DE3141056A1 - Halbleitervorrichtung - Google Patents
HalbleitervorrichtungInfo
- Publication number
- DE3141056A1 DE3141056A1 DE19813141056 DE3141056A DE3141056A1 DE 3141056 A1 DE3141056 A1 DE 3141056A1 DE 19813141056 DE19813141056 DE 19813141056 DE 3141056 A DE3141056 A DE 3141056A DE 3141056 A1 DE3141056 A1 DE 3141056A1
- Authority
- DE
- Germany
- Prior art keywords
- substrate
- layer
- capacitor
- semiconductor device
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 53
- 239000000758 substrate Substances 0.000 claims abstract description 103
- 239000003990 capacitor Substances 0.000 claims abstract description 54
- 230000015654 memory Effects 0.000 claims abstract description 38
- 238000002844 melting Methods 0.000 abstract description 4
- 229910052594 sapphire Inorganic materials 0.000 abstract description 4
- 239000010980 sapphire Substances 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 3
- 210000002445 nipple Anatomy 0.000 abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 48
- 210000004027 cell Anatomy 0.000 description 32
- 235000012239 silicon dioxide Nutrition 0.000 description 23
- 239000000377 silicon dioxide Substances 0.000 description 23
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 21
- 238000000034 method Methods 0.000 description 14
- 238000003860 storage Methods 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 230000008569 process Effects 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 230000000873 masking effect Effects 0.000 description 8
- 238000000206 photolithography Methods 0.000 description 8
- 230000010354 integration Effects 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000003989 dielectric material Substances 0.000 description 4
- 230000004927 fusion Effects 0.000 description 4
- 238000003466 welding Methods 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 229910052715 tantalum Inorganic materials 0.000 description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 3
- 229910001936 tantalum oxide Inorganic materials 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910002113 barium titanate Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000008034 disappearance Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 210000000352 storage cell Anatomy 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000006386 memory function Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000941 radioactive substance Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012549 training Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
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- H01L2924/01057—Lanthanum [La]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01058—Cerium [Ce]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01068—Erbium [Er]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01073—Tantalum [Ta]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01074—Tungsten [W]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1203—Rectifying Diode
- H01L2924/12036—PN diode
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Semiconductor Memories (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55147165A JPS609349B2 (ja) | 1980-10-20 | 1980-10-20 | ダイナミック・ランダム・アクセス半導体メモリ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3141056A1 true DE3141056A1 (de) | 1982-05-13 |
DE3141056C2 DE3141056C2 (ja) | 1988-01-14 |
Family
ID=15424050
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19813141056 Granted DE3141056A1 (de) | 1980-10-20 | 1981-10-15 | Halbleitervorrichtung |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS609349B2 (ja) |
DE (1) | DE3141056A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0144887A2 (de) * | 1983-11-30 | 1985-06-19 | Siemens Aktiengesellschaft | Halbleiterbauelement mit höckerartigen, metallischen Anschlusskontakten und Mehrlagenverdrahtung |
EP0152557A1 (de) * | 1983-11-30 | 1985-08-28 | Siemens Aktiengesellschaft | Halbleiterbauelement mit höckerartigen, metallischen Anschlusskontakten und Mehrlagenverdrahtung |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3292240A (en) * | 1963-08-08 | 1966-12-20 | Ibm | Method of fabricating microminiature functional components |
DE1933547B2 (de) * | 1968-07-05 | 1972-03-02 | Traeger fuer halbleiterbauelemente | |
DE2337325A1 (de) * | 1973-07-23 | 1975-02-13 | Siemens Ag | Mit kunststoff umhuellter elektrischer kondensator |
DE2548563A1 (de) * | 1975-10-30 | 1977-05-05 | Licentia Gmbh | Verfahren zum herstellen eines kondensators |
DE2658302A1 (de) * | 1975-12-26 | 1977-07-07 | Suwa Seikosha Kk | Verfahren zum bonden von integrierten schaltungen |
DE2839110A1 (de) * | 1977-09-12 | 1979-03-22 | Philips Nv | Verfahren zum anbringen von metallkugeln auf einem mit oeffnungen versehenen substrat und mit metallkugeln versehenes substrat |
-
1980
- 1980-10-20 JP JP55147165A patent/JPS609349B2/ja not_active Expired
-
1981
- 1981-10-15 DE DE19813141056 patent/DE3141056A1/de active Granted
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3292240A (en) * | 1963-08-08 | 1966-12-20 | Ibm | Method of fabricating microminiature functional components |
DE1933547B2 (de) * | 1968-07-05 | 1972-03-02 | Traeger fuer halbleiterbauelemente | |
DE2337325A1 (de) * | 1973-07-23 | 1975-02-13 | Siemens Ag | Mit kunststoff umhuellter elektrischer kondensator |
DE2548563A1 (de) * | 1975-10-30 | 1977-05-05 | Licentia Gmbh | Verfahren zum herstellen eines kondensators |
DE2658302A1 (de) * | 1975-12-26 | 1977-07-07 | Suwa Seikosha Kk | Verfahren zum bonden von integrierten schaltungen |
DE2839110A1 (de) * | 1977-09-12 | 1979-03-22 | Philips Nv | Verfahren zum anbringen von metallkugeln auf einem mit oeffnungen versehenen substrat und mit metallkugeln versehenes substrat |
Non-Patent Citations (2)
Title |
---|
US-Z.: "IBM Techn. Discl. Bull.", Vol. 15, No. 2, Juli 1972, S. 656-657 * |
US-Z.: "IEEE Transactions on Electron Devices" Vol. ED-26, No. 6, Juni 1979, S. 853-860 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0144887A2 (de) * | 1983-11-30 | 1985-06-19 | Siemens Aktiengesellschaft | Halbleiterbauelement mit höckerartigen, metallischen Anschlusskontakten und Mehrlagenverdrahtung |
EP0144887A3 (de) * | 1983-11-30 | 1985-07-17 | Siemens Aktiengesellschaft | Halbleiterbauelement mit höckerartigen, metallischen Anschlusskontakten und Mehrlagenverdrahtung |
EP0152557A1 (de) * | 1983-11-30 | 1985-08-28 | Siemens Aktiengesellschaft | Halbleiterbauelement mit höckerartigen, metallischen Anschlusskontakten und Mehrlagenverdrahtung |
Also Published As
Publication number | Publication date |
---|---|
JPS609349B2 (ja) | 1985-03-09 |
DE3141056C2 (ja) | 1988-01-14 |
JPS5771171A (en) | 1982-05-01 |
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