DE2707477A1 - Verfahren und vorrichtung zur masken-ausrichtung bei verkleinerungsprojektion - Google Patents

Verfahren und vorrichtung zur masken-ausrichtung bei verkleinerungsprojektion

Info

Publication number
DE2707477A1
DE2707477A1 DE19772707477 DE2707477A DE2707477A1 DE 2707477 A1 DE2707477 A1 DE 2707477A1 DE 19772707477 DE19772707477 DE 19772707477 DE 2707477 A DE2707477 A DE 2707477A DE 2707477 A1 DE2707477 A1 DE 2707477A1
Authority
DE
Germany
Prior art keywords
mask
wafer
alignment
pattern
projection lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19772707477
Other languages
German (de)
English (en)
Inventor
Nobuyuki Akiyama
Mituyoshi Koizumi
Asahiro Kuni
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of DE2707477A1 publication Critical patent/DE2707477A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE19772707477 1976-02-25 1977-02-21 Verfahren und vorrichtung zur masken-ausrichtung bei verkleinerungsprojektion Withdrawn DE2707477A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1900476A JPS52109875A (en) 1976-02-25 1976-02-25 Position matching system for mask and wafer and its unit

Publications (1)

Publication Number Publication Date
DE2707477A1 true DE2707477A1 (de) 1977-09-15

Family

ID=11987366

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19772707477 Withdrawn DE2707477A1 (de) 1976-02-25 1977-02-21 Verfahren und vorrichtung zur masken-ausrichtung bei verkleinerungsprojektion

Country Status (3)

Country Link
US (1) US4153371A (enExample)
JP (1) JPS52109875A (enExample)
DE (1) DE2707477A1 (enExample)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1980001721A1 (fr) * 1979-02-14 1980-08-21 H Mayer Procede et agencement pour ajuster la surface image et/ou la surface objet dans des installations de copie optique
DE2930979A1 (de) * 1979-07-31 1981-02-26 Optimetrix Corp Verfahren und vorrichtung zur zweidimensionalen positionierung eines werkstueckes
DE2900921C2 (de) * 1979-01-11 1981-06-04 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren zum Projektionskopieren von Masken auf ein Werkstück
FR2475311A1 (fr) * 1980-02-01 1981-08-07 Bbc Brown Boveri & Cie Redresseur de courant a refroidissement par air
EP0036026A1 (de) * 1980-03-10 1981-09-23 Eaton-Optimetrix Inc. Adressierbare Positioniervorrichtung
EP0091234A3 (en) * 1982-04-02 1984-05-16 Eaton Corporation Auto focus alignment and measurement system and method
EP0091233A3 (en) * 1982-04-02 1984-05-23 Eaton Corporation Auto focus alignment and measurement system and method
EP0182251A1 (en) * 1984-11-13 1986-05-28 Hitachi, Ltd. Alignment method for reduction projection type aligner
US4687980A (en) * 1980-10-20 1987-08-18 Eaton Corporation X-Y addressable workpiece positioner and mask aligner using same
US4977361A (en) * 1978-06-26 1990-12-11 Eaton Corporation X-Y addressable workpiece positioner and mask aligner using same

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53121471A (en) * 1977-03-31 1978-10-23 Nippon Chemical Ind Automatic position matching device
JPS5493974A (en) * 1978-01-06 1979-07-25 Hitachi Ltd Projection-system mask alignment unit
JPS5541739A (en) * 1978-09-20 1980-03-24 Hitachi Ltd Micro-projection type mask alignment device
US4422763A (en) * 1978-12-08 1983-12-27 Rca Corporation Automatic photomask alignment system for projection printing
DE2905636C2 (de) * 1979-02-14 1985-06-20 Censor Patent- Und Versuchs-Anstalt, Vaduz Verfahren zum Kopieren von Masken auf ein Werkstück
US4299440A (en) * 1979-02-22 1981-11-10 Hodgson R W Microscope stand for microscope optics and a mutually perpendicularly adjustable work stage in an intermediate focusing plane
FR2450468A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme
US4307961A (en) * 1979-04-02 1981-12-29 Western Electric Company, Inc. Apparatus for precisely aligning a pair of elements
US4521114A (en) * 1979-05-11 1985-06-04 Tre Semiconductor Equipment Corporation Single lens repeater
US4232969A (en) * 1979-05-30 1980-11-11 International Business Machines Corporation Projection optical system for aligning an image on a surface
JPS55162756A (en) * 1979-06-04 1980-12-18 Mitsubishi Chem Ind Ltd Preparation of cyclohexenedicarboxylic acid diamide
JPS5624504A (en) * 1979-08-06 1981-03-09 Canon Inc Photoelectric detector
JPS5658235A (en) * 1979-10-17 1981-05-21 Canon Inc Alignment device
FR2472208A1 (fr) * 1979-12-18 1981-06-26 Thomson Csf Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme
FR2472209A1 (fr) * 1979-12-18 1981-06-26 Thomson Csf Systeme optique d'alignement automatique de deux motifs comportant des reperes s'alignement du type reseaux, notamment en photo-repetition directe sur silicium
US4309813A (en) * 1979-12-26 1982-01-12 Harris Corporation Mask alignment scheme for laterally and totally dielectrically isolated integrated circuits
JPS56101119A (en) * 1980-01-17 1981-08-13 Canon Inc Observing device
US4362389A (en) * 1980-02-19 1982-12-07 Hitachi, Ltd. Method and apparatus for projection type mask alignment
FR2477298B1 (fr) * 1980-02-28 1987-05-29 Optimetrix Corp Positionneur de piece d'ouvrage adressable x-y possedant un detecteur de reperes d'adresse x-y perfectionne
US4326805A (en) * 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members
US4533251A (en) * 1980-06-09 1985-08-06 Gte Products Corporation Apparatus and process for automatically measuring aperture size of apertured material
US4385839A (en) * 1980-07-31 1983-05-31 Baird Corporation Automatic alignment system
US4333044A (en) * 1980-08-29 1982-06-01 Western Electric Co., Inc. Methods of and system for aligning a device with a reference target
JPS57138134A (en) * 1981-02-20 1982-08-26 Nippon Kogaku Kk <Nikon> Positioning device
JPS57153433A (en) * 1981-03-18 1982-09-22 Hitachi Ltd Manufacturing device for semiconductor
US4419013A (en) * 1981-03-30 1983-12-06 Tre Semiconductor Equipment Corporation Phase contrast alignment system for a semiconductor manufacturing apparatus
JPS5825638A (ja) * 1981-08-08 1983-02-15 Canon Inc 露光装置
US4475122A (en) * 1981-11-09 1984-10-02 Tre Semiconductor Equipment Corporation Automatic wafer alignment technique
JPS58193547A (ja) * 1982-05-07 1983-11-11 Hitachi Ltd 縮小投影露光装置
JPS5950518A (ja) * 1982-09-01 1984-03-23 パ−キン−エルマ−・ツエンゾ−ル・アンシュタルト 投影プリント方法
WO1984001024A1 (en) * 1982-09-07 1984-03-15 Tre Semiconductor Equipment Co Phase contrast alignment system for a semiconductor manufacturing apparatus
US4655599A (en) * 1982-11-15 1987-04-07 Canon Kabushiki Kaisha Mask aligner having a photo-mask setting device
JPS5990929A (ja) * 1982-11-17 1984-05-25 Canon Inc 投影露光装置のピント合わせ方法
US4566796A (en) * 1983-08-24 1986-01-28 Harris Corporation Method of determining position on a wafer
DE3485022D1 (de) * 1983-12-26 1991-10-10 Hitachi Ltd Belichtungsvorrichtung und verfahren fuer die ausrichtung einer maske mit einem arbeitsstueck.
US4669867A (en) * 1984-02-20 1987-06-02 Canon Kabushiki Kaisha Alignment and exposure apparatus
FR2566217B1 (fr) * 1984-05-28 1988-05-27 Micro Controle Procede et dispositif pour la reconnaissance d'un motif particulier d'une image
JPS6134941A (ja) * 1984-07-26 1986-02-19 Canon Inc 合焦検知装置
JPS60196944A (ja) * 1984-07-30 1985-10-05 Hitachi Ltd アライメント方法
US5365342A (en) * 1984-10-18 1994-11-15 Canon Kabushiki Kaisha Alignment and exposure apparatus and method for manufacture of integrated circuits
JPS61100932A (ja) * 1984-10-24 1986-05-19 Hitachi Ltd 露光装置
US5114223A (en) * 1985-07-15 1992-05-19 Canon Kabushiki Kaisha Exposure method and apparatus
JPS62122129A (ja) * 1986-05-09 1987-06-03 Hitachi Ltd ウエハ上パタ−ン位置検出装置
WO1988000362A1 (en) * 1986-06-24 1988-01-14 Stephen Hugh Salter Improved registration method in photolithography and equipment for carrying out this method
US4760429A (en) * 1986-11-05 1988-07-26 The Perkin-Elmer Corporation High speed reticle change system
JP2550974B2 (ja) * 1987-03-13 1996-11-06 株式会社ニコン 露光装置
JPH0766192B2 (ja) * 1988-05-30 1995-07-19 株式会社オーク製作所 自動露光装置におけるワーク位置決め方法
JP2004506237A (ja) * 2000-08-08 2004-02-26 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ 表示装置
US7262398B2 (en) * 2001-09-20 2007-08-28 Litel Instruments Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion
US11748871B2 (en) * 2020-09-28 2023-09-05 KLA Corp. Alignment of a specimen for inspection and other processes

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2246152A1 (de) * 1971-12-01 1973-06-07 Ibm Verfahren und vorrichtung zum optischen ausrichten von gegenstaenden

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2343586A (en) * 1941-12-16 1944-03-07 Ludwig L Lawrence Process and apparatus for eliminating graining in photography
US3573456A (en) * 1967-07-26 1971-04-06 Opto Mechanisms Inc High resolution projection means for printing micro circuits on photoresist material
US3955072A (en) * 1971-03-22 1976-05-04 Kasper Instruments, Inc. Apparatus for the automatic alignment of two superimposed objects for example a semiconductor wafer and a transparent mask
US4052603A (en) * 1974-12-23 1977-10-04 International Business Machines Corporation Object positioning process and apparatus
JPS5234907A (en) * 1975-09-11 1977-03-17 Dantani Plywood Co Method of producing decorated boards with gloss change

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2246152A1 (de) * 1971-12-01 1973-06-07 Ibm Verfahren und vorrichtung zum optischen ausrichten von gegenstaenden

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
IBM Discl.Bull., Vol. 18, 1975, S. 385-386 *
J.A. Fedotor und H.-J. Pohl(Hrsg.), Fotolithographie-Grundlagen und Anwendungen in der Halbleitertechnologie, Berlin 1974, S. 234-245, und S. 303-310 *

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4977361A (en) * 1978-06-26 1990-12-11 Eaton Corporation X-Y addressable workpiece positioner and mask aligner using same
DE2900921C2 (de) * 1979-01-11 1981-06-04 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren zum Projektionskopieren von Masken auf ein Werkstück
US4357100A (en) 1979-01-11 1982-11-02 Censor Patent- Und Versuchs-Anstalt Arrangement for projection copying masks on to a work piece
WO1980001721A1 (fr) * 1979-02-14 1980-08-21 H Mayer Procede et agencement pour ajuster la surface image et/ou la surface objet dans des installations de copie optique
DE2930979A1 (de) * 1979-07-31 1981-02-26 Optimetrix Corp Verfahren und vorrichtung zur zweidimensionalen positionierung eines werkstueckes
FR2475311A1 (fr) * 1980-02-01 1981-08-07 Bbc Brown Boveri & Cie Redresseur de courant a refroidissement par air
EP0036026A1 (de) * 1980-03-10 1981-09-23 Eaton-Optimetrix Inc. Adressierbare Positioniervorrichtung
US4687980A (en) * 1980-10-20 1987-08-18 Eaton Corporation X-Y addressable workpiece positioner and mask aligner using same
EP0091234A3 (en) * 1982-04-02 1984-05-16 Eaton Corporation Auto focus alignment and measurement system and method
EP0091233A3 (en) * 1982-04-02 1984-05-23 Eaton Corporation Auto focus alignment and measurement system and method
US4580900A (en) * 1982-04-02 1986-04-08 Eaton Corporation Auto focus alignment and measurement system and method
EP0182251A1 (en) * 1984-11-13 1986-05-28 Hitachi, Ltd. Alignment method for reduction projection type aligner

Also Published As

Publication number Publication date
JPS541553B2 (enExample) 1979-01-25
JPS52109875A (en) 1977-09-14
US4153371A (en) 1979-05-08

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Legal Events

Date Code Title Description
8130 Withdrawal