DE2003558A1 - Feldeffekttransistor - Google Patents

Feldeffekttransistor

Info

Publication number
DE2003558A1
DE2003558A1 DE19702003558 DE2003558A DE2003558A1 DE 2003558 A1 DE2003558 A1 DE 2003558A1 DE 19702003558 DE19702003558 DE 19702003558 DE 2003558 A DE2003558 A DE 2003558A DE 2003558 A1 DE2003558 A1 DE 2003558A1
Authority
DE
Germany
Prior art keywords
channel
drain
effect transistor
field effect
drain region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19702003558
Other languages
German (de)
English (en)
Inventor
Yutaka Hayashi
Toshihiro Sekigawa
Yasuo Tarui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Publication of DE2003558A1 publication Critical patent/DE2003558A1/de
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/64Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/66Vertical DMOS [VDMOS] FETs
    • H10D30/668Vertical DMOS [VDMOS] FETs having trench gate electrodes, e.g. UMOS transistors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/64Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/65Lateral DMOS [LDMOS] FETs
    • H10D30/658Lateral DMOS [LDMOS] FETs having trench gate electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311Gate electrodes for field-effect devices
    • H10D64/411Gate electrodes for field-effect devices for FETs
    • H10D64/511Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/512Disposition of the gate electrodes, e.g. buried gates
    • H10D64/513Disposition of the gate electrodes, e.g. buried gates within recesses in the substrate, e.g. trench gates, groove gates or buried gates

Landscapes

  • Junction Field-Effect Transistors (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
DE19702003558 1969-01-27 1970-01-27 Feldeffekttransistor Pending DE2003558A1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP526869 1969-01-27
JP526969 1969-01-27
JP9572269 1969-12-01

Publications (1)

Publication Number Publication Date
DE2003558A1 true DE2003558A1 (de) 1970-07-30

Family

ID=27276681

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19702003558 Pending DE2003558A1 (de) 1969-01-27 1970-01-27 Feldeffekttransistor

Country Status (3)

Country Link
DE (1) DE2003558A1 (enrdf_load_stackoverflow)
GB (1) GB1301702A (enrdf_load_stackoverflow)
NL (1) NL7001150A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4219835A (en) * 1978-02-17 1980-08-26 Siliconix, Inc. VMOS Mesa structure and manufacturing process
GB2129216B (en) * 1982-10-12 1985-12-18 Secr Defence Field effect transistors

Also Published As

Publication number Publication date
NL7001150A (enrdf_load_stackoverflow) 1970-07-29
GB1301702A (enrdf_load_stackoverflow) 1973-01-04

Similar Documents

Publication Publication Date Title
DE3853778T2 (de) Verfahren zur Herstellung eines Halbleiterbauelements.
DE4219319B4 (de) MOS-FET und Herstellungsverfahren dafür
DE2853736C2 (de) Feldeffektanordnung
DE69029942T2 (de) Verfahren zur Herstellung von MOS-Leistungstransistoren mit vertikalem Strom
DE19743342C2 (de) Feldeffekttransistor hoher Packungsdichte und Verfahren zu seiner Herstellung
DE69030415T2 (de) Verfahren zur Herstellung eines DMOS Transistors
DE19642538A1 (de) Halbleitereinrichtung und Herstellungsverfahren derselben
DE68928326T2 (de) Eingeschlossener transistor mit eingegrabenem kanal
DE10203164A1 (de) Leistungshalbleiterbauelement und Verfahren zu dessen Herstellung
DE2242026A1 (de) Mis-feldeffekttransistor
EP0080523A1 (de) Verfahren zum Herstellen einer monolithisch integrierten Schaltung mit mindestens einem Paar von komplementären Feldeffekttransistoren und mindestens einem Bipolartransistor
DE19535140A1 (de) Lateraler MOSFET mit hoher Stehspannung und einem Graben sowie Verfahren zu dessen Herstellung
DE2700873A1 (de) Verfahren zur herstellung von komplementaeren isolierschicht-feldeffekttransistoren
DE10220359A1 (de) Siliziumkarbidhalbleitervorrichtung und Herstellungsverfahren
DE2028146A1 (de) Transistoren und Verfahren zu deren Herstellung
DE69518178T2 (de) Dünnfilmtransistor mit einer Drainversatzzone
EP0033003A2 (de) Zweifach diffundierter Metalloxidsilicium-Feldeffekttransistor und Verfahren zu seiner Herstellung
DE4208537A1 (de) Mos-fet-struktur
DE102005035029A1 (de) Halbleiterbauteil und Verfahren zu seiner Herstellung
DE3214893A1 (de) Halbleiteranordnung
DE2902368A1 (de) Komplementaer-mos-inverter
DE2064886A1 (de) Integrierte Schaltung mit Feldeffekt transistoren Ausscheidung aus 2047672
DE1614300B2 (de) Feldeffekttransistor mit isolierter Steuerelektrode
DE2160462A1 (de) Halbleiteranordnung und verfahren zur herstellung dieser halbleiteranordnung.
DE2447354A1 (de) Verfahren zur herstellung eines feldeffekttransistors

Legal Events

Date Code Title Description
SH Request for examination between 03.10.1968 and 22.04.1971