DE1147817B - Verfahren zum galvanischen Abscheiden eines Nickel-Eisen-UEberzuges - Google Patents
Verfahren zum galvanischen Abscheiden eines Nickel-Eisen-UEberzugesInfo
- Publication number
- DE1147817B DE1147817B DES76109A DES0076109A DE1147817B DE 1147817 B DE1147817 B DE 1147817B DE S76109 A DES76109 A DE S76109A DE S0076109 A DES0076109 A DE S0076109A DE 1147817 B DE1147817 B DE 1147817B
- Authority
- DE
- Germany
- Prior art keywords
- nickel
- films
- iron
- hypophosphite
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 25
- 238000000576 coating method Methods 0.000 title claims description 8
- 230000008021 deposition Effects 0.000 title claims description 7
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 title claims description 7
- 239000011248 coating agent Substances 0.000 title claims description 5
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 claims description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 9
- 230000005291 magnetic effect Effects 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 150000001340 alkali metals Chemical class 0.000 claims description 3
- 150000002505 iron Chemical class 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 36
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 13
- 229910052742 iron Inorganic materials 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 238000004070 electrodeposition Methods 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 4
- 230000005294 ferromagnetic effect Effects 0.000 description 3
- 229910000358 iron sulfate Inorganic materials 0.000 description 3
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 230000015654 memory Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical class O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 241000080590 Niso Species 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- 239000004141 Sodium laurylsulphate Substances 0.000 description 1
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 1
- 210000001015 abdomen Anatomy 0.000 description 1
- 125000006367 bivalent amino carbonyl group Chemical group [H]N([*:1])C([*:2])=O 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- -1 hypophosphite ions Chemical class 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910001380 potassium hypophosphite Inorganic materials 0.000 description 1
- CRGPNLUFHHUKCM-UHFFFAOYSA-M potassium phosphinate Chemical compound [K+].[O-]P=O CRGPNLUFHHUKCM-UHFFFAOYSA-M 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 229940081974 saccharin Drugs 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000003245 working effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
- G11B5/653—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing Fe or Ni
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/14—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/24—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids
- H01F41/26—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids using electric currents, e.g. electroplating
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemically Coating (AREA)
- Thin Magnetic Films (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US60735A US3119753A (en) | 1960-10-05 | 1960-10-05 | Method of preparing thin magnetic films |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1147817B true DE1147817B (de) | 1963-04-25 |
Family
ID=22031429
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DES76109A Pending DE1147817B (de) | 1960-10-05 | 1961-09-30 | Verfahren zum galvanischen Abscheiden eines Nickel-Eisen-UEberzuges |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3119753A (ru) |
| CH (1) | CH425393A (ru) |
| DE (1) | DE1147817B (ru) |
| GB (1) | GB950342A (ru) |
| NL (1) | NL269912A (ru) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3350180A (en) * | 1967-10-31 | Magnetic device with alternating lami- na of magnetic material and non-mag- netic metal on a substrate | ||
| US3255033A (en) * | 1961-12-28 | 1966-06-07 | Ibm | Electroless plating of a substrate with nickel-iron alloys and the coated substrate |
| US3393982A (en) * | 1962-11-08 | 1968-07-23 | Ncr Co | Ferromagnetic storage devices having uniaxial anisotropy |
| US3353986A (en) * | 1963-11-20 | 1967-11-21 | Sperry Rand Corp | Electroless deposition of cobalt-ironphosphorous magnetic material |
| FR1397417A (fr) * | 1964-03-09 | 1965-04-30 | Ibm France | Nouveaux perfectionnements aux procédés de dépôt d'une couche magnétique par voie électrolytique |
| US3297418A (en) * | 1964-04-24 | 1967-01-10 | Firestone Stanley | Magnetic thin film element and method of manufacture |
| US3354059A (en) * | 1964-08-12 | 1967-11-21 | Ibm | Electrodeposition of nickel-iron magnetic alloy films |
| US3549508A (en) * | 1965-11-19 | 1970-12-22 | Toko Inc | Process for producing magnetic thin film wire by multiple-layer electrodeposition |
| US3699553A (en) * | 1971-02-12 | 1972-10-17 | Us Navy | Nondestructive readout thin film memory device and method therefor |
| US5576099A (en) * | 1990-02-09 | 1996-11-19 | International Business Machines Corporation | Inductive head lamination with layer of magnetic quenching material |
| CN102409375B (zh) * | 2011-12-01 | 2014-07-09 | 广州市海珠区金穗达表面技术发展中心 | 一种镍磷合金电镀液及其使用方法 |
| CN104451829B (zh) * | 2014-11-20 | 2017-06-27 | 长沙理工大学 | 一种镍‑铁‑磷/纳米v8c7复合电镀液 |
| CN106381510A (zh) * | 2016-12-06 | 2017-02-08 | 刘志红 | 一种Ni‑Fe‑P合金基复合镀层的制备工艺 |
| CN106757287A (zh) * | 2016-12-06 | 2017-05-31 | 刘志红 | 一种Fe‑Ni‑P基复合镀层的制备工艺 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2644787A (en) * | 1950-01-05 | 1953-07-07 | Eckert Mauchly Comp Corp | Electrodeposition of a magnetic coating |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1965399A (en) * | 1929-06-25 | 1934-07-03 | Western Electric Co | Method of and apparatus for electro-chemically producing articles |
| US2643221A (en) * | 1950-11-30 | 1953-06-23 | Us Army | Electrodeposition of phosphorusnickel and phosphorus-cobalt alloys |
| NL243931A (ru) * | 1958-10-01 |
-
0
- NL NL269912D patent/NL269912A/xx unknown
-
1960
- 1960-10-05 US US60735A patent/US3119753A/en not_active Expired - Lifetime
-
1961
- 1961-09-27 GB GB34704/61A patent/GB950342A/en not_active Expired
- 1961-09-30 DE DES76109A patent/DE1147817B/de active Pending
- 1961-10-04 CH CH1154261A patent/CH425393A/it unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2644787A (en) * | 1950-01-05 | 1953-07-07 | Eckert Mauchly Comp Corp | Electrodeposition of a magnetic coating |
Also Published As
| Publication number | Publication date |
|---|---|
| US3119753A (en) | 1964-01-28 |
| CH425393A (it) | 1966-11-30 |
| GB950342A (en) | 1964-02-26 |
| NL269912A (ru) |
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