DE3516760A1 - Verfahren und vorrichtung zum aetzen von kupfer auf einer leiterplatte - Google Patents

Verfahren und vorrichtung zum aetzen von kupfer auf einer leiterplatte

Info

Publication number
DE3516760A1
DE3516760A1 DE19853516760 DE3516760A DE3516760A1 DE 3516760 A1 DE3516760 A1 DE 3516760A1 DE 19853516760 DE19853516760 DE 19853516760 DE 3516760 A DE3516760 A DE 3516760A DE 3516760 A1 DE3516760 A1 DE 3516760A1
Authority
DE
Germany
Prior art keywords
copper
conductor
circuit board
etchant
reaction chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19853516760
Other languages
German (de)
English (en)
Inventor
Norvell John Palo Alto Calif. Nelson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PSI Star Inc
Original Assignee
PSI Star Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PSI Star Inc filed Critical PSI Star Inc
Publication of DE3516760A1 publication Critical patent/DE3516760A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/067Etchants
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/02Local etching
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061Etching masks
    • H05K3/062Etching masks consisting of metals or alloys or metallic inorganic compounds
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0338Layered conductor, e.g. layered metal substrate, layered finish layer or layered thin film adhesion layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • ing And Chemical Polishing (AREA)
DE19853516760 1984-05-17 1985-05-09 Verfahren und vorrichtung zum aetzen von kupfer auf einer leiterplatte Withdrawn DE3516760A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/611,190 US4543153A (en) 1984-05-17 1984-05-17 Process and apparatus for etching copper masked by a nickel-gold mask

Publications (1)

Publication Number Publication Date
DE3516760A1 true DE3516760A1 (de) 1985-11-21

Family

ID=24447987

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19853516760 Withdrawn DE3516760A1 (de) 1984-05-17 1985-05-09 Verfahren und vorrichtung zum aetzen von kupfer auf einer leiterplatte

Country Status (6)

Country Link
US (1) US4543153A (enExample)
JP (1) JPS6152375A (enExample)
CA (1) CA1223082A (enExample)
DE (1) DE3516760A1 (enExample)
FR (1) FR2564683A1 (enExample)
GB (1) GB2159102B (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3430075A1 (de) * 1984-08-16 1986-02-27 Robert Bosch Gmbh, 7000 Stuttgart Verfahren zum herstellen einer messsonde zur verwendung bei der messung der temperatur oder masse eines stroemenden mediums
US4695348A (en) * 1986-09-15 1987-09-22 Psi Star Copper etching process and product
DE3701456A1 (de) * 1987-01-20 1988-07-28 Herrmann Ritzenhoff Fa Verfahren zur herstellung von dekorativen oder informativen musterungen an gegenstaenden, die aus einfach oder gegebenenfalls mehrfach plattierten blechen gebildet wurden
GB2206541A (en) * 1987-07-02 1989-01-11 Psi Star Inc Manufacturing printed circuit boards
US4925522A (en) * 1989-08-21 1990-05-15 Gte Products Corporation Printed circuit assembly with contact dot
US5108562A (en) * 1991-02-06 1992-04-28 International Business Machines Electrolytic method for forming vias and through holes in copper-invar-copper core structures
US5304284A (en) * 1991-10-18 1994-04-19 International Business Machines Corporation Methods for etching a less reactive material in the presence of a more reactive material
FR2776020B1 (fr) * 1998-03-11 2000-05-05 Renault Procede de controle de l'injection dans un moteur a combustion interne et allumage commande, alimente par du carburant gazeux liquefie ou par un carburant gazeux sous des conditions soniques
DE102009015604A1 (de) * 2009-04-02 2010-10-07 Siemens Aktiengesellschaft Verfahren zur Strukturierung einer auf einem Substrat befindlichen Schicht mit mehreren Lagen
EP2918707B1 (en) 2014-03-12 2019-05-22 Rolls-Royce North American Technologies, Inc. Anisotropic etching of metallic substrates
EP3518631A1 (en) 2018-01-29 2019-07-31 AT & S Austria Technologie & Systemtechnik Aktiengesellschaft Anisotropic etching using highly branched polymers

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1047275A (enExample) *
GB229414A (en) * 1923-11-29 1925-02-26 Robert David Lewis Improvements in air tubes or pipes for use in colliery ventilation and the like
GB840284A (en) * 1957-04-12 1960-07-06 Machlett Lab Inc Improvements in high voltage switching tubes
DE1164528B (de) * 1960-02-10 1964-03-05 Ruwel Werke Gmbh Verfahren zum Herstellen von gedruckten Leiterplatten
US3287191A (en) * 1963-07-23 1966-11-22 Photo Engravers Res Inc Etching of printed circuit components
GB1364660A (en) * 1971-12-02 1974-08-29 Standard Telephones Cables Ltd Method of producing electrical interconnection patterns
JPS5313177B2 (enExample) * 1973-06-20 1978-05-08
JPS5540120B2 (enExample) * 1974-11-30 1980-10-15
SE404863B (sv) * 1975-12-17 1978-10-30 Perstorp Ab Forfarande vid framstellning av ett flerlagerkort

Also Published As

Publication number Publication date
JPH0136555B2 (enExample) 1989-08-01
GB2159102A (en) 1985-11-27
GB2159102B (en) 1988-03-02
US4543153A (en) 1985-09-24
CA1223082A (en) 1987-06-16
GB8512466D0 (en) 1985-06-19
FR2564683A1 (fr) 1985-11-22
JPS6152375A (ja) 1986-03-15

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Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee