DE2148120C3 - Verfahren zum Niederschlagen von Glasfilmen - Google Patents

Verfahren zum Niederschlagen von Glasfilmen

Info

Publication number
DE2148120C3
DE2148120C3 DE2148120A DE2148120A DE2148120C3 DE 2148120 C3 DE2148120 C3 DE 2148120C3 DE 2148120 A DE2148120 A DE 2148120A DE 2148120 A DE2148120 A DE 2148120A DE 2148120 C3 DE2148120 C3 DE 2148120C3
Authority
DE
Germany
Prior art keywords
lead
moisture
temperature
heated
semiconductor substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2148120A
Other languages
German (de)
English (en)
Other versions
DE2148120B2 (de
DE2148120A1 (de
Inventor
Paul Ja-Min Wappinger Falls N.Y. Tsang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE2148120A1 publication Critical patent/DE2148120A1/de
Publication of DE2148120B2 publication Critical patent/DE2148120B2/de
Application granted granted Critical
Publication of DE2148120C3 publication Critical patent/DE2148120C3/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • H10P14/6334—
    • H10P14/6686—
    • H10P14/6923—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
  • Glass Compositions (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)
DE2148120A 1970-11-23 1971-09-27 Verfahren zum Niederschlagen von Glasfilmen Expired DE2148120C3 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US9163970A 1970-11-23 1970-11-23

Publications (3)

Publication Number Publication Date
DE2148120A1 DE2148120A1 (de) 1972-05-25
DE2148120B2 DE2148120B2 (de) 1981-07-23
DE2148120C3 true DE2148120C3 (de) 1982-04-29

Family

ID=22228857

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2148120A Expired DE2148120C3 (de) 1970-11-23 1971-09-27 Verfahren zum Niederschlagen von Glasfilmen

Country Status (4)

Country Link
US (1) US3706597A (enExample)
DE (1) DE2148120C3 (enExample)
FR (1) FR2115166B1 (enExample)
GB (1) GB1366330A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4144684A (en) * 1974-06-14 1979-03-20 Pilkington Brothers Limited Glazing unit
US4098923A (en) * 1976-06-07 1978-07-04 Motorola, Inc. Pyrolytic deposition of silicon dioxide on semiconductors using a shrouded boat
JPS57201527A (en) * 1981-06-01 1982-12-10 Toshiba Corp Ion implantation method
GB2131611B (en) * 1982-11-17 1986-11-12 Standard Telephones Cables Ltd Dielectric materials
EP0141496A1 (en) * 1983-08-31 1985-05-15 Morton Thiokol, Inc. Process for deposition silicon dioxide containing dopant onto a substrate
US4557950A (en) * 1984-05-18 1985-12-10 Thermco Systems, Inc. Process for deposition of borophosphosilicate glass
KR870000750A (ko) * 1985-06-14 1987-02-20 이마드 마하윌리 이산화실리콘 필름을 화학적으로 증기피복하는 방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3447958A (en) * 1964-03-06 1969-06-03 Hitachi Ltd Surface treatment for semiconductor devices
US3481781A (en) * 1967-03-17 1969-12-02 Rca Corp Silicate glass coating of semiconductor devices

Also Published As

Publication number Publication date
GB1366330A (en) 1974-09-11
FR2115166A1 (enExample) 1972-07-07
US3706597A (en) 1972-12-19
DE2148120B2 (de) 1981-07-23
FR2115166B1 (enExample) 1974-05-10
DE2148120A1 (de) 1972-05-25

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Legal Events

Date Code Title Description
OD Request for examination
C3 Grant after two publication steps (3rd publication)
8339 Ceased/non-payment of the annual fee