DE2312496C2 - Verfahren zur Herstellung von leicht abschälbaren Negativdruckvorlagen - Google Patents

Verfahren zur Herstellung von leicht abschälbaren Negativdruckvorlagen

Info

Publication number
DE2312496C2
DE2312496C2 DE2312496A DE2312496A DE2312496C2 DE 2312496 C2 DE2312496 C2 DE 2312496C2 DE 2312496 A DE2312496 A DE 2312496A DE 2312496 A DE2312496 A DE 2312496A DE 2312496 C2 DE2312496 C2 DE 2312496C2
Authority
DE
Germany
Prior art keywords
water
layer
film
photosensitive
polyvinyl alcohol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2312496A
Other languages
German (de)
English (en)
Other versions
DE2312496A1 (de
Inventor
Kazutoshi Soka Saitama Kimituka
Kotaro Tokio/Tokyo Nagasawa
Masahiro Kasukabe Saitama Nomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
Original Assignee
Somar Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Manufacturing Co Ltd filed Critical Somar Manufacturing Co Ltd
Publication of DE2312496A1 publication Critical patent/DE2312496A1/de
Application granted granted Critical
Publication of DE2312496C2 publication Critical patent/DE2312496C2/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE2312496A 1972-03-13 1973-03-13 Verfahren zur Herstellung von leicht abschälbaren Negativdruckvorlagen Expired DE2312496C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2546072A JPS5027402B2 (enExample) 1972-03-13 1972-03-13

Publications (2)

Publication Number Publication Date
DE2312496A1 DE2312496A1 (de) 1973-09-27
DE2312496C2 true DE2312496C2 (de) 1985-01-31

Family

ID=12166628

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2312496A Expired DE2312496C2 (de) 1972-03-13 1973-03-13 Verfahren zur Herstellung von leicht abschälbaren Negativdruckvorlagen

Country Status (2)

Country Link
JP (1) JPS5027402B2 (enExample)
DE (1) DE2312496C2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5351004A (en) * 1976-10-18 1978-05-10 Aicello Chemical Co Composition of photosensitive resin plate
JPS5534205A (en) * 1978-08-30 1980-03-10 Hitachi Ltd Photosensitive composition
JPS5858546A (ja) * 1981-10-02 1983-04-07 Kimoto & Co Ltd 製版用感光性マスク材料

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE686123C (de) * 1935-06-05 1940-01-03 Chemische Forschungs Gmbh Verfahren zur Veraenderung der Eigenschaften von Polyvinylalkoholen und ihren Derivaten
DE754015C (de) * 1940-02-24 1953-05-11 Johannes Dr Albrecht Lichtempfindliche Schicht zur Herstellung von Druckformen
GB1165832A (en) * 1967-05-12 1969-10-01 Ilford Ltd Photographic Silver Halide Emulsions of the Print-Out Type

Also Published As

Publication number Publication date
DE2312496A1 (de) 1973-09-27
JPS4893401A (enExample) 1973-12-03
JPS5027402B2 (enExample) 1975-09-08

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Legal Events

Date Code Title Description
OD Request for examination
8128 New person/name/address of the agent

Representative=s name: KOHLER, M., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 80

D2 Grant after examination
8364 No opposition during term of opposition