JPS5798669A - Glow discharge heat treatment processor - Google Patents

Glow discharge heat treatment processor

Info

Publication number
JPS5798669A
JPS5798669A JP17281880A JP17281880A JPS5798669A JP S5798669 A JPS5798669 A JP S5798669A JP 17281880 A JP17281880 A JP 17281880A JP 17281880 A JP17281880 A JP 17281880A JP S5798669 A JPS5798669 A JP S5798669A
Authority
JP
Japan
Prior art keywords
objects
inner walls
phase
glow discharge
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17281880A
Other languages
Japanese (ja)
Inventor
Tadashi Matsuzawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JAPAN ELECTRONIC IND CORP
NDK Inc
Original Assignee
JAPAN ELECTRONIC IND CORP
Nihon Denshi Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JAPAN ELECTRONIC IND CORP, Nihon Denshi Kogyo KK filed Critical JAPAN ELECTRONIC IND CORP
Priority to JP17281880A priority Critical patent/JPS5798669A/en
Publication of JPS5798669A publication Critical patent/JPS5798669A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To make a trace of arc remarkably small and to reduce it, by limiting currents by arc discharge with reactors inserted to each phase. CONSTITUTION:Metallic inner walls 7a-c of three pairs which are electrically isolated in an air-tight vessel 1 mutually are provided by enclosing objects 6a-c to be processed, independent DC power supplies 12a-c rectifying each phase are provided, and the cathode of the DC power supply is connected to the objects 6a-c and the anode is connected to the inner walls 7a-c via reactors 14a-c. When the vessel 1 is filled with a desired gas atmosphere and the power supplies are applied, a glow discharge is caused between the objects 6a-c as the cathodes and the inner walls 7a-c as the anodes to process the objects 6a-c. In this case, even if an arc discharge is generated, since the DC voltage waveform between the objects 6a-c and the inner walls 7a-c is a single phase full wave rectification of three phase AC independently, zero voltage points are generated and the current is discontinuous for a long time.
JP17281880A 1980-12-08 1980-12-08 Glow discharge heat treatment processor Pending JPS5798669A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17281880A JPS5798669A (en) 1980-12-08 1980-12-08 Glow discharge heat treatment processor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17281880A JPS5798669A (en) 1980-12-08 1980-12-08 Glow discharge heat treatment processor

Publications (1)

Publication Number Publication Date
JPS5798669A true JPS5798669A (en) 1982-06-18

Family

ID=15948933

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17281880A Pending JPS5798669A (en) 1980-12-08 1980-12-08 Glow discharge heat treatment processor

Country Status (1)

Country Link
JP (1) JPS5798669A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2584099A1 (en) * 1985-07-01 1987-01-02 Balzers Hochvakuum ARRANGEMENT FOR PROCESSING WORKPIECES IN A VACUUM CHAMBER

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2584099A1 (en) * 1985-07-01 1987-01-02 Balzers Hochvakuum ARRANGEMENT FOR PROCESSING WORKPIECES IN A VACUUM CHAMBER

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