JPS5531139A - Ion-treating apparatus - Google Patents

Ion-treating apparatus

Info

Publication number
JPS5531139A
JPS5531139A JP10359978A JP10359978A JPS5531139A JP S5531139 A JPS5531139 A JP S5531139A JP 10359978 A JP10359978 A JP 10359978A JP 10359978 A JP10359978 A JP 10359978A JP S5531139 A JPS5531139 A JP S5531139A
Authority
JP
Japan
Prior art keywords
ion
pulse
vessel
glow discharge
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10359978A
Other languages
Japanese (ja)
Other versions
JPS6122026B2 (en
Inventor
Tadashi Matsuzawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NDK Inc
Original Assignee
Nihon Denshi Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi Kogyo KK filed Critical Nihon Denshi Kogyo KK
Priority to JP10359978A priority Critical patent/JPS5531139A/en
Publication of JPS5531139A publication Critical patent/JPS5531139A/en
Publication of JPS6122026B2 publication Critical patent/JPS6122026B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)

Abstract

PURPOSE:To form a uniform ion-nitrided layer on the whole surface of a metal to be treated, by use of a pulse discharge voltage from several tens of Hz to several MHz in ion-nitriding of the metal surface by glow discharge. CONSTITUTION:Metal parts 6 are placed on a supporting stand 7 contained in an airtight vessel 1. The vessel 1 is evacuated and a treating gas is introduced therein. A pulse voltage ranging from several tens of Hz to several MHz is applied to the suporting stand 7 as a cathode and to the vessel 1 as an anode to produce glow discharge in order to ion-nitride the surfaces of the metal parts 6 by sputtering with gas ions. The corner C or the bottom D of a U-shaped groove is difficult to be ion-nitrided. So that a pulse signals are given from a pulse generator 14 through an on-off time setting circuit 15 to an invetor 13 to apply a pulse voltage of a large frequency in order to produce glow discharge along the parts to be treated. Hereby the above described C, D are coated with ion-nitrided layer of sufficient thickness.
JP10359978A 1978-08-25 1978-08-25 Ion-treating apparatus Granted JPS5531139A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10359978A JPS5531139A (en) 1978-08-25 1978-08-25 Ion-treating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10359978A JPS5531139A (en) 1978-08-25 1978-08-25 Ion-treating apparatus

Publications (2)

Publication Number Publication Date
JPS5531139A true JPS5531139A (en) 1980-03-05
JPS6122026B2 JPS6122026B2 (en) 1986-05-29

Family

ID=14358223

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10359978A Granted JPS5531139A (en) 1978-08-25 1978-08-25 Ion-treating apparatus

Country Status (1)

Country Link
JP (1) JPS5531139A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004108983A3 (en) * 2003-06-05 2005-05-26 Rossendorf Forschzent Method for producing a low nickel content surface on nitinol
EP2351869A1 (en) * 2002-12-20 2011-08-03 COPPE/UFRJ - Coordenação dos Programas de Pós Graduação de Engenharia da Universidade Federal do Rio de Janeiro Hydrogen diffusion barrier on steel by means of a pulsed-plasma ion-nitriding process
CN111850457A (en) * 2020-07-29 2020-10-30 扬州大学 Controllable surface nitriding device and using method thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013150639A1 (en) * 2012-04-05 2013-10-10 株式会社東亜精機工作所 Hardened layer formation device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2351869A1 (en) * 2002-12-20 2011-08-03 COPPE/UFRJ - Coordenação dos Programas de Pós Graduação de Engenharia da Universidade Federal do Rio de Janeiro Hydrogen diffusion barrier on steel by means of a pulsed-plasma ion-nitriding process
WO2004108983A3 (en) * 2003-06-05 2005-05-26 Rossendorf Forschzent Method for producing a low nickel content surface on nitinol
CN111850457A (en) * 2020-07-29 2020-10-30 扬州大学 Controllable surface nitriding device and using method thereof

Also Published As

Publication number Publication date
JPS6122026B2 (en) 1986-05-29

Similar Documents

Publication Publication Date Title
FR2412619B1 (en)
CA2128981A1 (en) Method of an apparatus for sputtering
JPS5531154A (en) Plasma etching apparatus
ATE10512T1 (en) DEVICE FOR COATING SUBSTRATES USING HIGH POWER CATHODE SPRAYING AND SPRAYING CATHODE FOR THIS DEVICE.
IL49383A (en) Method and apparatus for spraying the interior surface of vessels
EP0383550A3 (en) Plasma forming electrode and method of using the same
JPS5368171A (en) Method and apparatus for plasma treatment
JPS5554563A (en) Method and apparatus for depositing metal or alloy layer on electrically conductive material to be processed
JPS5531139A (en) Ion-treating apparatus
JPS6442574A (en) Arc power source device for vacuum arc discharge type pvd device
JPS5645761A (en) Plasma reaction apparatus
JPS5558371A (en) Sputtering apparatus
JPS53142334A (en) Glow discharge surface treating apparatus
JPS572585A (en) Forming method for aluminum electrode
JPS56130466A (en) Film forming method
JPS5613481A (en) Etching apparatus
JPS5477573A (en) Operating method of plasma treating apparatus
JPS5633475A (en) Manufacture of exterior ornamental parts
JPS54100910A (en) Method and apparatus for glow discharge processing
JPS5399082A (en) High frequency sputtering apparatus
JPS5576545A (en) Production method of gas discharge panel
JPS5739167A (en) Glow discharge heat treatment apparatus
JPS54103789A (en) Sputtering apparatus
JPS5538946A (en) Sputtering apparatus
JPS648299A (en) Device for etching aluminum foil for electrolytic capacitor