DE2723465C2 - Maske zum Aufbringen eines Musters auf ein Substrat und Verfahren zu ihrer Herstellung - Google Patents

Maske zum Aufbringen eines Musters auf ein Substrat und Verfahren zu ihrer Herstellung

Info

Publication number
DE2723465C2
DE2723465C2 DE2723465A DE2723465A DE2723465C2 DE 2723465 C2 DE2723465 C2 DE 2723465C2 DE 2723465 A DE2723465 A DE 2723465A DE 2723465 A DE2723465 A DE 2723465A DE 2723465 C2 DE2723465 C2 DE 2723465C2
Authority
DE
Germany
Prior art keywords
mask
ribs
substrate
pattern
openings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2723465A
Other languages
German (de)
English (en)
Other versions
DE2723465A1 (de
Inventor
Robert Brookfield Conn. Hammer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE2723465A1 publication Critical patent/DE2723465A1/de
Application granted granted Critical
Publication of DE2723465C2 publication Critical patent/DE2723465C2/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
    • H05K3/143—Masks therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24298—Noncircular aperture [e.g., slit, diamond, rectangular, etc.]
    • Y10T428/24314—Slit or elongated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Respiratory Apparatuses And Protective Means (AREA)
DE2723465A 1976-07-28 1977-05-24 Maske zum Aufbringen eines Musters auf ein Substrat und Verfahren zu ihrer Herstellung Expired DE2723465C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/709,357 US4049857A (en) 1976-07-28 1976-07-28 Deposition mask and methods of making same

Publications (2)

Publication Number Publication Date
DE2723465A1 DE2723465A1 (de) 1978-02-02
DE2723465C2 true DE2723465C2 (de) 1984-10-18

Family

ID=24849531

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2723465A Expired DE2723465C2 (de) 1976-07-28 1977-05-24 Maske zum Aufbringen eines Musters auf ein Substrat und Verfahren zu ihrer Herstellung

Country Status (7)

Country Link
US (1) US4049857A (OSRAM)
JP (1) JPS5931591B2 (OSRAM)
CA (1) CA1094431A (OSRAM)
DE (1) DE2723465C2 (OSRAM)
FR (1) FR2359908A1 (OSRAM)
GB (1) GB1528295A (OSRAM)
IT (1) IT1113769B (OSRAM)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4252839A (en) * 1976-12-29 1981-02-24 Citizen Watch Company Limited Tuning fork-type quartz crystal vibrator and method of forming the same
US4256532A (en) * 1977-07-05 1981-03-17 International Business Machines Corporation Method for making a silicon mask
JPS54103552A (en) * 1978-02-01 1979-08-15 Hitachi Electronics Pattern formation method
CH649578A5 (de) * 1981-03-27 1985-05-31 Ulvac Corp Hochgeschwindigkeits-kathoden-zerstaeubungsvorrichtung.
US4465724A (en) * 1982-04-26 1984-08-14 Rasmussen O B Reticulate sheet product
US4915057A (en) * 1985-10-23 1990-04-10 Gte Products Corporation Apparatus and method for registration of shadow masked thin-film patterns
US4715940A (en) * 1985-10-23 1987-12-29 Gte Products Corporation Mask for patterning electrode structures in thin film EL devices
US4615781A (en) * 1985-10-23 1986-10-07 Gte Products Corporation Mask assembly having mask stress relieving feature
JP4248037B2 (ja) * 1997-02-04 2009-04-02 株式会社不二機販 金属被膜の形成方法
US6592933B2 (en) * 1997-10-15 2003-07-15 Toray Industries, Inc. Process for manufacturing organic electroluminescent device
JP3403627B2 (ja) * 1998-01-09 2003-05-06 株式会社不二機販 セラミック分散メッキ方法
JP3730015B2 (ja) * 1998-06-02 2005-12-21 株式会社不二機販 金属成品の表面処理方法
US6253441B1 (en) * 1999-04-16 2001-07-03 General Electric Company Fabrication of articles having a coating deposited through a mask
KR100625967B1 (ko) * 2000-10-11 2006-09-20 삼성에스디아이 주식회사 증착마스크와 이의 제조방법
KR100741052B1 (ko) * 2000-10-16 2007-07-19 삼성에스디아이 주식회사 유기 ｅｌ 소자의 증착마스크와 이를 이용한 증착방법 및그 장치
US8088435B2 (en) * 2005-03-30 2012-01-03 Brother Kogyo Kabushiki Kaisha Mask, method for producing mask, and method for producing wired board
JP4692290B2 (ja) * 2006-01-11 2011-06-01 セイコーエプソン株式会社 マスクおよび成膜方法
DE102018133062A1 (de) * 2018-12-20 2020-06-25 Optics Balzers Ag Verfahren zur Herstellung eines linear variablen optischen Filters

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE948946C (de) * 1954-03-11 1956-09-06 Heinz Ringer Schablone zum Aufspritzen von Zeichen auf eine ebene Grundflaeche
DE1446197A1 (de) * 1959-04-27 1969-05-29 Licentia Gmbh Blende zur Begrenzung von unter vermindertem Druck zu bedampfenden Flaechen
US3302612A (en) * 1963-09-12 1967-02-07 Guy R Stutzman Pattern masks and method for making same
US3241515A (en) * 1963-12-02 1966-03-22 Waters Mfg Inc Multiple turn indicator
US3330252A (en) * 1964-09-10 1967-07-11 Sperry Rand Corp Masking device
US3323490A (en) * 1966-02-21 1967-06-06 Trw Inc Adjustable mask
US3577325A (en) * 1968-05-29 1971-05-04 Western Electric Co Method of reclaiming graphite mask
US3678892A (en) * 1970-05-19 1972-07-25 Western Electric Co Pallet and mask for substrates
US3724420A (en) * 1971-02-18 1973-04-03 M Quinn Compressible stencil with high walls and narrow bridges
US3841261A (en) * 1973-01-22 1974-10-15 Gen Motors Corp Self-aligning etch-out spray mask
US3897324A (en) * 1973-06-25 1975-07-29 Honeywell Inc Material deposition masking for microcircuit structures
US4021276A (en) * 1975-12-29 1977-05-03 Western Electric Company, Inc. Method of making rib-structure shadow mask for ion implantation

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NICHTS-ERMITTELT

Also Published As

Publication number Publication date
JPS5931591B2 (ja) 1984-08-02
FR2359908A1 (fr) 1978-02-24
DE2723465A1 (de) 1978-02-02
US4049857A (en) 1977-09-20
FR2359908B1 (OSRAM) 1980-01-04
IT1113769B (it) 1986-01-20
JPS5315274A (en) 1978-02-10
GB1528295A (en) 1978-10-11
CA1094431A (en) 1981-01-27

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8125 Change of the main classification

Ipc: C23C 13/06

D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee