JPS5521538A - Plasma surface treating apparatus - Google Patents

Plasma surface treating apparatus

Info

Publication number
JPS5521538A
JPS5521538A JP9356978A JP9356978A JPS5521538A JP S5521538 A JPS5521538 A JP S5521538A JP 9356978 A JP9356978 A JP 9356978A JP 9356978 A JP9356978 A JP 9356978A JP S5521538 A JPS5521538 A JP S5521538A
Authority
JP
Japan
Prior art keywords
works
plasma
chamber
treating
tray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9356978A
Other languages
Japanese (ja)
Other versions
JPS5826429B2 (en
Inventor
Akio Matsuzawa
Yuichi Ishikawa
Takao Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP9356978A priority Critical patent/JPS5826429B2/en
Publication of JPS5521538A publication Critical patent/JPS5521538A/en
Publication of JPS5826429B2 publication Critical patent/JPS5826429B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Abstract

PURPOSE:To highly efficiently work a plasma surface treating apparatus by forming vacuum treating chambers at the front and rear longitudinally and forming respective a electrodes in rectangular shape extending longitudinally therealong to move a work therealong as continuous or semicontinuous type. CONSTITUTION:A tray 5 carrying a plurality of works 4 is fed through a treating chamber 11 and intermediate chamber 10 into a heating chamber 9. After heating, it is passed through plasma generated between the electrodes 2 and 3. The works 4 are surface treated by the plasma while moving through the plasma. Reactive gas is supplied from a plurality of supply ports 7, and exhausted from a plurality of exhaust ports 8 at the other side to flow across the passage of the works 4. Accordingly, the plasma in the chamber 1 is substantially uniformly distributed over the entire length of the passage of the works 4 to preferably treat the works 4 with the plasma. The tray 5 is carried after the treatment through the intermediate chamber 12 into an output chamber 13 to thus efficiently conduct the treating and exhausting works.
JP9356978A 1978-08-02 1978-08-02 Plasma surface treatment equipment Expired JPS5826429B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9356978A JPS5826429B2 (en) 1978-08-02 1978-08-02 Plasma surface treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9356978A JPS5826429B2 (en) 1978-08-02 1978-08-02 Plasma surface treatment equipment

Publications (2)

Publication Number Publication Date
JPS5521538A true JPS5521538A (en) 1980-02-15
JPS5826429B2 JPS5826429B2 (en) 1983-06-02

Family

ID=14085876

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9356978A Expired JPS5826429B2 (en) 1978-08-02 1978-08-02 Plasma surface treatment equipment

Country Status (1)

Country Link
JP (1) JPS5826429B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0060651A2 (en) * 1981-03-16 1982-09-22 Energy Conversion Devices, Inc. Apparatus including improved cathode for continuous deposition of amorphous material

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0060651A2 (en) * 1981-03-16 1982-09-22 Energy Conversion Devices, Inc. Apparatus including improved cathode for continuous deposition of amorphous material

Also Published As

Publication number Publication date
JPS5826429B2 (en) 1983-06-02

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