DE3854977T DE3854977T DE3854977D1 DE 3854977 D1 DE3854977 D1 DE 3854977D1 DE 3854977 T DE3854977 T DE 3854977T DE 3854977 T DE3854977 T DE 3854977T DE 3854977 D1 DE3854977 D1 DE 3854977D1
- Authority
- DE
- Germany
- Prior art keywords
- deposition
- thin film
- superconducting thin
- superconducting
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000008021 deposition Effects 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/45—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on copper oxide or solid solutions thereof with other oxides
- C04B35/4504—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on copper oxide or solid solutions thereof with other oxides containing rare earth oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/087—Oxides of copper or solid solutions thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0408—Processes for depositing or forming copper oxide superconductor layers by sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/80—Material per se process of making same
- Y10S505/815—Process of making per se
- Y10S505/816—Sputtering, including coating, forming, or etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/80—Material per se process of making same
- Y10S505/815—Process of making per se
- Y10S505/818—Coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/80—Material per se process of making same
- Y10S505/815—Process of making per se
- Y10S505/818—Coating
- Y10S505/819—Vapor deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Structural Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5921487 | 1987-03-14 | ||
JP6031787 | 1987-03-16 | ||
JP6320387 | 1987-03-18 | ||
JP6320687 | 1987-03-18 | ||
JP6320487 | 1987-03-18 | ||
JP6320587 | 1987-03-18 |
Publications (3)
Publication Number | Publication Date |
---|---|
DE3854977D1 true DE3854977D1 (de) | 1996-03-21 |
DE3854977T2 DE3854977T2 (de) | 1996-07-18 |
DE3854977T3 DE3854977T3 (de) | 2002-11-21 |
Family
ID=27550745
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3854977T Expired - Lifetime DE3854977T3 (de) | 1987-03-14 | 1988-03-14 | Verfahren zur Abscheidung eines supraleitenden dünnen Filmes |
Country Status (6)
Country | Link |
---|---|
US (1) | US5057201A (de) |
EP (1) | EP0284489B2 (de) |
KR (1) | KR0132061B1 (de) |
AU (1) | AU598113B2 (de) |
CA (1) | CA1331868C (de) |
DE (1) | DE3854977T3 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1339019C (en) * | 1987-02-05 | 1997-03-25 | Sumitomo Electric Industries, Ltd. | Process for preparing a superconducting thin film |
AU615014B2 (en) * | 1987-02-17 | 1991-09-19 | Sumitomo Electric Industries, Ltd. | Superconducting thin film and wire and a process for producing the same |
AU598113B2 (en) * | 1987-03-14 | 1990-06-14 | Sumitomo Electric Industries, Ltd. | Process for depositing a superconducting thin film |
DE3711842A1 (de) * | 1987-04-08 | 1988-10-27 | Asea Brown Boveri | Faserbuendel und verfahren zu seiner herstellung |
CA1326976C (en) * | 1987-05-26 | 1994-02-15 | Satoshi Takano | Superconducting member |
US5206214A (en) * | 1987-05-31 | 1993-04-27 | Sumitomo Electric Industries, Ltd. | Method of preparing thin film of superconductor |
US4908346A (en) * | 1987-07-01 | 1990-03-13 | Eastman Kodak Company | Crystalline rare earth alkaline earth copper oxide thick film circuit element with superconducting onset transition temperature in excess of 77% |
EP0300499B2 (de) * | 1987-07-24 | 1998-08-19 | Matsushita Electric Industrial Co., Ltd. | Zusammengesetzte supraleitende Schicht |
KR0125876B1 (ko) * | 1988-02-25 | 1997-12-18 | 나까하라 쯔네오 | 초전도 재료와 그 제조 방법 |
EP0361265A1 (de) * | 1988-09-29 | 1990-04-04 | Siemens Aktiengesellschaft | Herstellung von dünnen Schichten eines Hochtemperatur-Supraleiters (HTSL) durch ein plasmaaktiviertes PVD-Verfahren |
DE3930063A1 (de) * | 1988-10-10 | 1990-04-12 | Licentia Gmbh | Verfahren zum abscheiden einer schicht aus einem hochtemperatur-supraleiter |
JPH02260674A (ja) * | 1989-03-31 | 1990-10-23 | Sumitomo Electric Ind Ltd | トンネル型ジョセフソン素子とその作製方法 |
RO107134B1 (ro) * | 1989-04-18 | 1993-09-30 | Usinor Sacilor | Procedeu pentru colorarea suprafetelor materialelor metalice |
US5395704A (en) * | 1992-11-19 | 1995-03-07 | North Western Univ. Technology Transfer Prog. | Solid-oxide fuel cells |
JPH0715051A (ja) * | 1993-06-24 | 1995-01-17 | Mitsubishi Electric Corp | Ybco超電導薄膜の製造方法 |
US6207027B1 (en) | 1997-05-07 | 2001-03-27 | Applied Materials, Inc. | Method to reduce overhead time in an ion metal plasma process |
US7250196B1 (en) * | 1999-10-26 | 2007-07-31 | Basic Resources, Inc. | System and method for plasma plating |
US8791018B2 (en) | 2006-12-19 | 2014-07-29 | Spansion Llc | Method of depositing copper using physical vapor deposition |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3914389A (en) * | 1974-03-22 | 1975-10-21 | American Cyanamid Co | Lanthanum oxidation catalyst and method for utilizing the same |
US3932315A (en) * | 1974-09-24 | 1976-01-13 | E. I. Du Pont De Nemours & Company | Superconductive barium-lead-bismuth oxides |
US4107163A (en) * | 1976-04-12 | 1978-08-15 | E. I. Du Pont De Nemours And Company | Perovskite-type compositions containing pentavalent Ru |
US4316785A (en) † | 1979-11-05 | 1982-02-23 | Nippon Telegraph & Telephone Public Corporation | Oxide superconductor Josephson junction and fabrication method therefor |
JPS56109824A (en) * | 1980-02-05 | 1981-08-31 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of oxide superconductive thin film |
JPS6096599A (ja) * | 1983-10-31 | 1985-05-30 | Nippon Telegr & Teleph Corp <Ntt> | 酸化物超伝導体薄膜の製造方法 |
CA1339019C (en) † | 1987-02-05 | 1997-03-25 | Sumitomo Electric Industries, Ltd. | Process for preparing a superconducting thin film |
CA1338396C (en) † | 1987-02-05 | 1996-06-18 | Kazuo Sawada | Process for manufacturing a superconducting wire of compound oxide-type ceramics |
AU615014B2 (en) * | 1987-02-17 | 1991-09-19 | Sumitomo Electric Industries, Ltd. | Superconducting thin film and wire and a process for producing the same |
AU598113B2 (en) * | 1987-03-14 | 1990-06-14 | Sumitomo Electric Industries, Ltd. | Process for depositing a superconducting thin film |
DE3872430T2 (de) * | 1987-04-10 | 1992-12-03 | American Telephone & Telegraph | Verfahren zur herstellung einer schicht aus supraleitendem material. |
EP0287325B1 (de) * | 1987-04-13 | 1994-07-27 | Hitachi, Ltd. | Supraleitendes Material und Verfahren zu dessen Herstellung |
JPH0772349B2 (ja) * | 1987-05-12 | 1995-08-02 | 住友電気工業株式会社 | 大面積化合物薄膜の作製方法および装置 |
US4992415A (en) * | 1987-07-31 | 1991-02-12 | Olin Corporation | Method for fabricating ceramic superconductors |
-
1988
- 1988-03-14 AU AU13093/88A patent/AU598113B2/en not_active Ceased
- 1988-03-14 DE DE3854977T patent/DE3854977T3/de not_active Expired - Lifetime
- 1988-03-14 KR KR1019880002649A patent/KR0132061B1/ko not_active IP Right Cessation
- 1988-03-14 EP EP88400598A patent/EP0284489B2/de not_active Expired - Lifetime
- 1988-03-14 CA CA000561423A patent/CA1331868C/en not_active Expired - Fee Related
-
1990
- 1990-01-10 US US07/462,983 patent/US5057201A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
AU598113B2 (en) | 1990-06-14 |
US5057201A (en) | 1991-10-15 |
KR0132061B1 (ko) | 1998-04-24 |
DE3854977T2 (de) | 1996-07-18 |
EP0284489B2 (de) | 2002-04-10 |
CA1331868C (en) | 1994-09-06 |
AU1309388A (en) | 1988-09-15 |
EP0284489B1 (de) | 1996-02-07 |
DE3854977T3 (de) | 2002-11-21 |
KR880011827A (ko) | 1988-10-31 |
EP0284489A1 (de) | 1988-09-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8363 | Opposition against the patent | ||
8366 | Restricted maintained after opposition proceedings |