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Publication of NL7311904ApublicationCriticalpatent/NL7311904A/xx
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
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Physics & Mathematics
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Spectroscopy & Molecular Physics
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General Physics & Mathematics
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Compositions Of Macromolecular Compounds
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Photosensitive Polymer And Photoresist Processing
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Macromonomer-Based Addition Polymer
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Exposure And Positioning Against Photoresist Photosensitive Materials
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