DE2525674A1 - Verfahren zur herstellung von stabilen polymer-bildern durch photopolymerisation in einer matrix - Google Patents

Verfahren zur herstellung von stabilen polymer-bildern durch photopolymerisation in einer matrix

Info

Publication number
DE2525674A1
DE2525674A1 DE19752525674 DE2525674A DE2525674A1 DE 2525674 A1 DE2525674 A1 DE 2525674A1 DE 19752525674 DE19752525674 DE 19752525674 DE 2525674 A DE2525674 A DE 2525674A DE 2525674 A1 DE2525674 A1 DE 2525674A1
Authority
DE
Germany
Prior art keywords
group
material according
photopolymerizable material
formula
atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19752525674
Other languages
German (de)
English (en)
Inventor
Niklaus Dr Baumann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CH795674A external-priority patent/CH594704A5/de
Priority claimed from CH795774A external-priority patent/CH604208A5/xx
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of DE2525674A1 publication Critical patent/DE2525674A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE19752525674 1974-06-11 1975-06-09 Verfahren zur herstellung von stabilen polymer-bildern durch photopolymerisation in einer matrix Withdrawn DE2525674A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH795674A CH594704A5 (en) 1974-06-11 1974-06-11 Stable polymer image prepn.
CH795774A CH604208A5 (fr) 1974-06-11 1974-06-11

Publications (1)

Publication Number Publication Date
DE2525674A1 true DE2525674A1 (de) 1976-01-02

Family

ID=25702506

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19752525674 Withdrawn DE2525674A1 (de) 1974-06-11 1975-06-09 Verfahren zur herstellung von stabilen polymer-bildern durch photopolymerisation in einer matrix

Country Status (5)

Country Link
JP (1) JPS5130286A (fr)
CA (1) CA1077760A (fr)
DE (1) DE2525674A1 (fr)
FR (1) FR2274951A1 (fr)
GB (1) GB1516894A (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5343504U (fr) * 1976-09-20 1978-04-14
JPS5651735A (en) * 1979-10-03 1981-05-09 Asahi Chem Ind Co Ltd Photoreactive composition
JP5495668B2 (ja) * 2009-08-12 2014-05-21 日本エンバイロケミカルズ株式会社 キノキサリン系化合物またはその塩、および工業用殺菌組成物
US11718589B2 (en) * 2017-02-06 2023-08-08 Case Western Reserve University Compositions and methods of modulating short-chain dehydrogenase

Also Published As

Publication number Publication date
JPS5130286A (ja) 1976-03-15
GB1516894A (en) 1978-07-05
CA1077760A (fr) 1980-05-20
FR2274951B1 (fr) 1983-10-28
FR2274951A1 (fr) 1976-01-09

Similar Documents

Publication Publication Date Title
DE3211312A1 (de) Photoempfindliche harzzusammensetzung
DE2934028A1 (de) Ein neues polymeres fixiermittel enthaltendes photographisches material
DE2020939C3 (de) Photographisches Aufzeichnungsmaterial
DE2360350A1 (de) Verfahren zur photopolymerisation aethylenisch ungesaettigter verbindungen
DE2125457A1 (de) Photopolymerisierbare Kunststoffmasse
DE2510873C3 (de) Photographisches Aufzeichnungsverfahren
DE2230936C3 (de) Lichtempfindliches Gemisch
DE2723613C2 (fr)
DE1643765A1 (de) Strahlungsempfindliches Material
DE2525673A1 (de) Verfahren zur herstellung von stabilen polymer-bildern durch photopolymerisation in einer matrix
DE2525674A1 (de) Verfahren zur herstellung von stabilen polymer-bildern durch photopolymerisation in einer matrix
DE1770629A1 (de) Fotoelektrisches Polymerisationsverfahren
DE3537380A1 (de) Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
CH646698A5 (de) Diazoniumsalze und ein diese diazoniumsalze enthaltendes diazotypiematerial.
DE1597784A1 (de) Druckplatte mit photoaktiver Schicht
DE1901193C3 (de) Verfahren zur Herstellung von Polymerisatbildern
DE2000623B2 (de) Photographisches Verfahren zur Herstellung von Bildern
DE1282446B (de) Photopolymerisierbares Aufzeichnungsmaterial
DE2451118A1 (de) Photochromatisches gemisch, dessen verwendung zur erzeugung photochromatischer bilder und verfahren zu deren erzeugung und loeschung
DE2437632C3 (de) Photopolymerisierbares Gemisch
DE1950785A1 (de) Bildaufzeichnungsmaterial
DE2636581A1 (de) Photoresist und verfahren zu seiner herstellung
DE1772262B2 (de) Lichtvernetzbares gemisch
DE2053287A1 (de) Lichtempfindliche Photoresist Masse
DE1955070C3 (de) Lichtempfindliches silberhalogenidfreies Aufzeichnungsmaterial

Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8130 Withdrawal