JPS57121233A - Plasma process device - Google Patents

Plasma process device

Info

Publication number
JPS57121233A
JPS57121233A JP768281A JP768281A JPS57121233A JP S57121233 A JPS57121233 A JP S57121233A JP 768281 A JP768281 A JP 768281A JP 768281 A JP768281 A JP 768281A JP S57121233 A JPS57121233 A JP S57121233A
Authority
JP
Japan
Prior art keywords
plasma process
process device
holes
gas
directions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP768281A
Other languages
Japanese (ja)
Inventor
Itaru Yamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP768281A priority Critical patent/JPS57121233A/en
Publication of JPS57121233A publication Critical patent/JPS57121233A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To reduce unevenness of etching quantity of a plasma process device by a method wherein the directions of gas spouting holes of the plasma process device are made as variable. CONSTITUTION:The plural gas spouting holes 4A, 4B, 4C, etc., are provided in the face 8 of the plasma process device facing with a susceptor of gas feeder, exchangeable adapters 9A, 9B, 9C having different spouting holes 10A, 10B, 10C are fixed in the holes thereof, and the gas spouting directions at the respective positions are regulated. Accordingly uniformity of plasma process can be enhanced easily.
JP768281A 1981-01-20 1981-01-20 Plasma process device Pending JPS57121233A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP768281A JPS57121233A (en) 1981-01-20 1981-01-20 Plasma process device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP768281A JPS57121233A (en) 1981-01-20 1981-01-20 Plasma process device

Publications (1)

Publication Number Publication Date
JPS57121233A true JPS57121233A (en) 1982-07-28

Family

ID=11672554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP768281A Pending JPS57121233A (en) 1981-01-20 1981-01-20 Plasma process device

Country Status (1)

Country Link
JP (1) JPS57121233A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60180114A (en) * 1984-02-27 1985-09-13 Matsushita Electric Ind Co Ltd Deposition of amorphous film and equipment thereof
JPS63187619A (en) * 1987-01-30 1988-08-03 Fuji Xerox Co Ltd Plasma cvd system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60180114A (en) * 1984-02-27 1985-09-13 Matsushita Electric Ind Co Ltd Deposition of amorphous film and equipment thereof
JPS63187619A (en) * 1987-01-30 1988-08-03 Fuji Xerox Co Ltd Plasma cvd system

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