FR2115166A1 - - Google Patents

Info

Publication number
FR2115166A1
FR2115166A1 FR7137751A FR7137751A FR2115166A1 FR 2115166 A1 FR2115166 A1 FR 2115166A1 FR 7137751 A FR7137751 A FR 7137751A FR 7137751 A FR7137751 A FR 7137751A FR 2115166 A1 FR2115166 A1 FR 2115166A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7137751A
Other languages
French (fr)
Other versions
FR2115166B1 (enExample
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2115166A1 publication Critical patent/FR2115166A1/fr
Application granted granted Critical
Publication of FR2115166B1 publication Critical patent/FR2115166B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • H10P14/6334—
    • H10P14/6686—
    • H10P14/6923—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
  • Glass Compositions (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)
FR7137751A 1970-11-23 1971-10-12 Expired FR2115166B1 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US9163970A 1970-11-23 1970-11-23

Publications (2)

Publication Number Publication Date
FR2115166A1 true FR2115166A1 (enExample) 1972-07-07
FR2115166B1 FR2115166B1 (enExample) 1974-05-10

Family

ID=22228857

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7137751A Expired FR2115166B1 (enExample) 1970-11-23 1971-10-12

Country Status (4)

Country Link
US (1) US3706597A (enExample)
DE (1) DE2148120C3 (enExample)
FR (1) FR2115166B1 (enExample)
GB (1) GB1366330A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0141496A1 (en) * 1983-08-31 1985-05-15 Morton Thiokol, Inc. Process for deposition silicon dioxide containing dopant onto a substrate

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4144684A (en) * 1974-06-14 1979-03-20 Pilkington Brothers Limited Glazing unit
US4098923A (en) * 1976-06-07 1978-07-04 Motorola, Inc. Pyrolytic deposition of silicon dioxide on semiconductors using a shrouded boat
JPS57201527A (en) * 1981-06-01 1982-12-10 Toshiba Corp Ion implantation method
GB2131611B (en) * 1982-11-17 1986-11-12 Standard Telephones Cables Ltd Dielectric materials
US4557950A (en) * 1984-05-18 1985-12-10 Thermco Systems, Inc. Process for deposition of borophosphosilicate glass
KR870000750A (ko) * 1985-06-14 1987-02-20 이마드 마하윌리 이산화실리콘 필름을 화학적으로 증기피복하는 방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3447958A (en) * 1964-03-06 1969-06-03 Hitachi Ltd Surface treatment for semiconductor devices
US3481781A (en) * 1967-03-17 1969-12-02 Rca Corp Silicate glass coating of semiconductor devices

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0141496A1 (en) * 1983-08-31 1985-05-15 Morton Thiokol, Inc. Process for deposition silicon dioxide containing dopant onto a substrate

Also Published As

Publication number Publication date
GB1366330A (en) 1974-09-11
US3706597A (en) 1972-12-19
DE2148120C3 (de) 1982-04-29
DE2148120B2 (de) 1981-07-23
FR2115166B1 (enExample) 1974-05-10
DE2148120A1 (de) 1972-05-25

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Legal Events

Date Code Title Description
ST Notification of lapse