DE3587246T2 - Photoempfindliche Zusammensetzung. - Google Patents

Photoempfindliche Zusammensetzung.

Info

Publication number
DE3587246T2
DE3587246T2 DE85112867T DE3587246T DE3587246T2 DE 3587246 T2 DE3587246 T2 DE 3587246T2 DE 85112867 T DE85112867 T DE 85112867T DE 3587246 T DE3587246 T DE 3587246T DE 3587246 T2 DE3587246 T2 DE 3587246T2
Authority
DE
Germany
Prior art keywords
sup
sub
photosensitive
photosensitive composition
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE85112867T
Other languages
English (en)
Other versions
DE3587246D1 (de
Inventor
Hiroshi Tomiyasu
Yoshihiro Maeda
Kiyoshi Goto
Norihito Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Konica Minolta Inc
Original Assignee
Mitsubishi Kasei Corp
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp, Konica Minolta Inc filed Critical Mitsubishi Kasei Corp
Publication of DE3587246D1 publication Critical patent/DE3587246D1/de
Application granted granted Critical
Publication of DE3587246T2 publication Critical patent/DE3587246T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE85112867T 1984-10-12 1985-10-10 Photoempfindliche Zusammensetzung. Expired - Lifetime DE3587246T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59212677A JPH0782236B2 (ja) 1984-10-12 1984-10-12 感光性組成物

Publications (2)

Publication Number Publication Date
DE3587246D1 DE3587246D1 (de) 1993-05-13
DE3587246T2 true DE3587246T2 (de) 1993-10-21

Family

ID=16626574

Family Applications (2)

Application Number Title Priority Date Filing Date
DE198585112867T Pending DE177962T1 (de) 1984-10-12 1985-10-10 Photoempfindliche zusammensetzung.
DE85112867T Expired - Lifetime DE3587246T2 (de) 1984-10-12 1985-10-10 Photoempfindliche Zusammensetzung.

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE198585112867T Pending DE177962T1 (de) 1984-10-12 1985-10-10 Photoempfindliche zusammensetzung.

Country Status (7)

Country Link
US (1) US4731316A (de)
EP (1) EP0177962B1 (de)
JP (1) JPH0782236B2 (de)
AT (1) ATE88024T1 (de)
AU (1) AU585898B2 (de)
CA (1) CA1264022A (de)
DE (2) DE177962T1 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3404366A1 (de) * 1984-02-08 1985-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
JPS62123444A (ja) 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
US5215857A (en) * 1985-08-07 1993-06-01 Japan Synthetic Rubber Co., Ltd. 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent
JPS63204248A (ja) * 1987-02-20 1988-08-23 Konica Corp 感光性組成物
US5182183A (en) * 1987-03-12 1993-01-26 Mitsubishi Kasei Corporation Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O-napthoquinonediazidosulfonic acid with polyhydroxybenzophenone
JPH07117748B2 (ja) * 1987-04-21 1995-12-18 富士写真フイルム株式会社 感光性組成物
JP2646579B2 (ja) * 1987-10-06 1997-08-27 三菱化学株式会社 感光性組成物
DE3814178A1 (de) * 1988-04-27 1989-11-09 Basf Ag Lichtempfindliches aufzeichnungsmaterial
DE3819457A1 (de) * 1988-06-08 1989-12-14 Basf Ag Lichtempfindliche, negativ arbeitende offset-druckplatten
DE3828551C3 (de) * 1988-08-23 1995-02-23 Du Pont Deutschland Verfahren zur Herstellung von flexographischen Druckformen
US5112743A (en) * 1989-05-24 1992-05-12 Fuji Photo Film Co., Ltd. Light-sensitive composition and presensitized plate for use in making lithographic printing plates
EP0415422A3 (en) * 1989-08-31 1991-06-26 Fuji Photo Film Co., Ltd. Method for forming images
DE4022740A1 (de) * 1990-07-18 1992-01-23 Basf Ag Mit carbonylamino-n-alkancarbonsaeure-gruppen substituierte vinylaromaten und ihre verwendung
US5206349A (en) * 1990-08-10 1993-04-27 Toyo Gosei Kogy Co., Ltd. Aromatic diazo compounds and photosensitive compositions using the same
JP2652100B2 (ja) * 1991-12-17 1997-09-10 富士写真フイルム株式会社 感光性組成物
DE19518118C2 (de) * 1995-05-17 1998-06-18 Sun Chemical Corp Lichtempfindliche Zusammensetzung
DE19524851C2 (de) * 1995-07-07 1998-05-07 Sun Chemical Corp Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und für lithographische Druckplatten
DE19525050C2 (de) * 1995-07-10 1999-11-11 Kodak Polychrome Graphics Llc Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten
DE19644515A1 (de) * 1996-10-25 1998-06-25 Sun Chemical Corp Amidosubstituierte Acetalpolymere und Verwendung derselben in photoempfindlichen Zusammensetzungen und lithographischen Druckplatten
DE19847616C2 (de) * 1998-10-15 2001-05-10 Kodak Polychrome Graphics Gmbh Polyvinylacetale mit Imidogruppen sowie die Verwendung derselben in lichtempfindlichen Zusammensetzungen
US6270938B1 (en) 2000-06-09 2001-08-07 Kodak Polychrome Graphics Llc Acetal copolymers and use thereof in photosensitive compositions
KR20020077948A (ko) 2001-04-03 2002-10-18 삼성에스디아이 주식회사 칼라음극선관용 포토레지스트 제조용 단량체,칼라음극선관용 포토레지스트 중합체, 칼라음극선관용포토레지스트 조성물 및 칼라음극선관용 형광막 조성물

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL231268A (de) * 1956-12-28
US3064562A (en) * 1959-01-12 1962-11-20 Lithoplate Inc Acrylic acid monomer coatings for metal bases
BE608789A (de) * 1960-10-07
US3679419A (en) * 1969-05-20 1972-07-25 Azoplate Corp Light-sensitive diazo condensate containing reproduction material
US4123276A (en) * 1974-02-28 1978-10-31 Fuji Photo Film Co., Ltd. Photosensitive composition
JPS526202A (en) * 1975-07-04 1977-01-18 Oji Paper Co Photoosensitive lithographic press plate
LU75749A1 (de) * 1976-09-08 1978-04-27
FR2400221A1 (fr) * 1977-08-09 1979-03-09 Kodak Pathe Compose de diazonium photosensible utile, en particulier, pour preparer des planches d'impression lithographique, procede de preparation de ce compose et plaque presensibilisee avec ce compose
JPS5498613A (en) * 1978-01-09 1979-08-03 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
DE2834059A1 (de) * 1978-08-03 1980-02-14 Hoechst Ag Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
JPS5540406A (en) * 1978-09-14 1980-03-21 Oji Paper Co Ltd Photosensitive lithographic printing plate
JPS56107238A (en) * 1980-01-31 1981-08-26 Konishiroku Photo Ind Co Ltd Photosensitive composition for photosensitive printing plate
JPS5865430A (ja) * 1981-05-27 1983-04-19 Konishiroku Photo Ind Co Ltd 感光性印刷版用感光性組成物
JPS582830A (ja) * 1981-06-30 1983-01-08 Konishiroku Photo Ind Co Ltd 感光性組成物
JPS5862641A (ja) * 1981-10-09 1983-04-14 Fuji Photo Film Co Ltd 感光性組成物
US4526854A (en) * 1982-09-01 1985-07-02 Tokyo Shibaura Denki Kabushiki Kaisha Photoresist composition with water soluble bisazide and diazo compound
JPS5978340A (ja) * 1982-10-28 1984-05-07 Fuji Photo Film Co Ltd 感光性組成物
EP0117013A3 (de) * 1983-01-04 1986-11-05 Sage Technology, Inc. Additiver Film und Verfahren
JPS603632A (ja) * 1983-06-21 1985-01-10 Fuji Photo Film Co Ltd 感光性平版印刷版
US4614701A (en) * 1984-09-28 1986-09-30 Sekisui Fine Chemical Co., Ltd. Photocurable diazo or azide composition with acrylic copolymer having hydroxy and amino groups on separate acrylic monomer units

Also Published As

Publication number Publication date
AU585898B2 (en) 1989-06-29
US4731316A (en) 1988-03-15
JPH0782236B2 (ja) 1995-09-06
EP0177962A3 (en) 1988-01-07
CA1264022A (en) 1989-12-27
EP0177962A2 (de) 1986-04-16
EP0177962B1 (de) 1993-04-07
AU4821385A (en) 1986-04-17
DE3587246D1 (de) 1993-05-13
JPS6191654A (ja) 1986-05-09
DE177962T1 (de) 1988-11-24
ATE88024T1 (de) 1993-04-15

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