DE102011053274B4 - Licht emittierende Vorrichtungen und Verfahren zur Herstellung derselben - Google Patents

Licht emittierende Vorrichtungen und Verfahren zur Herstellung derselben Download PDF

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Publication number
DE102011053274B4
DE102011053274B4 DE102011053274.9A DE102011053274A DE102011053274B4 DE 102011053274 B4 DE102011053274 B4 DE 102011053274B4 DE 102011053274 A DE102011053274 A DE 102011053274A DE 102011053274 B4 DE102011053274 B4 DE 102011053274B4
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light
trenches
semiconductor layer
layer
light emitting
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German (de)
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DE102011053274A1 (de
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Chao-Hsing Chen
Chien-Kai Chung
Chiu-Lin Yao
Hsin Mao Liu
Chien Fu Huang
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Epistar Corp
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Epistar Corp
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
    • H10H29/10—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/813—Bodies having a plurality of light-emitting regions, e.g. multi-junction LEDs or light-emitting devices having photoluminescent regions within the bodies
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01—Manufacture or treatment
    • H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/018—Bonding of wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
    • H10H20/82—Roughened surfaces, e.g. at the interface between epitaxial layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/83—Electrodes
    • H10H20/831—Electrodes characterised by their shape
    • H10H20/8316—Multi-layer electrodes comprising at least one discontinuous layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
    • H10H29/10—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
    • H10H29/14—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00 comprising multiple light-emitting semiconductor components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/83—Electrodes
    • H10H20/831—Electrodes characterised by their shape
    • H10H20/8312—Electrodes characterised by their shape extending at least partially through the bodies
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/84—Coatings, e.g. passivation layers or antireflective coatings
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/85—Packages
    • H10H20/857—Interconnections, e.g. lead-frames, bond wires or solder balls

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DE102011053274.9A 2010-09-06 2011-09-05 Licht emittierende Vorrichtungen und Verfahren zur Herstellung derselben Active DE102011053274B4 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US38025810P 2010-09-06 2010-09-06
US61/380,258 2010-09-06

Publications (2)

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DE102011053274A1 DE102011053274A1 (de) 2012-03-08
DE102011053274B4 true DE102011053274B4 (de) 2021-03-18

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US (2) US8592827B2 (enExample)
JP (1) JP6038436B2 (enExample)
KR (1) KR20120025433A (enExample)
CN (1) CN102386201B (enExample)
DE (1) DE102011053274B4 (enExample)
TW (2) TWI557934B (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI446578B (zh) * 2010-09-23 2014-07-21 Epistar Corp 發光元件及其製法
US8241932B1 (en) * 2011-03-17 2012-08-14 Tsmc Solid State Lighting Ltd. Methods of fabricating light emitting diode packages
TWI488295B (zh) * 2012-05-25 2015-06-11 Phostek Inc 發光二極體陣列與其形成方法
TWI466328B (zh) * 2012-06-11 2014-12-21 Ritedia Corp 覆晶式發光二極體及其製法與應用
JP2014096455A (ja) * 2012-11-08 2014-05-22 Stanley Electric Co Ltd 半導体発光素子アレイおよび車両用灯具
US20140151630A1 (en) * 2012-12-04 2014-06-05 Feng-Hsu Fan Protection for the epitaxial structure of metal devices
TWI499091B (zh) * 2012-12-18 2015-09-01 新世紀光電股份有限公司 發光裝置
DE102013103079A1 (de) * 2013-03-26 2014-10-02 Osram Opto Semiconductors Gmbh Optoelektronischer Halbleiterchip und Verfahren zur Herstellung eines optoelektronischen Halbleiterchips
KR20140140399A (ko) * 2013-05-29 2014-12-09 서울바이오시스 주식회사 복수개의 발광 요소들을 갖는 발광다이오드 및 그것을 제조하는 방법
DE112013007192B4 (de) * 2013-06-26 2024-05-23 Epistar Corporation Lichtemittierende Vorrichtung
TWI566427B (zh) * 2013-07-05 2017-01-11 晶元光電股份有限公司 發光元件及其製造方法
CN105324857B (zh) * 2013-07-05 2019-01-11 晶元光电股份有限公司 发光元件的制造方法
DE102013107531A1 (de) * 2013-07-16 2015-01-22 Osram Opto Semiconductors Gmbh Optoelektronischer Halbleiterchip
KR101767078B1 (ko) 2013-07-29 2017-08-10 에피스타 코포레이션 반도체 소자를 선택적으로 전이하는 방법
TWI603390B (zh) * 2013-07-29 2017-10-21 晶元光電股份有限公司 選擇性轉移半導體元件的方法
US11329195B2 (en) 2013-08-27 2022-05-10 Epistar Corporation Semiconductor light-emitting device
US9461209B2 (en) * 2013-11-27 2016-10-04 Epistar Corporation Semiconductor light-emitting device
CN110047865B (zh) * 2013-09-03 2024-02-23 晶元光电股份有限公司 具有多个发光结构的发光元件
KR102378952B1 (ko) * 2015-08-27 2022-03-25 쑤저우 레킨 세미컨덕터 컴퍼니 리미티드 발광소자 및 이를 포함하는 발광소자 패키지
CN106784276B (zh) * 2016-11-30 2019-04-12 陕西科技大学 一种金刚石热沉GaN基异侧电极LED制作方法
US20200243736A1 (en) * 2017-01-12 2020-07-30 Enkris Semiconductor, Inc. Semiconductor device and fabrication method for the same
WO2018160858A1 (en) * 2017-03-01 2018-09-07 Phase Sensitive Innovations, Inc. Diamond-backed photodiodes, diamond-sandwiched photodiodes, photodiode systems and related methods of manufacture
CN109768134A (zh) * 2019-01-28 2019-05-17 华引芯（武汉）科技有限公司 一种发光高效率反转垂直结构高压芯片及其制备方法
CN112687780B (zh) * 2020-12-29 2022-02-11 厦门三安光电有限公司 一种高压发光二极管芯片

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070166851A1 (en) * 2005-01-11 2007-07-19 Tran Chuong A LIGHT EMITTING DIODES (LEDs) WITH IMPROVED LIGHT EXTRACTION BY ROUGHENING
WO2009106069A1 (de) * 2008-02-29 2009-09-03 Osram Opto Semiconductors Gmbh Optoelektronischer halbleiterkörper und verfahren zur herstellung eines solchen
US20100051986A1 (en) * 2008-09-04 2010-03-04 Samsung Electronics Co., Ltd. Light-emitting diodes using nano-rods and methods of manufacturing a light-emitting diode

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3717196B2 (ja) * 1994-07-19 2005-11-16 豊田合成株式会社 発光素子
JP2005322722A (ja) * 2004-05-07 2005-11-17 Korai Kagi Kofun Yugenkoshi 発光ダイオード
US7221044B2 (en) * 2005-01-21 2007-05-22 Ac Led Lighting, L.L.C. Heterogeneous integrated high voltage DC/AC light emitter
CN1835253A (zh) * 2005-03-17 2006-09-20 日立电线株式会社 发光二极管阵列
KR100782129B1 (ko) * 2006-05-25 2007-12-05 한국광기술원 웨이퍼 본딩 공정을 이용한 실리콘 기반 발광다이오드제조방법
WO2008031280A1 (fr) * 2006-09-13 2008-03-20 Helio Optoelectronics Corporation Structure de diode électroluminescente
KR100974923B1 (ko) * 2007-03-19 2010-08-10 서울옵토디바이스주식회사 발광 다이오드
JP5123269B2 (ja) * 2008-09-30 2013-01-23 ソウル オプト デバイス カンパニー リミテッド 発光素子及びその製造方法
DE102008062933B4 (de) * 2008-12-23 2021-05-12 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Optoelektronische Projektionsvorrichtung
KR100986570B1 (ko) * 2009-08-31 2010-10-07 엘지이노텍 주식회사 반도체 발광소자 및 그 제조방법

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070166851A1 (en) * 2005-01-11 2007-07-19 Tran Chuong A LIGHT EMITTING DIODES (LEDs) WITH IMPROVED LIGHT EXTRACTION BY ROUGHENING
WO2009106069A1 (de) * 2008-02-29 2009-09-03 Osram Opto Semiconductors Gmbh Optoelektronischer halbleiterkörper und verfahren zur herstellung eines solchen
US20100051986A1 (en) * 2008-09-04 2010-03-04 Samsung Electronics Co., Ltd. Light-emitting diodes using nano-rods and methods of manufacturing a light-emitting diode

Also Published As

Publication number Publication date
JP6038436B2 (ja) 2016-12-07
TW201212280A (en) 2012-03-16
US8847248B2 (en) 2014-09-30
CN102386201B (zh) 2016-07-06
TWI539622B (zh) 2016-06-21
TWI557934B (zh) 2016-11-11
TW201212279A (en) 2012-03-16
KR20120025433A (ko) 2012-03-15
US8592827B2 (en) 2013-11-26
JP2012060115A (ja) 2012-03-22
CN102386201A (zh) 2012-03-21
DE102011053274A1 (de) 2012-03-08
US20120056212A1 (en) 2012-03-08
US20140077238A1 (en) 2014-03-20

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