JPS5613481A - Etching apparatus - Google Patents
Etching apparatusInfo
- Publication number
- JPS5613481A JPS5613481A JP8805479A JP8805479A JPS5613481A JP S5613481 A JPS5613481 A JP S5613481A JP 8805479 A JP8805479 A JP 8805479A JP 8805479 A JP8805479 A JP 8805479A JP S5613481 A JPS5613481 A JP S5613481A
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- flat board
- sample
- gas
- constructed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To prevent the deterioration of resist and to make a high speed etching possible, by maintaining the flat board electrodes at the same electric potential and etching the sample placed on oppsite face of both electrodes, at the parallel flat board type plasma etching apparatus using reactive gas.
CONSTITUTION: The metal covering bodies 5, 6 and the upper and lower electrodes 7, 8 made of circular flat board-shaped stainless steel provided in close contact with the inner faces of the bodies 5, 6 are set up in the vacuum vessel 1. Both electrodes are arranged oppositing each other in parallel and parallel flat board electrodes are constructed and at the same time, the electrodes connected so as to be kept at the same electric potential by the metal material 9 and applied a high frequency electric power, are constructed. The sample 10 is placed on the electrode 8 and the vessel is evacuated and then, reaction gas, such as CF4, CCl4, etc., is introduced from the gas introducing opening 16. Next, glow discharge is generated between both electrodes by applying the high frequency electric power and the sample is etched by activating the gas by dissociation.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8805479A JPS5613481A (en) | 1979-07-13 | 1979-07-13 | Etching apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8805479A JPS5613481A (en) | 1979-07-13 | 1979-07-13 | Etching apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5613481A true JPS5613481A (en) | 1981-02-09 |
Family
ID=13932114
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8805479A Pending JPS5613481A (en) | 1979-07-13 | 1979-07-13 | Etching apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5613481A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58136777A (en) * | 1982-02-09 | 1983-08-13 | Hitachi Ltd | Thin film forming device by sputtering |
JPS60131765A (en) * | 1983-12-20 | 1985-07-13 | Matsushita Electric Ind Co Ltd | Nickel positive electrode for battery |
-
1979
- 1979-07-13 JP JP8805479A patent/JPS5613481A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58136777A (en) * | 1982-02-09 | 1983-08-13 | Hitachi Ltd | Thin film forming device by sputtering |
JPS6160908B2 (en) * | 1982-02-09 | 1986-12-23 | Hitachi Ltd | |
JPS60131765A (en) * | 1983-12-20 | 1985-07-13 | Matsushita Electric Ind Co Ltd | Nickel positive electrode for battery |
JPH0480513B2 (en) * | 1983-12-20 | 1992-12-18 | Matsushita Denki Sangyo Kk |
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