JPS572874A - Surface treating apparatus using ion - Google Patents

Surface treating apparatus using ion

Info

Publication number
JPS572874A
JPS572874A JP7434980A JP7434980A JPS572874A JP S572874 A JPS572874 A JP S572874A JP 7434980 A JP7434980 A JP 7434980A JP 7434980 A JP7434980 A JP 7434980A JP S572874 A JPS572874 A JP S572874A
Authority
JP
Japan
Prior art keywords
nozzles
furnace
products
gas
pipes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7434980A
Other languages
Japanese (ja)
Inventor
Kazuyoshi Terakado
Naotatsu Asahi
Shizuka Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7434980A priority Critical patent/JPS572874A/en
Publication of JPS572874A publication Critical patent/JPS572874A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Abstract

PURPOSE:To provide uniform surface treated layers independently of the positions of products to be treated by installing gas introducing pipes each having nozzles spouting a treating gas in a furnace from the upper part to the lower part as if the group of the products in the furnace are enclosed by the pipes. CONSTITUTION:Products 3 to be treated are connected to the cathode 2 of a surface treating apparatus using ion, and by applying a high voltage between the cathode 2 and the opposite anode, glow discharge is caused to form surface treated layers on the surfaces of the products 3. At this time, upper, middle and lower three gas introducing pipes 5 are installed in the furnace of the surface treating apparatus. Each of the pipes 5 has a plurality of nozzles 17 spouting a treating gas, and the gas is uniformly fed from the nozzles to the whole of the furnace. The nozzles 17 are preferably open inward.
JP7434980A 1980-06-04 1980-06-04 Surface treating apparatus using ion Pending JPS572874A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7434980A JPS572874A (en) 1980-06-04 1980-06-04 Surface treating apparatus using ion

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7434980A JPS572874A (en) 1980-06-04 1980-06-04 Surface treating apparatus using ion

Publications (1)

Publication Number Publication Date
JPS572874A true JPS572874A (en) 1982-01-08

Family

ID=13544549

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7434980A Pending JPS572874A (en) 1980-06-04 1980-06-04 Surface treating apparatus using ion

Country Status (1)

Country Link
JP (1) JPS572874A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2595800A1 (en) * 1986-03-12 1987-09-18 Innovatique Sa Device for homogenising and regulating the treatment atmosphere of a furnace for the thermochemical treatment of metals under a rarefied atmosphere (partial vacuum)
JPH01225764A (en) * 1988-03-04 1989-09-08 Daido Steel Co Ltd Device and method for plasma carburization
JPH0257675A (en) * 1988-08-23 1990-02-27 Daido Steel Co Ltd Method for supplying gas into plasma carbonitriding furnace

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2595800A1 (en) * 1986-03-12 1987-09-18 Innovatique Sa Device for homogenising and regulating the treatment atmosphere of a furnace for the thermochemical treatment of metals under a rarefied atmosphere (partial vacuum)
JPH01225764A (en) * 1988-03-04 1989-09-08 Daido Steel Co Ltd Device and method for plasma carburization
JPH0257675A (en) * 1988-08-23 1990-02-27 Daido Steel Co Ltd Method for supplying gas into plasma carbonitriding furnace

Similar Documents

Publication Publication Date Title
AU556134B2 (en) Heating photovoltaic cell substrate
GB805164A (en) Improvements in and connected with the starting and carrying out of processes using electrical glow discharges
JPS53112066A (en) Plasma treatment apparatus
JPS5531154A (en) Plasma etching apparatus
JPS5368171A (en) Method and apparatus for plasma treatment
ES8407249A1 (en) Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus.
JPS572874A (en) Surface treating apparatus using ion
JPS5645761A (en) Plasma reaction apparatus
JPS5610932A (en) Plasma treating apparatus
JPS5687331A (en) Reducing furnace for solder-treatment
JPS53143170A (en) Condenser type gas plasma treating apparatus
JPS5756923A (en) Manufacture of thin film
JPS56169116A (en) Manufacture of amorphous silicon film
JPS544571A (en) Plasma treating apparatus
JPS57121233A (en) Plasma process device
JPS5576545A (en) Production method of gas discharge panel
JPS56163261A (en) Surface treatment of metallic material by glow discharge
JPS5565356A (en) Surface treating method utilizing glow discharge
JPS53104534A (en) Method and apparatus for ion nitriding treatment
JPS524659A (en) Raw material supply apparatus for pyrolysis furnace
JPS6435919A (en) Plasma cvd device
JPS5766640A (en) Dry etching device
JPS539082A (en) Gas exhausting device for fluorescent lamp
JPS5521538A (en) Plasma surface treating apparatus
JPS5693871A (en) Ion nitridation apparatus