DE69807571T2 - Verfahren und Vorrichtung zum Ätzen - Google Patents

Verfahren und Vorrichtung zum Ätzen

Info

Publication number
DE69807571T2
DE69807571T2 DE69807571T DE69807571T DE69807571T2 DE 69807571 T2 DE69807571 T2 DE 69807571T2 DE 69807571 T DE69807571 T DE 69807571T DE 69807571 T DE69807571 T DE 69807571T DE 69807571 T2 DE69807571 T2 DE 69807571T2
Authority
DE
Germany
Prior art keywords
anode
substrate
face
width
magnetic circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69807571T
Other languages
English (en)
Other versions
DE69807571D1 (de
Inventor
Brande Pierre Vanden
Alain Weymeersch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ArcelorMittal Liege Upstream SA
Original Assignee
Cockerill Sambre SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cockerill Sambre SA filed Critical Cockerill Sambre SA
Publication of DE69807571D1 publication Critical patent/DE69807571D1/de
Application granted granted Critical
Publication of DE69807571T2 publication Critical patent/DE69807571T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Weting (AREA)
  • Thin Magnetic Films (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • ing And Chemical Polishing (AREA)
DE69807571T 1997-04-10 1998-04-02 Verfahren und Vorrichtung zum Ätzen Expired - Lifetime DE69807571T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE9700329A BE1011098A3 (fr) 1997-04-10 1997-04-10 Procede et dispositif de decapage.

Publications (2)

Publication Number Publication Date
DE69807571D1 DE69807571D1 (de) 2002-10-10
DE69807571T2 true DE69807571T2 (de) 2003-04-17

Family

ID=3890458

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69807571T Expired - Lifetime DE69807571T2 (de) 1997-04-10 1998-04-02 Verfahren und Vorrichtung zum Ätzen

Country Status (8)

Country Link
US (1) US6066241A (de)
EP (1) EP0878565B1 (de)
AT (1) ATE223520T1 (de)
BE (1) BE1011098A3 (de)
DE (1) DE69807571T2 (de)
DK (1) DK0878565T3 (de)
ES (1) ES2183284T3 (de)
PT (1) PT878565E (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10252178A1 (de) * 2002-11-09 2004-05-27 Sms Demag Ag Verfahren und Vorrichtung zum Entzundern und/oder Reinigen eines Metallstrangs
EP1783815A1 (de) * 2005-11-07 2007-05-09 ARCELOR France Verfahren und Anlage zum Ätzen eines Metallbandes mittels Vakuum-Magnetron-Zerstäubung
EP1783814A1 (de) * 2005-11-07 2007-05-09 ARCELOR France Verfahren und Einrichtung zum Reinigen eines Metallbandes mittels Magnetron-Zerstäubung
US20090145747A1 (en) * 2005-11-07 2009-06-11 Acrelormittal France Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering
JP5828770B2 (ja) * 2012-01-24 2015-12-09 株式会社神戸製鋼所 真空成膜装置
FR3088346A1 (fr) * 2018-11-14 2020-05-15 Safran Aircraft Engines Procede de decapage d’une piece de turbomachine

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59175125A (ja) * 1983-03-24 1984-10-03 Toshiba Corp ドライエツチング装置
FR2592520B1 (fr) * 1985-12-27 1988-12-09 Atelier Electro Thermie Const Dispositif de creation d'un champ magnetique glissant, en particulier pour gravure ionique rapide sous champ magnetique
US4896813A (en) * 1989-04-03 1990-01-30 Toyo Kohan Co., Ltd. Method and apparatus for cold rolling clad sheet
US5079481A (en) * 1990-08-02 1992-01-07 Texas Instruments Incorporated Plasma-assisted processing magneton with magnetic field adjustment
US5082542A (en) * 1990-08-02 1992-01-21 Texas Instruments Incorporated Distributed-array magnetron-plasma processing module and method
KR100297358B1 (ko) * 1991-07-23 2001-11-30 히가시 데쓰로 플라즈마에칭장치
JPH0768620B2 (ja) * 1991-09-30 1995-07-26 中外炉工業株式会社 金属ストリップの表面清浄化装置
US5262030A (en) * 1992-01-15 1993-11-16 Alum Rock Technology Magnetron sputtering cathode with electrically variable source size and location for coating multiple substrates
US5399253A (en) * 1992-12-23 1995-03-21 Balzers Aktiengesellschaft Plasma generating device

Also Published As

Publication number Publication date
BE1011098A3 (fr) 1999-04-06
DE69807571D1 (de) 2002-10-10
ATE223520T1 (de) 2002-09-15
DK0878565T3 (da) 2003-01-06
ES2183284T3 (es) 2003-03-16
PT878565E (pt) 2002-12-31
EP0878565A1 (de) 1998-11-18
EP0878565B1 (de) 2002-09-04
US6066241A (en) 2000-05-23

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Legal Events

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8364 No opposition during term of opposition