DE2218967A1 - Stoffe zur Nickelplattierung und Verwendung - Google Patents
Stoffe zur Nickelplattierung und VerwendungInfo
- Publication number
- DE2218967A1 DE2218967A1 DE19722218967 DE2218967A DE2218967A1 DE 2218967 A1 DE2218967 A1 DE 2218967A1 DE 19722218967 DE19722218967 DE 19722218967 DE 2218967 A DE2218967 A DE 2218967A DE 2218967 A1 DE2218967 A1 DE 2218967A1
- Authority
- DE
- Germany
- Prior art keywords
- nickel
- acid
- groups
- bath
- salts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 45
- 229910052759 nickel Inorganic materials 0.000 title claims description 23
- 238000007747 plating Methods 0.000 title claims description 19
- 239000000126 substance Substances 0.000 title description 6
- 150000003839 salts Chemical class 0.000 claims description 6
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 5
- -1 m-benzene disulfonic acid p-benzenedisulfonic acid o-benzenedisulfonic acid Chemical compound 0.000 claims description 5
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims description 4
- 239000011260 aqueous acid Substances 0.000 claims description 3
- 230000000712 assembly Effects 0.000 claims description 3
- 238000000429 assembly Methods 0.000 claims description 3
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 claims description 3
- 229940092714 benzenesulfonic acid Drugs 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 3
- 229910052770 Uranium Inorganic materials 0.000 claims description 2
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 claims description 2
- DNYWZCXLKNTFFI-UHFFFAOYSA-N uranium Chemical compound [U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U] DNYWZCXLKNTFFI-UHFFFAOYSA-N 0.000 claims description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims 1
- VFEPFSLUHQWVNT-UHFFFAOYSA-N naphthalene-1-sulfonic acid;naphthalene-2-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21.C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 VFEPFSLUHQWVNT-UHFFFAOYSA-N 0.000 claims 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims 1
- UQPSGBZICXWIAG-UHFFFAOYSA-L nickel(2+);dibromide;trihydrate Chemical compound O.O.O.Br[Ni]Br UQPSGBZICXWIAG-UHFFFAOYSA-L 0.000 claims 1
- 239000003758 nuclear fuel Substances 0.000 claims 1
- 239000000243 solution Substances 0.000 description 16
- 229910021585 Nickel(II) bromide Inorganic materials 0.000 description 12
- IPLJNQFXJUCRNH-UHFFFAOYSA-L nickel(2+);dibromide Chemical compound [Ni+2].[Br-].[Br-] IPLJNQFXJUCRNH-UHFFFAOYSA-L 0.000 description 12
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical class [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 10
- 238000001556 precipitation Methods 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- 150000002815 nickel Chemical class 0.000 description 8
- 239000000654 additive Substances 0.000 description 7
- 150000003460 sulfonic acids Chemical class 0.000 description 7
- 239000002253 acid Substances 0.000 description 5
- 239000000446 fuel Substances 0.000 description 5
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 4
- 239000004327 boric acid Substances 0.000 description 4
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 4
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 4
- 230000001105 regulatory effect Effects 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- MIAUJDCQDVWHEV-UHFFFAOYSA-N benzene-1,2-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1S(O)(=O)=O MIAUJDCQDVWHEV-UHFFFAOYSA-N 0.000 description 2
- 150000001649 bromium compounds Chemical class 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 150000003841 chloride salts Chemical class 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 2
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical class NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- CKYKNSRRNDUJPY-UHFFFAOYSA-N alumane;uranium Chemical class [AlH3].[U] CKYKNSRRNDUJPY-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- WRUAHXANJKHFIL-UHFFFAOYSA-N benzene-1,3-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC(S(O)(=O)=O)=C1 WRUAHXANJKHFIL-UHFFFAOYSA-N 0.000 description 1
- OATNQHYJXLHTEW-UHFFFAOYSA-N benzene-1,4-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(S(O)(=O)=O)C=C1 OATNQHYJXLHTEW-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000003197 gene knockdown Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- KVBGVZZKJNLNJU-UHFFFAOYSA-N naphthalene-2-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-N 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13706271A | 1971-04-23 | 1971-04-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2218967A1 true DE2218967A1 (de) | 1972-11-09 |
Family
ID=22475670
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19722218967 Pending DE2218967A1 (de) | 1971-04-23 | 1972-04-19 | Stoffe zur Nickelplattierung und Verwendung |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3726768A (OSRAM) |
| BE (1) | BE781965A (OSRAM) |
| DE (1) | DE2218967A1 (OSRAM) |
| FR (1) | FR2134419B1 (OSRAM) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997000980A1 (en) * | 1995-06-21 | 1997-01-09 | Peter Torben Tang | An electroplating method of forming platings of nickel, cobalt, nickel alloys or cobalt alloys |
| DE10061186C1 (de) * | 2000-12-07 | 2002-01-17 | Astrium Gmbh | Verfahren und Anordnung zur galvanischen Abscheidung von Nickel, Kobalt, Nickellegierungen oder Kobaltlegierungen mit periodischen Strompulsen und Verwendung des Verfahrens |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4846941A (en) * | 1986-07-01 | 1989-07-11 | E. I. Du Pont De Nemours And Company | Electroplating bath and process for maintaining plated alloy composition stable |
| US4743346A (en) * | 1986-07-01 | 1988-05-10 | E. I. Du Pont De Nemours And Company | Electroplating bath and process for maintaining plated alloy composition stable |
| US4849303A (en) * | 1986-07-01 | 1989-07-18 | E. I. Du Pont De Nemours And Company | Alloy coatings for electrical contacts |
| DE68909984T2 (de) * | 1988-04-01 | 1994-04-21 | Du Pont | Elektroplattierte Legierungsbeschichtungen, die eine stabile Legierungszusammensetzung aufweisen. |
| CA2236933A1 (en) * | 1997-06-18 | 1998-12-18 | Atotech Deutschland Gmbh | Electroplating of low-stress nickel |
| US9689518B2 (en) | 2009-03-12 | 2017-06-27 | Jason GAYER | Retaining ring for pressure vessel connection |
| CN108866594B (zh) * | 2018-08-20 | 2020-07-28 | 中国原子能科学研究院 | 一种用于铀箔镀镍的电镀液及其电镀方法 |
-
1971
- 1971-04-23 US US00137062A patent/US3726768A/en not_active Expired - Lifetime
-
1972
- 1972-04-12 BE BE781965A patent/BE781965A/xx unknown
- 1972-04-19 DE DE19722218967 patent/DE2218967A1/de active Pending
- 1972-04-21 FR FR7214290A patent/FR2134419B1/fr not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997000980A1 (en) * | 1995-06-21 | 1997-01-09 | Peter Torben Tang | An electroplating method of forming platings of nickel, cobalt, nickel alloys or cobalt alloys |
| DE10061186C1 (de) * | 2000-12-07 | 2002-01-17 | Astrium Gmbh | Verfahren und Anordnung zur galvanischen Abscheidung von Nickel, Kobalt, Nickellegierungen oder Kobaltlegierungen mit periodischen Strompulsen und Verwendung des Verfahrens |
| EP1213372A2 (de) | 2000-12-07 | 2002-06-12 | Astrium GmbH | Verfahren und Anordnung zur galvanischen Abscheidung von Nickel, Kobalt, Nickellegierungen oder Kobaltlegierungen mit periodischen Strompulsen und Verwendung des Verfahrens |
| US6790332B2 (en) | 2000-12-07 | 2004-09-14 | Astrium Gmbh | Method for the galvanic deposition of nickel, cobalt, nickel alloys or cobalt alloys with periodic current pulses |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2134419A1 (OSRAM) | 1972-12-08 |
| BE781965A (fr) | 1972-07-31 |
| FR2134419B1 (OSRAM) | 1975-06-20 |
| US3726768A (en) | 1973-04-10 |
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