DE102012218765B4 - Halbleitervorrichtung mit innerhalb desselben Halbleitersubstrats ausgebildetem Leistungselement und Schaltungselement - Google Patents
Halbleitervorrichtung mit innerhalb desselben Halbleitersubstrats ausgebildetem Leistungselement und Schaltungselement Download PDFInfo
- Publication number
- DE102012218765B4 DE102012218765B4 DE102012218765.0A DE102012218765A DE102012218765B4 DE 102012218765 B4 DE102012218765 B4 DE 102012218765B4 DE 102012218765 A DE102012218765 A DE 102012218765A DE 102012218765 B4 DE102012218765 B4 DE 102012218765B4
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor layer
- semiconductor
- semiconductor substrate
- semiconductor device
- power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/811—Combinations of field-effect devices and one or more diodes, capacitors or resistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/40—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00 with at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of IGFETs with BJTs
- H10D84/401—Combinations of FETs or IGBTs with BJTs
- H10D84/403—Combinations of FETs or IGBTs with BJTs and with one or more of diodes, resistors or capacitors
- H10D84/406—Combinations of FETs or IGBTs with vertical BJTs and with one or more of diodes, resistors or capacitors
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Bipolar Integrated Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011-234814 | 2011-10-26 | ||
| JP2011234814A JP5618963B2 (ja) | 2011-10-26 | 2011-10-26 | 半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE102012218765A1 DE102012218765A1 (de) | 2013-05-02 |
| DE102012218765B4 true DE102012218765B4 (de) | 2019-02-07 |
Family
ID=48084554
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102012218765.0A Active DE102012218765B4 (de) | 2011-10-26 | 2012-10-15 | Halbleitervorrichtung mit innerhalb desselben Halbleitersubstrats ausgebildetem Leistungselement und Schaltungselement |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8536655B2 (enExample) |
| JP (1) | JP5618963B2 (enExample) |
| CN (1) | CN103077946B (enExample) |
| DE (1) | DE102012218765B4 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9391448B2 (en) * | 2013-09-17 | 2016-07-12 | The Boeing Company | High current event mitigation circuit |
| EP3151402B1 (en) * | 2014-05-30 | 2022-10-05 | Mitsubishi Electric Corporation | Power-semiconductor element driving circuit |
| JP6498787B2 (ja) * | 2015-12-28 | 2019-04-10 | ローム株式会社 | 半導体装置 |
| JP7227117B2 (ja) * | 2019-11-08 | 2023-02-21 | 株式会社東芝 | 半導体装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06350032A (ja) | 1993-06-08 | 1994-12-22 | Toshiba Corp | 半導体装置の配線構体 |
| JP2006156959A (ja) | 2004-10-26 | 2006-06-15 | Matsushita Electric Ind Co Ltd | 半導体装置 |
| DE102010042583A1 (de) | 2009-12-15 | 2011-06-16 | Mitsubishi Electric Corp. | Leistungshalbleitervorrichtung für Zündvorrichtung |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4933573A (en) * | 1987-09-18 | 1990-06-12 | Fuji Electric Co., Ltd. | Semiconductor integrated circuit |
| US5467050A (en) * | 1994-01-04 | 1995-11-14 | Texas Instruments Incorporated | Dynamic biasing circuit for semiconductor device |
| JP3400853B2 (ja) * | 1994-04-27 | 2003-04-28 | 三菱電機株式会社 | 半導体装置 |
| JP3532276B2 (ja) * | 1995-01-06 | 2004-05-31 | 株式会社ルネサステクノロジ | 基板バイアス回路 |
| JP4128700B2 (ja) * | 1999-09-08 | 2008-07-30 | ローム株式会社 | 誘導性負荷駆動回路 |
| JP4607291B2 (ja) | 2000-06-29 | 2011-01-05 | 三菱電機株式会社 | 半導体装置 |
| JP2005252044A (ja) * | 2004-03-05 | 2005-09-15 | Fujitsu Ten Ltd | 半導体集積回路の寄生トランジスタ発生防止装置、及び半導体集積回路の寄生トランジスタ発生防止方法 |
| US7173315B2 (en) | 2004-10-26 | 2007-02-06 | Matsushita Electric Industrial Co., Ltd. | Semiconductor device |
| JP2006332539A (ja) * | 2005-05-30 | 2006-12-07 | Sanken Electric Co Ltd | 半導体集積回路装置 |
| JP5011748B2 (ja) * | 2006-02-24 | 2012-08-29 | 株式会社デンソー | 半導体装置 |
| JP2008140824A (ja) * | 2006-11-30 | 2008-06-19 | Toshiba Corp | 半導体装置 |
| JP2008311300A (ja) * | 2007-06-12 | 2008-12-25 | Toyota Motor Corp | パワー半導体装置、パワー半導体装置の製造方法、およびモータ駆動装置 |
| JP2010118548A (ja) * | 2008-11-13 | 2010-05-27 | Mitsubishi Electric Corp | 半導体装置 |
-
2011
- 2011-10-26 JP JP2011234814A patent/JP5618963B2/ja active Active
-
2012
- 2012-06-27 US US13/534,695 patent/US8536655B2/en active Active
- 2012-10-15 DE DE102012218765.0A patent/DE102012218765B4/de active Active
- 2012-10-26 CN CN201210416161.XA patent/CN103077946B/zh active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06350032A (ja) | 1993-06-08 | 1994-12-22 | Toshiba Corp | 半導体装置の配線構体 |
| JP2006156959A (ja) | 2004-10-26 | 2006-06-15 | Matsushita Electric Ind Co Ltd | 半導体装置 |
| DE102010042583A1 (de) | 2009-12-15 | 2011-06-16 | Mitsubishi Electric Corp. | Leistungshalbleitervorrichtung für Zündvorrichtung |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2013093448A (ja) | 2013-05-16 |
| CN103077946A (zh) | 2013-05-01 |
| US8536655B2 (en) | 2013-09-17 |
| DE102012218765A1 (de) | 2013-05-02 |
| US20130106499A1 (en) | 2013-05-02 |
| CN103077946B (zh) | 2015-09-16 |
| JP5618963B2 (ja) | 2014-11-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed | ||
| R016 | Response to examination communication | ||
| R018 | Grant decision by examination section/examining division | ||
| R020 | Patent grant now final | ||
| R079 | Amendment of ipc main class |
Free format text: PREVIOUS MAIN CLASS: H01L0027060000 Ipc: H10D0084000000 |