JPS5613481A - Etching apparatus - Google Patents

Etching apparatus

Info

Publication number
JPS5613481A
JPS5613481A JP8805479A JP8805479A JPS5613481A JP S5613481 A JPS5613481 A JP S5613481A JP 8805479 A JP8805479 A JP 8805479A JP 8805479 A JP8805479 A JP 8805479A JP S5613481 A JPS5613481 A JP S5613481A
Authority
JP
Japan
Prior art keywords
electrodes
flat board
sample
gas
constructed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8805479A
Other languages
Japanese (ja)
Inventor
Masahiro Shibagaki
Yasuhiro Horiike
Katsuo Sumino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP8805479A priority Critical patent/JPS5613481A/en
Publication of JPS5613481A publication Critical patent/JPS5613481A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To prevent the deterioration of resist and to make a high speed etching possible, by maintaining the flat board electrodes at the same electric potential and etching the sample placed on oppsite face of both electrodes, at the parallel flat board type plasma etching apparatus using reactive gas.
CONSTITUTION: The metal covering bodies 5, 6 and the upper and lower electrodes 7, 8 made of circular flat board-shaped stainless steel provided in close contact with the inner faces of the bodies 5, 6 are set up in the vacuum vessel 1. Both electrodes are arranged oppositing each other in parallel and parallel flat board electrodes are constructed and at the same time, the electrodes connected so as to be kept at the same electric potential by the metal material 9 and applied a high frequency electric power, are constructed. The sample 10 is placed on the electrode 8 and the vessel is evacuated and then, reaction gas, such as CF4, CCl4, etc., is introduced from the gas introducing opening 16. Next, glow discharge is generated between both electrodes by applying the high frequency electric power and the sample is etched by activating the gas by dissociation.
COPYRIGHT: (C)1981,JPO&Japio
JP8805479A 1979-07-13 1979-07-13 Etching apparatus Pending JPS5613481A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8805479A JPS5613481A (en) 1979-07-13 1979-07-13 Etching apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8805479A JPS5613481A (en) 1979-07-13 1979-07-13 Etching apparatus

Publications (1)

Publication Number Publication Date
JPS5613481A true JPS5613481A (en) 1981-02-09

Family

ID=13932114

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8805479A Pending JPS5613481A (en) 1979-07-13 1979-07-13 Etching apparatus

Country Status (1)

Country Link
JP (1) JPS5613481A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58136777A (en) * 1982-02-09 1983-08-13 Hitachi Ltd Thin film forming device by sputtering
JPS60131765A (en) * 1983-12-20 1985-07-13 Matsushita Electric Ind Co Ltd Nickel positive electrode for battery

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58136777A (en) * 1982-02-09 1983-08-13 Hitachi Ltd Thin film forming device by sputtering
JPS6160908B2 (en) * 1982-02-09 1986-12-23 Hitachi Ltd
JPS60131765A (en) * 1983-12-20 1985-07-13 Matsushita Electric Ind Co Ltd Nickel positive electrode for battery
JPH0480513B2 (en) * 1983-12-20 1992-12-18 Matsushita Denki Sangyo Kk

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