JPS6435919A - Plasma cvd device - Google Patents
Plasma cvd deviceInfo
- Publication number
- JPS6435919A JPS6435919A JP62191771A JP19177187A JPS6435919A JP S6435919 A JPS6435919 A JP S6435919A JP 62191771 A JP62191771 A JP 62191771A JP 19177187 A JP19177187 A JP 19177187A JP S6435919 A JPS6435919 A JP S6435919A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrates
- electrodes
- yield
- rear side
- holes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To increase the yield while preventing the surface of semiconductor substrates from being polluted by providing bulkheads on the rear side of semiconductor substrates. CONSTITUTION:Holes 9 and facings 8 to be loaded with a pair of semiconductor substrates 4 are made on the upper electrodes 5a of a pair of electrodes 5a, 5b opposite to each other in a vacuum processing vessel 1 to load semiconductor substrates looking downward on the holes 9. Next, vertically movable bulkheads 3 are provided between heaters 2 and the upper electrodes 5a and then the rear side of electrode 6a is covered. The semiconductor substrates 4 are filmed by impressing high voltage from a discharging power supply 12 for discharging the space between the electrodes 5a and 5b to decompose reactive gas 11 while leading-in the reactive gas 11 from the lower electrode 5b provided with a gas leading-in channel. Through these procedures, the yield can be increased without polluting the semiconductor substrates 4.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62191771A JPS6435919A (en) | 1987-07-30 | 1987-07-30 | Plasma cvd device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62191771A JPS6435919A (en) | 1987-07-30 | 1987-07-30 | Plasma cvd device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6435919A true JPS6435919A (en) | 1989-02-07 |
Family
ID=16280250
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62191771A Pending JPS6435919A (en) | 1987-07-30 | 1987-07-30 | Plasma cvd device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6435919A (en) |
-
1987
- 1987-07-30 JP JP62191771A patent/JPS6435919A/en active Pending
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