DE3614398A1 - Anordnung zum behandeln von werkstuecken mit einer evakuierbaren kammer - Google Patents

Anordnung zum behandeln von werkstuecken mit einer evakuierbaren kammer

Info

Publication number
DE3614398A1
DE3614398A1 DE19863614398 DE3614398A DE3614398A1 DE 3614398 A1 DE3614398 A1 DE 3614398A1 DE 19863614398 DE19863614398 DE 19863614398 DE 3614398 A DE3614398 A DE 3614398A DE 3614398 A1 DE3614398 A1 DE 3614398A1
Authority
DE
Germany
Prior art keywords
workpieces
treatment
heating
individual
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19863614398
Other languages
German (de)
English (en)
Inventor
Roland Dr Schmid
Helmut Dr Kaufmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers Hochvakuum GmbH
Original Assignee
Balzers Hochvakuum GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Hochvakuum GmbH filed Critical Balzers Hochvakuum GmbH
Publication of DE3614398A1 publication Critical patent/DE3614398A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Physical Vapour Deposition (AREA)
  • Furnace Details (AREA)
  • Chemical Vapour Deposition (AREA)
DE19863614398 1985-07-01 1986-04-28 Anordnung zum behandeln von werkstuecken mit einer evakuierbaren kammer Withdrawn DE3614398A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH280685 1985-07-01

Publications (1)

Publication Number Publication Date
DE3614398A1 true DE3614398A1 (de) 1987-01-08

Family

ID=4242008

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19863614398 Withdrawn DE3614398A1 (de) 1985-07-01 1986-04-28 Anordnung zum behandeln von werkstuecken mit einer evakuierbaren kammer

Country Status (7)

Country Link
JP (1) JPS624876A (sv)
DE (1) DE3614398A1 (sv)
ES (1) ES8703938A1 (sv)
FR (1) FR2584099A1 (sv)
GB (1) GB2178228A (sv)
IT (1) IT1190648B (sv)
SE (1) SE8602907L (sv)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0645461A1 (en) * 1993-08-27 1995-03-29 Hughes Aircraft Company Heat treatment by plasma electron heating and solid/gas jet cooling
DE19750909C1 (de) * 1997-11-17 1999-04-15 Bosch Gmbh Robert Drehvorrichtung zur plasma-immersions-gestützten Behandlung von Substraten

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4029270C1 (sv) * 1990-09-14 1992-04-09 Balzers Ag, Balzers, Li
DE4029268C2 (de) * 1990-09-14 1995-07-06 Balzers Hochvakuum Verfahren zur gleichspannungs-bogenentladungs-unterstützten, reaktiven Behandlung von Gut und Vakuumbehandlungsanlage zur Durchführung
JPH04326725A (ja) * 1991-04-26 1992-11-16 Tokyo Electron Ltd プラズマ装置
CH687111A5 (de) * 1992-05-26 1996-09-13 Balzers Hochvakuum Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens.
DE10149588B4 (de) 2001-10-08 2017-09-07 Oerlikon Trading Ag, Trübbach Verfahren zur Diamantbeschichtung von Substraten
ES2344981B1 (es) * 2010-03-01 2011-05-06 Asociacion De La Industria Navarra (Ain) Procedimiento para la nitruracion de aleaciones metalicas y dispositivo para llevar a cabo dicho procedimiento.

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT364899A (sv) * 1937-08-27
CH310968A (de) * 1953-02-17 1955-11-15 Berghaus Elektrophysik Anst Verfahren zur thermischen, metallurgischen oder chemischen Behandlung von metallischen Gegenständen mittels elektrischer Glimmentladungen
BE569243A (sv) * 1953-12-09
DE1204047B (de) * 1957-04-10 1965-10-28 Berghaus Elektrophysik Anst Verfahren zur Diffusionsbehandlung von Koerpern
FR2403645A2 (fr) * 1977-09-14 1979-04-13 Vide & Traitement Sa Four pour le traitement thermochimique, en continu, de pieces metalliques, par bombardement ionique
DE2811942C2 (de) * 1977-03-23 1986-09-18 Vide et Traitement S.A., Neuilly-en-Thelle Ofen zur ionischen Nitrierbehandlung von metallischen Werkstücken
FR2385290A1 (fr) * 1977-03-23 1978-10-20 Vide & Traitement Sa Four pour traitement thermo-ionique a multicathodes
JPS5576057A (en) * 1978-11-30 1980-06-07 Nippon Denshi Kogyo Kk Ion treating apparatus
JPS5798669A (en) * 1980-12-08 1982-06-18 Nippon Denshi Kogyo Kk Glow discharge heat treatment processor
US4664890A (en) * 1984-06-22 1987-05-12 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Glow-discharge decomposition apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0645461A1 (en) * 1993-08-27 1995-03-29 Hughes Aircraft Company Heat treatment by plasma electron heating and solid/gas jet cooling
US5833918A (en) * 1993-08-27 1998-11-10 Hughes Electronics Corporation Heat treatment by plasma electron heating and solid/gas jet cooling
DE19750909C1 (de) * 1997-11-17 1999-04-15 Bosch Gmbh Robert Drehvorrichtung zur plasma-immersions-gestützten Behandlung von Substraten

Also Published As

Publication number Publication date
SE8602907D0 (sv) 1986-06-30
GB2178228A (en) 1987-02-04
GB8615590D0 (en) 1986-07-30
IT8620958A0 (it) 1986-06-27
ES554903A0 (es) 1987-03-01
IT8620958A1 (it) 1987-12-27
JPS624876A (ja) 1987-01-10
ES8703938A1 (es) 1987-03-01
FR2584099A1 (fr) 1987-01-02
IT1190648B (it) 1988-02-16
SE8602907L (sv) 1987-01-02

Similar Documents

Publication Publication Date Title
DE3614384A1 (de) Verfahren zur beschichtung von substraten in einer vakuumkammer
EP0275018B1 (de) Verfahren und Vorrichtung zum Beschichten elektrisch leitender Gegenstände mittels Glimmentladung
EP0478908B1 (de) Verfahren und Anordnung zur gleichspannungs-bogenentladungsunterstützten, reaktiven Behandlung von Gut
EP2720249B1 (de) Lichtbogenverdampfungskammer mit einer Vakuum Lichtbogenverdampfungsquelle
DE3615361C2 (de) Vorrichtung zur Oberflächenbehandlung von Werkstücken
DE1515295B1 (de) Vorrichtung zum Aufbringen dünner Schichten aus dem Material einer Zerstäubungskathode auf eine senkrecht zu einer Anode angeordnete Unterlage
CH664163A5 (de) Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden.
EP2955244A1 (en) Ion bombardment device and substrate surface cleaning method using same
DE3614398A1 (de) Anordnung zum behandeln von werkstuecken mit einer evakuierbaren kammer
CH658545A5 (de) Verfahren zum gleichmaessigen erwaermen von heizgut in einem vakuumrezipienten.
DE102018109738B3 (de) Haltevorrichtung für Wafer, Verfahren zur Temperierung einer Haltevorrichtung und Vorrichtung zur Behandlung von Wafern
EP0647961A1 (de) Vorrichtung zum Beschichten von langgestreckten biegsamen Erzeugnissen
EP0603464A1 (de) Verfahren zum Beschichten von Substraten
DE3504936C2 (sv)
DE4035131C2 (de) Verfahren und Vorrichtung zum gleichmäßigen Erwärmen von Heizgut, insbes. von zu beschichtenden Substraten, in einer Vakuumkammer
DE102013107659B4 (de) Plasmachemische Beschichtungsvorrichtung
EP1704756B1 (de) Plasmabehandlung grossvolumiger bauteile
DE1690663C3 (de) Einrichtung zur elektrischen Glimmnitrierung der Innenflächen von Bohrungen in Werkstücken aus Eisen oder Stahl
DE2624005C2 (de) Verfahren und Vorrichtung zum Aufbringen von dünnen Schichten auf ein Substrat nach dem "Ion-plating"-Verfahren.
DE3837487A1 (de) Verfahren und vorrichtung zum aetzen von substraten mit einer magnetfeldunterstuetzten niederdruck-entladung
DE3406953C2 (de) Verfahren zum Erwärmen von Heizgut in einem Vakuumrezipienten
DD146307A1 (de) Einrichtung zur grossflaechigen haftfesten abscheidung,insbesondere von kohlenstoffschichten
EP0043789A2 (de) Verfahren zur entladungschemischen Behandlung empfindlicher Werkstücke durch Einsatz der Glimmentladung
DE1515295C (de) Vorrichtung zum Aufbringen dünner Schichten aus dem Material einer Zerstäubungskathode auf eine senkrecht zu einer Anode angeordnete Unterlage
DE3222327A1 (de) Einrichtung zur vakuumbedampfung

Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee