DE2355531A1 - Verfahren zur herstellung von schichten reiner metalle, metalloide oder legierungen aus einem dampffoermigen fluorid derselben - Google Patents
Verfahren zur herstellung von schichten reiner metalle, metalloide oder legierungen aus einem dampffoermigen fluorid derselbenInfo
- Publication number
- DE2355531A1 DE2355531A1 DE19732355531 DE2355531A DE2355531A1 DE 2355531 A1 DE2355531 A1 DE 2355531A1 DE 19732355531 DE19732355531 DE 19732355531 DE 2355531 A DE2355531 A DE 2355531A DE 2355531 A1 DE2355531 A1 DE 2355531A1
- Authority
- DE
- Germany
- Prior art keywords
- metal
- fluoride
- source
- metalloid
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002184 metal Substances 0.000 title claims description 92
- 229910052751 metal Inorganic materials 0.000 title claims description 90
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 title claims description 45
- 238000000034 method Methods 0.000 title claims description 42
- 229910052752 metalloid Inorganic materials 0.000 title claims description 23
- 150000002738 metalloids Chemical class 0.000 title claims description 23
- 230000008569 process Effects 0.000 title claims description 19
- 150000002739 metals Chemical class 0.000 title claims description 17
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 229910045601 alloy Inorganic materials 0.000 title claims description 10
- 239000000956 alloy Substances 0.000 title claims description 10
- 239000000758 substrate Substances 0.000 claims description 25
- 238000000576 coating method Methods 0.000 claims description 16
- 150000002222 fluorine compounds Chemical class 0.000 claims description 14
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 12
- 229910052721 tungsten Inorganic materials 0.000 claims description 12
- 239000010937 tungsten Substances 0.000 claims description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 10
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical group [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 7
- 239000010949 copper Substances 0.000 claims description 7
- 239000011737 fluorine Substances 0.000 claims description 6
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 229910052750 molybdenum Inorganic materials 0.000 claims description 6
- 239000011733 molybdenum Substances 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 229910001512 metal fluoride Inorganic materials 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052793 cadmium Inorganic materials 0.000 claims description 3
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims description 3
- 230000000694 effects Effects 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 239000011701 zinc Substances 0.000 claims description 3
- -1 PtF 6 Inorganic materials 0.000 claims description 2
- 229910019595 ReF 6 Inorganic materials 0.000 claims description 2
- 229910004529 TaF 5 Inorganic materials 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- WSWMGHRLUYADNA-UHFFFAOYSA-N 7-nitro-1,2,3,4-tetrahydroquinoline Chemical group C1CCNC2=CC([N+](=O)[O-])=CC=C21 WSWMGHRLUYADNA-UHFFFAOYSA-N 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 229910015275 MoF 6 Inorganic materials 0.000 claims 1
- 229910019800 NbF 5 Inorganic materials 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- SZMZREIADCOWQA-UHFFFAOYSA-N chromium cobalt nickel Chemical compound [Cr].[Co].[Ni] SZMZREIADCOWQA-UHFFFAOYSA-N 0.000 claims 1
- BIJOYKCOMBZXAE-UHFFFAOYSA-N chromium iron nickel Chemical compound [Cr].[Fe].[Ni] BIJOYKCOMBZXAE-UHFFFAOYSA-N 0.000 claims 1
- YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 claims 1
- 229910002804 graphite Inorganic materials 0.000 claims 1
- 239000010439 graphite Substances 0.000 claims 1
- 238000005245 sintering Methods 0.000 claims 1
- 210000003371 toe Anatomy 0.000 claims 1
- 239000007789 gas Substances 0.000 description 18
- 238000000151 deposition Methods 0.000 description 15
- 230000008021 deposition Effects 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 12
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- 239000012808 vapor phase Substances 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 7
- 235000013405 beer Nutrition 0.000 description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical group F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 125000001153 fluoro group Chemical group F* 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 3
- 238000003795 desorption Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000001465 metallisation Methods 0.000 description 3
- 238000011946 reduction process Methods 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000005979 thermal decomposition reaction Methods 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 239000012025 fluorinating agent Substances 0.000 description 2
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- 238000001947 vapour-phase growth Methods 0.000 description 2
- 241000282461 Canis lupus Species 0.000 description 1
- 229910021593 Copper(I) fluoride Inorganic materials 0.000 description 1
- 229910016509 CuF 2 Inorganic materials 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- 229910018054 Ni-Cu Inorganic materials 0.000 description 1
- 229910018481 Ni—Cu Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000002144 chemical decomposition reaction Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000010431 corundum Substances 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 101150092645 fliF gene Proteins 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000000844 transformation Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7239334A FR2205583B1 (fr) | 1972-11-07 | 1972-11-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2355531A1 true DE2355531A1 (de) | 1974-05-09 |
Family
ID=9106742
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19732355531 Pending DE2355531A1 (de) | 1972-11-07 | 1973-11-07 | Verfahren zur herstellung von schichten reiner metalle, metalloide oder legierungen aus einem dampffoermigen fluorid derselben |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3911194A (fr) |
| JP (1) | JPS4995832A (fr) |
| DE (1) | DE2355531A1 (fr) |
| FR (1) | FR2205583B1 (fr) |
| GB (1) | GB1406394A (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3025680A1 (de) * | 1980-07-07 | 1982-02-04 | Siemens AG, 1000 Berlin und 8000 München | Heizkoerper fuer einen hochtemperaturofen |
| EP0116188A1 (fr) * | 1983-01-08 | 1984-08-22 | Philips Patentverwaltung GmbH | Procédé pour la fabrication d'une electrode pour lampe à décharge dans un gaz sous pression élévée |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2737532C2 (de) * | 1977-08-19 | 1979-05-10 | Kraftwerk Union Ag, 4330 Muelheim | Verfahren zum Schutz der Hüllrohre von Kernreaktorbrennstäben |
| US4196230A (en) * | 1978-09-15 | 1980-04-01 | Gibson James O | Production of carbon fiber-tantalum carbide composites |
| US4343963A (en) * | 1979-03-02 | 1982-08-10 | Westinghouse Electric Corp. | Substrate for silicon solar cells |
| US4402771A (en) * | 1979-03-02 | 1983-09-06 | Westinghouse Electric Corp. | Substrate for silicon solar cells |
| JPS55134170A (en) * | 1979-04-04 | 1980-10-18 | Oyo Kagaku Kenkyusho | Manufacture of deformed tungusten structure |
| JPS5948873B2 (ja) * | 1980-05-14 | 1984-11-29 | ペルメレック電極株式会社 | 耐食性被覆を設けた電極基体又は電極の製造方法 |
| US4681652A (en) * | 1980-06-05 | 1987-07-21 | Rogers Leo C | Manufacture of polycrystalline silicon |
| US4386137A (en) * | 1981-09-10 | 1983-05-31 | Nobuatsu Watanabe | Process for producing a graphite fluoride type film on the surface of an aluminum substrate |
| US4387962A (en) * | 1981-10-06 | 1983-06-14 | The United States Of America As Represented By The Secretary Of The Air Force | Corrosion resistant laser mirror heat exchanger |
| FR2527226B1 (fr) * | 1982-05-19 | 1986-02-21 | Creusot Loire | Procede de revetement en phase gazeuse de petits orifices menages dans des pieces en aciers |
| US4540607A (en) * | 1983-08-08 | 1985-09-10 | Gould, Inc. | Selective LPCVD tungsten deposition by the silicon reduction method |
| US4751044A (en) * | 1985-08-15 | 1988-06-14 | Westinghouse Electric Corp. | Composite nuclear fuel cladding tubing and other core internal structures with improved corrosion resistance |
| US4741928A (en) * | 1985-12-27 | 1988-05-03 | General Electric Company | Method for selective deposition of tungsten by chemical vapor deposition onto metal and semiconductor surfaces |
| JPS63203772A (ja) * | 1987-02-20 | 1988-08-23 | Hitachi Ltd | 銅薄膜の気相成長方法 |
| FR2629839B1 (fr) * | 1988-04-07 | 1991-03-22 | Pauleau Yves | Procede de depot de metaux refractaires |
| GB9203394D0 (en) * | 1992-02-18 | 1992-04-01 | Johnson Matthey Plc | Coated article |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2856312A (en) * | 1953-07-03 | 1958-10-14 | Nowak Rudolf | Treating metal surfaces |
| US2887407A (en) * | 1957-08-05 | 1959-05-19 | Manufacturers Chemical Corp | Preparation of diffusion coatings on metals |
| US3414428A (en) * | 1964-10-20 | 1968-12-03 | Allied Chem | Chromizing compositions and methods and continuous production of chromium halides for chromizing |
| US3373018A (en) * | 1965-02-17 | 1968-03-12 | Allied Chem | Production of rigid shapes of refractory metals by decomposition of the metal hexafluoride in the interstices of a green compact |
| US3516850A (en) * | 1966-09-16 | 1970-06-23 | Texas Instruments Inc | Process for metal coating a hydrogen permeable material |
| US3658577A (en) * | 1969-10-01 | 1972-04-25 | Gene F Wakefield | Vapor phase deposition of silicide refractory coatings |
-
1972
- 1972-11-07 FR FR7239334A patent/FR2205583B1/fr not_active Expired
-
1973
- 1973-11-01 US US41201673 patent/US3911194A/en not_active Expired - Lifetime
- 1973-11-02 GB GB5099773A patent/GB1406394A/en not_active Expired
- 1973-11-07 DE DE19732355531 patent/DE2355531A1/de active Pending
- 1973-11-07 JP JP12525373A patent/JPS4995832A/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3025680A1 (de) * | 1980-07-07 | 1982-02-04 | Siemens AG, 1000 Berlin und 8000 München | Heizkoerper fuer einen hochtemperaturofen |
| EP0116188A1 (fr) * | 1983-01-08 | 1984-08-22 | Philips Patentverwaltung GmbH | Procédé pour la fabrication d'une electrode pour lampe à décharge dans un gaz sous pression élévée |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1406394A (en) | 1975-09-17 |
| FR2205583B1 (fr) | 1975-09-12 |
| US3911194A (en) | 1975-10-07 |
| FR2205583A1 (fr) | 1974-05-31 |
| JPS4995832A (fr) | 1974-09-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OHJ | Non-payment of the annual fee |