DE2345095A1 - Fotoempfindliche masse - Google Patents
Fotoempfindliche masseInfo
- Publication number
- DE2345095A1 DE2345095A1 DE19732345095 DE2345095A DE2345095A1 DE 2345095 A1 DE2345095 A1 DE 2345095A1 DE 19732345095 DE19732345095 DE 19732345095 DE 2345095 A DE2345095 A DE 2345095A DE 2345095 A1 DE2345095 A1 DE 2345095A1
- Authority
- DE
- Germany
- Prior art keywords
- photosensitive
- photo
- groups
- solvent
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8932672A JPS515936B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1972-09-06 | 1972-09-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2345095A1 true DE2345095A1 (de) | 1974-03-14 |
Family
ID=13967532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19732345095 Pending DE2345095A1 (de) | 1972-09-06 | 1973-09-06 | Fotoempfindliche masse |
Country Status (7)
-
1972
- 1972-09-06 JP JP8932672A patent/JPS515936B2/ja not_active Expired
-
1973
- 1973-08-29 CA CA179,914A patent/CA993253A/en not_active Expired
- 1973-08-30 NL NL7311904A patent/NL7311904A/xx not_active Application Discontinuation
- 1973-09-05 IT IT2857773A patent/IT995284B/it active
- 1973-09-06 FR FR7332172A patent/FR2198171A1/fr not_active Withdrawn
- 1973-09-06 DE DE19732345095 patent/DE2345095A1/de active Pending
- 1973-09-06 GB GB4203373A patent/GB1449157A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| CA993253A (en) | 1976-07-20 |
| FR2198171A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-03-29 |
| IT995284B (it) | 1975-11-10 |
| JPS515936B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1976-02-24 |
| GB1449157A (en) | 1976-09-15 |
| JPS4946428A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-05-04 |
| NL7311904A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-03-08 |
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| DE2733912C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| DE2345095A1 (de) | Fotoempfindliche masse | |
| DE2329208A1 (de) | Photolack | |
| DE69308403T2 (de) | Hitzebeständige, negativ-arbeitende Photoresistzusammensetzung, lichtempfindliches Substrat und Verfahren zur Herstellung eines negativen Musters |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OHA | Expiration of time for request for examination |