JPS5396938A - Dry etching apparatus - Google Patents

Dry etching apparatus

Info

Publication number
JPS5396938A
JPS5396938A JP1071677A JP1071677A JPS5396938A JP S5396938 A JPS5396938 A JP S5396938A JP 1071677 A JP1071677 A JP 1071677A JP 1071677 A JP1071677 A JP 1071677A JP S5396938 A JPS5396938 A JP S5396938A
Authority
JP
Japan
Prior art keywords
dry etching
etching apparatus
ions
discharge
active atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1071677A
Other languages
Japanese (ja)
Other versions
JPS5939508B2 (en
Inventor
Keizo Suzuki
Sadayuki Okudaira
Ichiro Shikamata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1071677A priority Critical patent/JPS5939508B2/en
Publication of JPS5396938A publication Critical patent/JPS5396938A/en
Publication of JPS5939508B2 publication Critical patent/JPS5939508B2/en
Expired legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

PURPOSE: To carry out etching with less undercut, by discharging gas which will produce active atoms (or molecule) or ions by discharge in a discahrging part and, in the course of this discharge, placing a sample to etch it plasma-chemically with the above-mentioned active atoms (or molecules) or ions.
COPYRIGHT: (C)1978,JPO&Japio
JP1071677A 1977-02-04 1977-02-04 dry etching equipment Expired JPS5939508B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1071677A JPS5939508B2 (en) 1977-02-04 1977-02-04 dry etching equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1071677A JPS5939508B2 (en) 1977-02-04 1977-02-04 dry etching equipment

Publications (2)

Publication Number Publication Date
JPS5396938A true JPS5396938A (en) 1978-08-24
JPS5939508B2 JPS5939508B2 (en) 1984-09-25

Family

ID=11758017

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1071677A Expired JPS5939508B2 (en) 1977-02-04 1977-02-04 dry etching equipment

Country Status (1)

Country Link
JP (1) JPS5939508B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5879721A (en) * 1981-11-06 1983-05-13 Hitachi Ltd Tool for wafer etching
JPS61110782A (en) * 1984-11-05 1986-05-29 Nippon Telegr & Teleph Corp <Ntt> Reactive ion etching method
JPS61130493A (en) * 1984-11-28 1986-06-18 Tokuda Seisakusho Ltd Dry etching method
JPH03274291A (en) * 1990-10-29 1991-12-05 Semiconductor Energy Lab Co Ltd Plasma etching method
JPH08172081A (en) * 1995-08-28 1996-07-02 Hitachi Ltd Plasma surface treater

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5879721A (en) * 1981-11-06 1983-05-13 Hitachi Ltd Tool for wafer etching
JPS61110782A (en) * 1984-11-05 1986-05-29 Nippon Telegr & Teleph Corp <Ntt> Reactive ion etching method
JPS6366912B2 (en) * 1984-11-05 1988-12-22 Nippon Telegraph & Telephone
JPS61130493A (en) * 1984-11-28 1986-06-18 Tokuda Seisakusho Ltd Dry etching method
JPS6316467B2 (en) * 1984-11-28 1988-04-08 Tokuda Seisakusho Kk
JPH03274291A (en) * 1990-10-29 1991-12-05 Semiconductor Energy Lab Co Ltd Plasma etching method
JPH08172081A (en) * 1995-08-28 1996-07-02 Hitachi Ltd Plasma surface treater

Also Published As

Publication number Publication date
JPS5939508B2 (en) 1984-09-25

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