JPS5576057A - Ion treating apparatus - Google Patents

Ion treating apparatus

Info

Publication number
JPS5576057A
JPS5576057A JP14819978A JP14819978A JPS5576057A JP S5576057 A JPS5576057 A JP S5576057A JP 14819978 A JP14819978 A JP 14819978A JP 14819978 A JP14819978 A JP 14819978A JP S5576057 A JPS5576057 A JP S5576057A
Authority
JP
Japan
Prior art keywords
products
stands
container
temps
torr
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14819978A
Other languages
Japanese (ja)
Inventor
Tadashi Matsuzawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NDK Inc
Original Assignee
Nihon Denshi Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi Kogyo KK filed Critical Nihon Denshi Kogyo KK
Priority to JP14819978A priority Critical patent/JPS5576057A/en
Publication of JPS5576057A publication Critical patent/JPS5576057A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Discharge Heating (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Furnace Details (AREA)

Abstract

PURPOSE:To make the temps. of the stages in a container uniform by generating glow discharge in the vicinity of inner wall bodies, through independently variable resistors, electrically insulated to each other and set round a plurality of products to be treated. CONSTITUTION:Vacuum container 1 is evacuated to about 10<-3> Torr, and use gas such as N2-H2 mixed gas is introduced into container 1 up to a treatment press., e.g. 0.1-20 Torr. A discharge voltage is then applied to products 6a, 6b, 6c to be treated and holding stands 5a, 5b, 5c from ion treatment DC power source 8 through gap plates 11a, 11b, 11c and inner wall bodies 7a, 7b, 7c, whereby each of the products and each of the stands generate glow discharge in the space between them and each of the bodies. At this time, by adjusting the electrode gaps of plates 11a, 11b, 11c with handles 13a, 13b, 13c and changing water resistance in water tank 12 the power supplied to the products and the stands is regulated so that the temps. of the product stages are made uniform.
JP14819978A 1978-11-30 1978-11-30 Ion treating apparatus Pending JPS5576057A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14819978A JPS5576057A (en) 1978-11-30 1978-11-30 Ion treating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14819978A JPS5576057A (en) 1978-11-30 1978-11-30 Ion treating apparatus

Publications (1)

Publication Number Publication Date
JPS5576057A true JPS5576057A (en) 1980-06-07

Family

ID=15447468

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14819978A Pending JPS5576057A (en) 1978-11-30 1978-11-30 Ion treating apparatus

Country Status (1)

Country Link
JP (1) JPS5576057A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2584099A1 (en) * 1985-07-01 1987-01-02 Balzers Hochvakuum ARRANGEMENT FOR PROCESSING WORKPIECES IN A VACUUM CHAMBER

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2584099A1 (en) * 1985-07-01 1987-01-02 Balzers Hochvakuum ARRANGEMENT FOR PROCESSING WORKPIECES IN A VACUUM CHAMBER

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