JPS531398A - Ion implanting chamber - Google Patents
Ion implanting chamberInfo
- Publication number
- JPS531398A JPS531398A JP7555776A JP7555776A JPS531398A JP S531398 A JPS531398 A JP S531398A JP 7555776 A JP7555776 A JP 7555776A JP 7555776 A JP7555776 A JP 7555776A JP S531398 A JPS531398 A JP S531398A
- Authority
- JP
- Japan
- Prior art keywords
- ion implanting
- implanting chamber
- chamber
- speciment
- specimen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Welding Or Cutting Using Electron Beams (AREA)
Abstract
PURPOSE: To eliminate the cause of pollution of a specimen by inserting the speciment from a pre-processing container directly to a rotary column in a vacuum and by fixing it utilizing a centrifugal force.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7555776A JPS598026B2 (en) | 1976-06-28 | 1976-06-28 | Ion implantation room |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7555776A JPS598026B2 (en) | 1976-06-28 | 1976-06-28 | Ion implantation room |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS531398A true JPS531398A (en) | 1978-01-09 |
JPS598026B2 JPS598026B2 (en) | 1984-02-22 |
Family
ID=13579593
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7555776A Expired JPS598026B2 (en) | 1976-06-28 | 1976-06-28 | Ion implantation room |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS598026B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60246628A (en) * | 1984-05-21 | 1985-12-06 | Mitsubishi Electric Corp | Ion-implanting process in semiconductor wafer |
-
1976
- 1976-06-28 JP JP7555776A patent/JPS598026B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60246628A (en) * | 1984-05-21 | 1985-12-06 | Mitsubishi Electric Corp | Ion-implanting process in semiconductor wafer |
Also Published As
Publication number | Publication date |
---|---|
JPS598026B2 (en) | 1984-02-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5235557A (en) | Vote vending machine | |
JPS5288900A (en) | Ion beam machine tool | |
JPS5364089A (en) | Solid ion source | |
JPS531398A (en) | Ion implanting chamber | |
JPS5249774A (en) | Ion implanting device | |
JPS52107087A (en) | Removal of volatile substance of styrene polymer | |
JPS5396938A (en) | Dry etching apparatus | |
JPS5241583A (en) | Ion detecting device for mass analyzer | |
JPS52123174A (en) | Specimen scanning method for ion implantation | |
JPS5341982A (en) | Wafer holder for ion implantation processing | |
JPS51116671A (en) | Scanning type electron microscope | |
JPS5239365A (en) | Electronic gun device | |
JPS5227956A (en) | Rotary device for trnsmitting rotation | |
JPS51117569A (en) | Sample drift correction device | |
JPS5230263A (en) | Cold trap device | |
JPS5221574A (en) | Vacuum multiplying force device | |
JPS5251993A (en) | Ion exchange resin column | |
JPS5376631A (en) | Delivery sectioning system | |
JPS5244229A (en) | Method of making serological reagent for syphilis | |
JPS52104865A (en) | X-ray analysis apparatus in electronic microscope or like | |
JPS53106576A (en) | Ion etching device | |
JPS5420657A (en) | Sample processor for scanning electron microscope and its similar device | |
JPS5381290A (en) | Mass analysis of solution sample | |
JPS5225978A (en) | Fly-wheel revolution control method | |
JPS52150959A (en) | Electronic microscope or its similar device |