DE102014213775B4 - Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen, kristallinen Substraten, insbesondere von Halbleitersubstraten - Google Patents
Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen, kristallinen Substraten, insbesondere von Halbleitersubstraten Download PDFInfo
- Publication number
- DE102014213775B4 DE102014213775B4 DE102014213775.6A DE102014213775A DE102014213775B4 DE 102014213775 B4 DE102014213775 B4 DE 102014213775B4 DE 102014213775 A DE102014213775 A DE 102014213775A DE 102014213775 B4 DE102014213775 B4 DE 102014213775B4
- Authority
- DE
- Germany
- Prior art keywords
- substrate
- laser
- laser beam
- extended
- along
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0652—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
- B23K26/0732—Shaping the laser spot into a rectangular shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Laser Beam Processing (AREA)
- Dicing (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Priority Applications (11)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014213775.6A DE102014213775B4 (de) | 2014-07-15 | 2014-07-15 | Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen, kristallinen Substraten, insbesondere von Halbleitersubstraten |
| KR1020177003422A KR102318041B1 (ko) | 2014-07-15 | 2015-07-07 | 2차원의 결정질 기판, 특히 반도체 기판의 레이저 기반 가공을 위한 방법 및 장치 |
| EP15739207.7A EP3169475B1 (de) | 2014-07-15 | 2015-07-07 | Verfahren und vorrichtung zum laserbasierten bearbeiten von flächigen, kristallinen substraten, insbesondere von halbleitersubstraten |
| ES15739207T ES2774377T3 (es) | 2014-07-15 | 2015-07-07 | Procedimiento y dispositivo de mecanización basada en láser de sustratos cristalinos planos, especialmente sustratos semiconductores |
| US15/325,859 US10821555B2 (en) | 2014-07-15 | 2015-07-07 | Method and device for the laser-based working of two-dimensional, crystalline substrates, in particular semiconductor substrates |
| JP2017522729A JP6804441B2 (ja) | 2014-07-15 | 2015-07-07 | 平面結晶性基板、特に半導体基板のレーザ加工方法及び装置 |
| PT157392077T PT3169475T (pt) | 2014-07-15 | 2015-07-07 | Método e dispositivo para trabalhar à base de laser substratos cristalinos planos, em particular, substratos semicondutores |
| CN201580049806.2A CN107073655B (zh) | 2014-07-15 | 2015-07-07 | 基于激光加工平面晶体衬底的方法和设备 |
| LTEP15739207.7T LT3169475T (lt) | 2014-07-15 | 2015-07-07 | Būdas ir įrenginys dviejų dimensijų kristalinių padėklų, ypatingai puslaidininkinių padėklų, lazeriniu pagrindu veikiančiam apdirbimui |
| PCT/EP2015/065476 WO2016008768A1 (de) | 2014-07-15 | 2015-07-07 | Verfahren und vorrichtung zum laserbasierten bearbeiten von flächigen, kristallinen substraten, insbesondere von halbleitersubstraten |
| TW104122499A TWI688444B (zh) | 2014-07-15 | 2015-07-13 | 平面晶體基板特別是半導體基板之以雷射為主之機器加工方法與裝置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014213775.6A DE102014213775B4 (de) | 2014-07-15 | 2014-07-15 | Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen, kristallinen Substraten, insbesondere von Halbleitersubstraten |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE102014213775A1 DE102014213775A1 (de) | 2016-01-21 |
| DE102014213775B4 true DE102014213775B4 (de) | 2018-02-15 |
Family
ID=53682658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102014213775.6A Active DE102014213775B4 (de) | 2014-07-15 | 2014-07-15 | Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen, kristallinen Substraten, insbesondere von Halbleitersubstraten |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US10821555B2 (enExample) |
| EP (1) | EP3169475B1 (enExample) |
| JP (1) | JP6804441B2 (enExample) |
| KR (1) | KR102318041B1 (enExample) |
| CN (1) | CN107073655B (enExample) |
| DE (1) | DE102014213775B4 (enExample) |
| ES (1) | ES2774377T3 (enExample) |
| LT (1) | LT3169475T (enExample) |
| PT (1) | PT3169475T (enExample) |
| TW (1) | TWI688444B (enExample) |
| WO (1) | WO2016008768A1 (enExample) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2754524B1 (de) | 2013-01-15 | 2015-11-25 | Corning Laser Technologies GmbH | Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie |
| EP2781296B1 (de) | 2013-03-21 | 2020-10-21 | Corning Laser Technologies GmbH | Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser |
| US9517963B2 (en) | 2013-12-17 | 2016-12-13 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
| US11556039B2 (en) | 2013-12-17 | 2023-01-17 | Corning Incorporated | Electrochromic coated glass articles and methods for laser processing the same |
| CN106687419A (zh) | 2014-07-08 | 2017-05-17 | 康宁股份有限公司 | 用于激光处理材料的方法和设备 |
| US11648623B2 (en) | 2014-07-14 | 2023-05-16 | Corning Incorporated | Systems and methods for processing transparent materials using adjustable laser beam focal lines |
| HUE055461T2 (hu) | 2015-03-24 | 2021-11-29 | Corning Inc | Kijelzõ üveg kompozíciók lézeres vágása és feldolgozása |
| EP3319911B1 (en) | 2015-07-10 | 2023-04-19 | Corning Incorporated | Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same |
| JP6755707B2 (ja) * | 2016-05-12 | 2020-09-16 | 株式会社ディスコ | レーザー加工装置 |
| LT3311947T (lt) | 2016-09-30 | 2019-12-27 | Corning Incorporated | Skaidrių ruošinių lazerinio apdirbimo, naudojant spindulių pluošto dėmes be simetrijos ašių, būdas |
| CN109803786B (zh) | 2016-09-30 | 2021-05-07 | 康宁股份有限公司 | 使用非轴对称束斑对透明工件进行激光加工的设备和方法 |
| US11542190B2 (en) | 2016-10-24 | 2023-01-03 | Corning Incorporated | Substrate processing station for laser-based machining of sheet-like glass substrates |
| DE102017206461B4 (de) | 2017-04-13 | 2019-05-02 | Schott Ag | Vorrichtung und Verfahren zum laserbasierten Trennen eines transparenten, sprödbrechenden Werkstücks |
| DE102018201596A1 (de) * | 2018-02-02 | 2019-08-08 | Forschungsverbund Berlin E.V. | Verfahren und Vorrichtung zur direkten Strukturierung mittels Laserstrahlung |
| KR102797419B1 (ko) | 2019-11-25 | 2025-04-21 | 삼성전자주식회사 | 기판 다이싱 방법, 반도체 소자의 제조 방법 및 그들에 의해 제조되는 반도체 칩 |
| JP7564719B2 (ja) * | 2021-01-28 | 2024-10-09 | 浜松ホトニクス株式会社 | レーザ加工装置及びレーザ加工方法 |
| WO2022185096A1 (en) | 2021-03-03 | 2022-09-09 | Uab Altechna R&B | Laser beam transforming element |
| KR20240007769A (ko) * | 2021-06-02 | 2024-01-16 | 트룸프 레이저-운트 시스템테크닉 게엠베하 | 공작물의 레이저 가공을 위한 방법 및 장치 |
| CN113866992B (zh) * | 2021-09-10 | 2022-07-12 | 华中科技大学 | 一种在太赫兹波段产生无衍射光束的球谐锥透镜 |
| US20240402507A1 (en) * | 2021-10-01 | 2024-12-05 | Tekjp, Inc. | Narrow beam generation device |
| CN114678431B (zh) * | 2022-03-21 | 2024-11-26 | 上海集成电路制造创新中心有限公司 | 一种光电探测器的制备方法 |
| DE102022115711A1 (de) | 2022-06-23 | 2023-12-28 | Schott Ag | Verfahren und Vorrichtung zum Bearbeiten von Werkstücken |
| KR20250091186A (ko) * | 2022-08-17 | 2025-06-20 | 닐슨 싸이언티픽, 엘엘씨 | 병렬화된 3차원 반도체 제조 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6472295B1 (en) * | 1999-08-27 | 2002-10-29 | Jmar Research, Inc. | Method and apparatus for laser ablation of a target material |
| EP1338371A1 (en) * | 2000-09-13 | 2003-08-27 | Hamamatsu Photonics K. K. | Laser beam machining method and laser beam machining device |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3531199B2 (ja) * | 1994-02-22 | 2004-05-24 | 三菱電機株式会社 | 光伝送装置 |
| US5776220A (en) * | 1994-09-19 | 1998-07-07 | Corning Incorporated | Method and apparatus for breaking brittle materials |
| JP3338927B2 (ja) * | 1998-05-22 | 2002-10-28 | 住友重機械工業株式会社 | レーザ穴あけ加工装置用のデスミア装置及びデスミア方法 |
| JP2000015467A (ja) * | 1998-07-01 | 2000-01-18 | Shin Meiwa Ind Co Ltd | 光による被加工材の加工方法および加工装置 |
| JP2000288766A (ja) * | 1999-04-07 | 2000-10-17 | Kubota Corp | レーザ加工装置 |
| KR100673073B1 (ko) * | 2000-10-21 | 2007-01-22 | 삼성전자주식회사 | 레이저 빔을 이용한 비금속 기판의 절단 방법 및 장치 |
| US6720522B2 (en) * | 2000-10-26 | 2004-04-13 | Kabushiki Kaisha Toshiba | Apparatus and method for laser beam machining, and method for manufacturing semiconductor devices using laser beam machining |
| JP3624909B2 (ja) * | 2002-03-12 | 2005-03-02 | 浜松ホトニクス株式会社 | レーザ加工方法 |
| JP2004103628A (ja) * | 2002-09-05 | 2004-04-02 | Hitachi Ltd | レーザアニール装置及びtft基板のレーザアニール方法 |
| FR2855084A1 (fr) * | 2003-05-22 | 2004-11-26 | Air Liquide | Optique de focalisation pour le coupage laser |
| JP4418282B2 (ja) * | 2004-03-31 | 2010-02-17 | 株式会社レーザーシステム | レーザ加工方法 |
| JP4440036B2 (ja) * | 2004-08-11 | 2010-03-24 | 株式会社ディスコ | レーザー加工方法 |
| JP4692717B2 (ja) * | 2004-11-02 | 2011-06-01 | 澁谷工業株式会社 | 脆性材料の割断装置 |
| JP4222296B2 (ja) * | 2004-11-22 | 2009-02-12 | 住友電気工業株式会社 | レーザ加工方法とレーザ加工装置 |
| JP2006319198A (ja) * | 2005-05-13 | 2006-11-24 | Disco Abrasive Syst Ltd | ウエーハのレーザー加工方法およびレーザー加工装置 |
| DE102006042280A1 (de) * | 2005-09-08 | 2007-06-06 | IMRA America, Inc., Ann Arbor | Bearbeitung von transparentem Material mit einem Ultrakurzpuls-Laser |
| JP5013699B2 (ja) * | 2005-10-21 | 2012-08-29 | 株式会社キーエンス | 3次元加工データ設定装置、3次元加工データ設定方法、3次元加工データ設定プログラム、コンピュータで読み取り可能な記録媒体及び記録した機器並びにレーザ加工装置 |
| DE102007018400B4 (de) * | 2007-04-17 | 2009-04-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Optisches System für einen Lasermaterialbearbeitungskopf |
| JP5328209B2 (ja) * | 2007-06-15 | 2013-10-30 | 三菱電機株式会社 | 基板加工方法 |
| DE102007044298B3 (de) * | 2007-09-17 | 2009-02-26 | Coherent Gmbh | Verfahren und Anordnung zum Erzeugen eines Laserstrahls mit einem linienhaften Strahlquerschnitt |
| JP5098665B2 (ja) * | 2008-01-23 | 2012-12-12 | 株式会社東京精密 | レーザー加工装置およびレーザー加工方法 |
| JP5074272B2 (ja) * | 2008-04-15 | 2012-11-14 | 株式会社リンクスタージャパン | 脆性材料基板の加工装置および切断方法 |
| DE102010016628A1 (de) * | 2010-02-26 | 2011-09-29 | Reis Group Holding Gmbh & Co. Kg | Verfahren und Anordnung zum stoffschlüssigen Verbinden von Materialien |
| JP4948629B2 (ja) * | 2010-07-20 | 2012-06-06 | ウシオ電機株式会社 | レーザリフトオフ方法 |
| GB201014778D0 (en) * | 2010-09-06 | 2010-10-20 | Baird Brian W | Picosecond laser beam shaping assembly and a method of shaping a picosecond laser beam |
| KR101298019B1 (ko) * | 2010-12-28 | 2013-08-26 | (주)큐엠씨 | 레이저 가공 장치 |
| DE102011000768B4 (de) | 2011-02-16 | 2016-08-18 | Ewag Ag | Laserbearbeitungsverfahren und Laserbearbeitungsvorrichtung mit umschaltbarer Laseranordnung |
| US8871613B2 (en) * | 2012-06-18 | 2014-10-28 | Semiconductor Components Industries, Llc | Semiconductor die singulation method |
| JP5832412B2 (ja) * | 2012-11-12 | 2015-12-16 | 三菱重工業株式会社 | 光学系及びレーザ加工装置 |
| EP2754524B1 (de) * | 2013-01-15 | 2015-11-25 | Corning Laser Technologies GmbH | Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie |
| US9676167B2 (en) * | 2013-12-17 | 2017-06-13 | Corning Incorporated | Laser processing of sapphire substrate and related applications |
| US9517963B2 (en) * | 2013-12-17 | 2016-12-13 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
-
2014
- 2014-07-15 DE DE102014213775.6A patent/DE102014213775B4/de active Active
-
2015
- 2015-07-07 KR KR1020177003422A patent/KR102318041B1/ko active Active
- 2015-07-07 US US15/325,859 patent/US10821555B2/en active Active
- 2015-07-07 EP EP15739207.7A patent/EP3169475B1/de active Active
- 2015-07-07 LT LTEP15739207.7T patent/LT3169475T/lt unknown
- 2015-07-07 PT PT157392077T patent/PT3169475T/pt unknown
- 2015-07-07 ES ES15739207T patent/ES2774377T3/es active Active
- 2015-07-07 JP JP2017522729A patent/JP6804441B2/ja active Active
- 2015-07-07 CN CN201580049806.2A patent/CN107073655B/zh active Active
- 2015-07-07 WO PCT/EP2015/065476 patent/WO2016008768A1/de not_active Ceased
- 2015-07-13 TW TW104122499A patent/TWI688444B/zh active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6472295B1 (en) * | 1999-08-27 | 2002-10-29 | Jmar Research, Inc. | Method and apparatus for laser ablation of a target material |
| EP1338371A1 (en) * | 2000-09-13 | 2003-08-27 | Hamamatsu Photonics K. K. | Laser beam machining method and laser beam machining device |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102318041B1 (ko) | 2021-10-27 |
| TWI688444B (zh) | 2020-03-21 |
| KR20170028426A (ko) | 2017-03-13 |
| EP3169475A1 (de) | 2017-05-24 |
| TW201613710A (en) | 2016-04-16 |
| CN107073655B (zh) | 2020-01-14 |
| LT3169475T (lt) | 2020-03-10 |
| ES2774377T3 (es) | 2020-07-20 |
| WO2016008768A1 (de) | 2016-01-21 |
| DE102014213775A1 (de) | 2016-01-21 |
| EP3169475B1 (de) | 2019-12-04 |
| JP6804441B2 (ja) | 2020-12-23 |
| US20170157700A1 (en) | 2017-06-08 |
| CN107073655A (zh) | 2017-08-18 |
| PT3169475T (pt) | 2020-03-13 |
| JP2017521877A (ja) | 2017-08-03 |
| US10821555B2 (en) | 2020-11-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE102014213775B4 (de) | Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen, kristallinen Substraten, insbesondere von Halbleitersubstraten | |
| EP2754524B1 (de) | Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie | |
| EP2781296B1 (de) | Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser | |
| EP2931467B1 (de) | Verfahren zur herstellung von linienförmig aufgereihten schädigungsstellen durch ultrakurz fokussierter gepulster laserstrahlung ; verfahren und vorrichtung zum trennen eines werkstückes mittels ultrakurz fokussierter laserstrahlung unter verwendung einer schutzgasatmosphäre | |
| EP3854513B1 (de) | System zur asymmetrischen optischen strahlformung | |
| EP3083126B1 (en) | Transparent material cutting with ultrafast laser and beam optics | |
| DE112004000581B4 (de) | Verfahren zum Schneiden von Glas | |
| DE102008052006B4 (de) | Verfahren und Vorrichtung zur Herstellung von Proben für die Transmissionselektronenmikroskopie | |
| DE102014106472A1 (de) | Verfahren zum Strahlungsritzen eines Halbleitersubstrats | |
| DE112019000579T5 (de) | Bearbeitungsvorrichtung | |
| EP3624984B1 (de) | Vorrichtung und verfahren zum trennen eines werkstücks entlang einer vorbestimmten bearbeitungslinie unter verwendung eines gepulsten polychromatischen laserstrahles und eines filters | |
| WO2005115678A1 (de) | Verfahren und vorrichtung zum durchtrennen von halbleitermaterialien | |
| DE102020102077B4 (de) | Laserbearbeitungsvorrichtung und Verfahren zur Laserbearbeitung eines Werkstücks | |
| DE102019114191A1 (de) | Laserbearbeitungsvorrichtung und Verfahren zur gleichzeitigen und selektiven Bearbeitung einer Mehrzahl von Bearbeitungsstellen eines Werkstücks | |
| DE102020107760A1 (de) | Laserbearbeitungsvorrichtung und Verfahren zur Laserbearbeitung eines Werkstücks | |
| DE102019108131A1 (de) | Vorrichtung und Verfahren zur Ausbildung von VIA-Laserbohrungen | |
| WO2022122251A1 (de) | Laserbearbeitung eines materials mittels gradienten-filterelement | |
| DE102019219462A1 (de) | Verfahren zum Schneiden eines Glaselements und Schneidsystem | |
| DE102021100675B4 (de) | Verfahren zum Zerteilen eines transparenten Werkstücks | |
| DE102019112141A1 (de) | Verfahren und optisches System zur Bearbeitung eines Halbleitermaterials | |
| DE102018214742A1 (de) | Verfahren und Vorrichtung zur Lasermaterialbearbeitung eines Werkstücks mittels Photonenimpuls | |
| DE102015004347A1 (de) | Erzeugung von physischen Modifikationen mittels LASER im Inneren eines Festkörpers | |
| DE102019203493A1 (de) | Verfahren zur ultrahochaufgelösten Modifikation, insbesondere zur physischen Materialabtragung oder internen Materialänderung, eines Werkstücks | |
| DE102023201553A1 (de) | Verfahren und System zur Herstellung mikroelektronischer Komponenten mit Schichtaufbau | |
| DE10232815B4 (de) | Verfahren zur Modifizierung von dielektrischen Materialeigenschaften |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed | ||
| R016 | Response to examination communication | ||
| R016 | Response to examination communication | ||
| R018 | Grant decision by examination section/examining division | ||
| R020 | Patent grant now final | ||
| R079 | Amendment of ipc main class |
Free format text: PREVIOUS MAIN CLASS: H01L0021268000 Ipc: H10P0034420000 |