JPS5531139A - Ion-treating apparatus - Google Patents
Ion-treating apparatusInfo
- Publication number
- JPS5531139A JPS5531139A JP10359978A JP10359978A JPS5531139A JP S5531139 A JPS5531139 A JP S5531139A JP 10359978 A JP10359978 A JP 10359978A JP 10359978 A JP10359978 A JP 10359978A JP S5531139 A JPS5531139 A JP S5531139A
- Authority
- JP
- Japan
- Prior art keywords
- ion
- pulse
- vessel
- glow discharge
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Abstract
PURPOSE:To form a uniform ion-nitrided layer on the whole surface of a metal to be treated, by use of a pulse discharge voltage from several tens of Hz to several MHz in ion-nitriding of the metal surface by glow discharge. CONSTITUTION:Metal parts 6 are placed on a supporting stand 7 contained in an airtight vessel 1. The vessel 1 is evacuated and a treating gas is introduced therein. A pulse voltage ranging from several tens of Hz to several MHz is applied to the suporting stand 7 as a cathode and to the vessel 1 as an anode to produce glow discharge in order to ion-nitride the surfaces of the metal parts 6 by sputtering with gas ions. The corner C or the bottom D of a U-shaped groove is difficult to be ion-nitrided. So that a pulse signals are given from a pulse generator 14 through an on-off time setting circuit 15 to an invetor 13 to apply a pulse voltage of a large frequency in order to produce glow discharge along the parts to be treated. Hereby the above described C, D are coated with ion-nitrided layer of sufficient thickness.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10359978A JPS5531139A (en) | 1978-08-25 | 1978-08-25 | Ion-treating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10359978A JPS5531139A (en) | 1978-08-25 | 1978-08-25 | Ion-treating apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5531139A true JPS5531139A (en) | 1980-03-05 |
JPS6122026B2 JPS6122026B2 (en) | 1986-05-29 |
Family
ID=14358223
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10359978A Granted JPS5531139A (en) | 1978-08-25 | 1978-08-25 | Ion-treating apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5531139A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004108983A3 (en) * | 2003-06-05 | 2005-05-26 | Rossendorf Forschzent | Method for producing a low nickel content surface on nitinol |
EP2351869A1 (en) * | 2002-12-20 | 2011-08-03 | COPPE/UFRJ - Coordenação dos Programas de Pós Graduação de Engenharia da Universidade Federal do Rio de Janeiro | Hydrogen diffusion barrier on steel by means of a pulsed-plasma ion-nitriding process |
CN111850457A (en) * | 2020-07-29 | 2020-10-30 | 扬州大学 | Controllable surface nitriding device and using method thereof |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013150639A1 (en) * | 2012-04-05 | 2013-10-10 | 株式会社東亜精機工作所 | Hardened layer formation device |
-
1978
- 1978-08-25 JP JP10359978A patent/JPS5531139A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2351869A1 (en) * | 2002-12-20 | 2011-08-03 | COPPE/UFRJ - Coordenação dos Programas de Pós Graduação de Engenharia da Universidade Federal do Rio de Janeiro | Hydrogen diffusion barrier on steel by means of a pulsed-plasma ion-nitriding process |
WO2004108983A3 (en) * | 2003-06-05 | 2005-05-26 | Rossendorf Forschzent | Method for producing a low nickel content surface on nitinol |
CN111850457A (en) * | 2020-07-29 | 2020-10-30 | 扬州大学 | Controllable surface nitriding device and using method thereof |
Also Published As
Publication number | Publication date |
---|---|
JPS6122026B2 (en) | 1986-05-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR2412619B1 (en) | ||
CA2128981A1 (en) | Method of an apparatus for sputtering | |
JPS5531154A (en) | Plasma etching apparatus | |
ATE10512T1 (en) | DEVICE FOR COATING SUBSTRATES USING HIGH POWER CATHODE SPRAYING AND SPRAYING CATHODE FOR THIS DEVICE. | |
IL49383A (en) | Method and apparatus for spraying the interior surface of vessels | |
EP0383550A3 (en) | Plasma forming electrode and method of using the same | |
JPS5368171A (en) | Method and apparatus for plasma treatment | |
JPS5554563A (en) | Method and apparatus for depositing metal or alloy layer on electrically conductive material to be processed | |
JPS5531139A (en) | Ion-treating apparatus | |
JPS6442574A (en) | Arc power source device for vacuum arc discharge type pvd device | |
JPS5645761A (en) | Plasma reaction apparatus | |
JPS5558371A (en) | Sputtering apparatus | |
JPS53142334A (en) | Glow discharge surface treating apparatus | |
JPS572585A (en) | Forming method for aluminum electrode | |
JPS56130466A (en) | Film forming method | |
JPS5613481A (en) | Etching apparatus | |
JPS5477573A (en) | Operating method of plasma treating apparatus | |
JPS5633475A (en) | Manufacture of exterior ornamental parts | |
JPS54100910A (en) | Method and apparatus for glow discharge processing | |
JPS5399082A (en) | High frequency sputtering apparatus | |
JPS5576545A (en) | Production method of gas discharge panel | |
JPS5739167A (en) | Glow discharge heat treatment apparatus | |
JPS54103789A (en) | Sputtering apparatus | |
JPS5538946A (en) | Sputtering apparatus | |
JPS648299A (en) | Device for etching aluminum foil for electrolytic capacitor |