JPS5767636A - Method and apparatus for continuous plasma treatment - Google Patents

Method and apparatus for continuous plasma treatment

Info

Publication number
JPS5767636A
JPS5767636A JP14459280A JP14459280A JPS5767636A JP S5767636 A JPS5767636 A JP S5767636A JP 14459280 A JP14459280 A JP 14459280A JP 14459280 A JP14459280 A JP 14459280A JP S5767636 A JPS5767636 A JP S5767636A
Authority
JP
Japan
Prior art keywords
vacuum
zones
stepwise
degree
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14459280A
Other languages
Japanese (ja)
Inventor
Toshihiro Hirotsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP14459280A priority Critical patent/JPS5767636A/en
Publication of JPS5767636A publication Critical patent/JPS5767636A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment

Abstract

PURPOSE:To carry out the continuous plasma treatment of a continuous web, industrially, under open conditions, by connecting a vacuum zone having a degree of vacuum high enough to the plasma generation openly to the outer atmosphere through the zones for increasing the vacuum degree stepwise, and the zones for owering the vacuum degree stepwise. CONSTITUTION:A continuous web 14 is introduced continuously from the outer atmosphere into the plasma generation zone (e.g. plasma reactor tube 1) maintained at a vacuum of <=1Torr, through a plurality of zones having stepwisely increased degree of vacuum, for example, a front vacuum tube having an inlet 9 and consisting of the zones 7 and 8, wherein the vacuum degrees in the zones are heightened stepwise by evacuating with a vacuum pump through the evacuation ports 10 and 12. The web 14 is subjected to the plasma treatment in the reactor tube 1 by glow discharge, and taken out continuously from the outlet 9' through a plurality of zones for decreasing the vacuum stepwise to the atmosphere pressure (e.g. the above front vacuum tube is attached inversely to the outlet 3' of the plasma reactor tube).
JP14459280A 1980-10-16 1980-10-16 Method and apparatus for continuous plasma treatment Pending JPS5767636A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14459280A JPS5767636A (en) 1980-10-16 1980-10-16 Method and apparatus for continuous plasma treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14459280A JPS5767636A (en) 1980-10-16 1980-10-16 Method and apparatus for continuous plasma treatment

Publications (1)

Publication Number Publication Date
JPS5767636A true JPS5767636A (en) 1982-04-24

Family

ID=15365649

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14459280A Pending JPS5767636A (en) 1980-10-16 1980-10-16 Method and apparatus for continuous plasma treatment

Country Status (1)

Country Link
JP (1) JPS5767636A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1115141A1 (en) * 2000-01-06 2001-07-11 TePla AG Method and device for the surface treatment of a filamentary body
WO2023194563A1 (en) * 2022-04-08 2023-10-12 Centre National De La Recherche Scientifique System and method for surface treatment of materials

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1115141A1 (en) * 2000-01-06 2001-07-11 TePla AG Method and device for the surface treatment of a filamentary body
WO2001050495A1 (en) * 2000-01-06 2001-07-12 Tepla Ag Method and device for treating a threadlike body surface
WO2023194563A1 (en) * 2022-04-08 2023-10-12 Centre National De La Recherche Scientifique System and method for surface treatment of materials
FR3134494A1 (en) * 2022-04-08 2023-10-13 Centre National De La Recherche Scientifique Material surface treatment system and method

Similar Documents

Publication Publication Date Title
EP0348690A3 (en) Apparatus and method for plasma treatment of small diameter tubes
AU549446B2 (en) Multi-stage jet-type evacuator
EP0295083A3 (en) Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electro-magnetic waves
JPS54153740A (en) Continuous vacuum treatment apparatus
JPS5767636A (en) Method and apparatus for continuous plasma treatment
ES8201664A1 (en) Vapor separating method and apparatus
JPS5773025A (en) Apparatus for continuous vacuum treatment
JPS5781164A (en) Exhaust equipment for multi-stage hydraulic machine
JPS5531115A (en) Anti-contamination, vacuum plasma film-forming apparatus
JPS57200569A (en) Apparatus for treating surface with gas decomposed by light
JPS57102022A (en) Reactive sputter etching equipment
JPS56166377A (en) Plasma treating method of hollow body
JPS6418224A (en) Semiconductor manufacture equipment
JPH044032A (en) Sealing device for continuous vacuum treating device
JPS5456376A (en) Object processing unit
EP0326191A3 (en) Apparatus and method for plasma treatment of resin material
JPS57195752A (en) Vacuum treatment apparatus
JPS5732637A (en) Dry etching apparatus
JPS57195753A (en) Batch-wise continuous type vacuum treatment apparatus
JPS5516475A (en) Plasma processing unit
SU1079885A1 (en) Method and device for producing ultrahigh vacuum
SU1002436A1 (en) Apparatus for drying loose materials
JPH02305976A (en) Etching device
JPS5740932A (en) Device for plasma processing
JPS5773026A (en) Apparatus for continuous plasma treatment