DD262552A3 - Verdampfer - Google Patents

Verdampfer Download PDF

Info

Publication number
DD262552A3
DD262552A3 DD85280764A DD28076485A DD262552A3 DD 262552 A3 DD262552 A3 DD 262552A3 DD 85280764 A DD85280764 A DD 85280764A DD 28076485 A DD28076485 A DD 28076485A DD 262552 A3 DD262552 A3 DD 262552A3
Authority
DD
German Democratic Republic
Prior art keywords
constriction
crucible
nosjio
nahajia
heat shield
Prior art date
Application number
DD85280764A
Other languages
English (en)
Inventor
Georgij T Levcenko
Aleksandr N Radzinovskij
Original Assignee
Kpi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP60502952A priority Critical patent/JPS62500110A/ja
Priority to DE19853590269 priority patent/DE3590269T/de
Priority to US06/829,651 priority patent/US4700660A/en
Priority to PCT/SU1985/000033 priority patent/WO1986000092A1/ru
Priority to GB08601316A priority patent/GB2172015B/en
Priority to AT0901885A priority patent/AT387239B/de
Priority to FR8509951A priority patent/FR2584100B1/fr
Application filed by Kpi filed Critical Kpi
Priority to DD85280764A priority patent/DD262552A3/de
Priority to BG71778A priority patent/BG46224A1/xx
Publication of DD262552A3 publication Critical patent/DD262552A3/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

Der Verdampfer besteht aus dem Tiegel 1, dem Heizelement 2 und dem abnehmbaren achssymmetrischen Austrittskanal 8 mit einer Verjuengung im Mittelteil, den Scheidewaenden 9 und der Waermeabschirmung 10. Die Scheidewaende 9 sind in der Verjuengung des Mittelteils des Austrittskanals 8 angeordnet, und an der Aussenseite der Verjuengung des Kanals 8 ist die Waermeabschirmung 10 angeordnet. Die dem Tiegel 1 zugewandte Scheidewand 9 ist so ausgefuehrt, dass auf ihr der zu verdampfende Werkstoff 2 geschmolzen werden kann. Figur

Description

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Ha nosJio&Ke. B sepxHeM xojioähoM ^aciH naHaJia coop Tex MOJienyji, κοτορΗβ, niaefl HeKOTopyio 6ο-cocTaBJifliomyio CKopocTL, Bee se noKHsaioT npeaejiH 3Tom ure η τρ a jib η ok qacTH noTOKa. IlocJie οκοημθηηη iiWHJia μθηηιοτ noaaoacity, β TwrejiL I iorpysaioT HcnapHeMHö 2, a BHXOflHOH KaHan 8 nepeBopa^MBaaT η ycTaHaBJiWBaioT τοΜ BHH3, Ha κοτοροΐί oceji MaiepnaJi. 3τοτ MaiepwaJi hc-β cjieayiomeM iiHHJie HariHJieHHfl, TaK se KaK η Ma-H3 TurjiH I.

Claims (1)

  1. ΦOPMJIA Η30ΕΡΕΤΕΗΗΗ
    coflepscamra τκγθζβ, HarpeBaieJiB η
    bhxoähoh HaHaJi c cyiieHneM β cpesHefi
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    1U ΠΟΒΗΠΙΘΗΗΗ Ηβ^θΟΤΒβ HJieHKH nyTeM yJiytJUieHHH OflHOpOflHO-
    ee CBOMCTB no nosepxHocM nosJio^w, ΛΗβφρ8Γΐω yciaHOB-cpesHeM wacTW βηχοληογο KaHana, a c βηθιπηθμ CTopoHH cyneHWH naHaJia pacnoaoaeH τβπποΒοϋ 3KpaH, npn^eii
    _„„L™. oöpameHHan β cTopoHy τηγλη, βηπο*ηΘη3 c bobmok-
    Ha Heii HcnapneMoro
    HCTOMHHKH ΜφΟρΜα^ΙΜ, ΠρΗΗΗΤΗΘ BO BHHMaHHe ΠΡΗ
    I.SU, A, 397567.
    2.SU, A, 2200952.
    Hierzu 1 Seits Zeichnung
DD85280764A 1984-06-12 1985-09-19 Verdampfer DD262552A3 (de)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP60502952A JPS62500110A (ja) 1984-06-12 1985-04-24 真空中でフィルムを蒸着させるための蒸発器
DE19853590269 DE3590269T (de) 1984-06-12 1985-04-24 Verfahren zum Aufbringen von dünnen Schichten durch Vakuumaufdampfen
US06/829,651 US4700660A (en) 1984-06-12 1985-04-24 Evaporator for depositing films in a vacuum
PCT/SU1985/000033 WO1986000092A1 (en) 1984-06-12 1985-04-24 Evaporator for vacuum deposition of films
GB08601316A GB2172015B (en) 1984-06-12 1985-04-24 Evaporator for vacuum deposition of films
AT0901885A AT387239B (de) 1984-06-12 1985-04-24 Verdampfer zum aufbringen von duennschichten durch vakuumaufdampfen
FR8509951A FR2584100B1 (fr) 1984-06-12 1985-06-28 Evaporateur pour l'obtention, par evaporation sous vide, de depots de films minces
DD85280764A DD262552A3 (de) 1984-06-12 1985-09-19 Verdampfer
BG71778A BG46224A1 (en) 1984-06-12 1985-09-23 Evaporator

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SU3753279 1984-06-12
DD85280764A DD262552A3 (de) 1984-06-12 1985-09-19 Verdampfer

Publications (1)

Publication Number Publication Date
DD262552A3 true DD262552A3 (de) 1988-12-07

Family

ID=25747994

Family Applications (1)

Application Number Title Priority Date Filing Date
DD85280764A DD262552A3 (de) 1984-06-12 1985-09-19 Verdampfer

Country Status (9)

Country Link
US (1) US4700660A (de)
JP (1) JPS62500110A (de)
AT (1) AT387239B (de)
BG (1) BG46224A1 (de)
DD (1) DD262552A3 (de)
DE (1) DE3590269T (de)
FR (1) FR2584100B1 (de)
GB (1) GB2172015B (de)
WO (1) WO1986000092A1 (de)

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JPS62260051A (ja) * 1986-05-02 1987-11-12 Hitachi Ltd 蒸気発生装置
US4847469A (en) * 1987-07-15 1989-07-11 The Boc Group, Inc. Controlled flow vaporizer
EP0386247A4 (en) * 1988-05-31 1990-12-05 Kievsky Politekhnichesky Institut Imeni 50-Letia Velikoi Oktyabrskoi Sotsialisticheskoi Revoljutsii Device for vacuum deposition of films
AT392486B (de) * 1988-08-29 1991-04-10 Hainzl Industriesysteme Ges M Verfahren und vorrichtung zum aufdampfen einer beschichtung auf einem traeger im vakuum
US5157240A (en) * 1989-09-13 1992-10-20 Chow Loren A Deposition heaters
US5031229A (en) * 1989-09-13 1991-07-09 Chow Loren A Deposition heaters
US5596673A (en) * 1994-11-18 1997-01-21 Xerox Corporation Evaporation crucible assembly
US5582393A (en) * 1995-04-21 1996-12-10 Xerox Corporation Method to maintain the levelness of a heated crucible
US5558720A (en) * 1996-01-11 1996-09-24 Thermacore, Inc. Rapid response vapor source
US5951769A (en) * 1997-06-04 1999-09-14 Crown Roll Leaf, Inc. Method and apparatus for making high refractive index (HRI) film
CH693746A5 (de) * 1999-05-04 2004-01-15 Satis Vacuum Ind Vetriebs Ag Elektronenstrahlverdampfer fuer Vacuum-Beschichtungsanlagen.
JP2006152395A (ja) * 2004-11-30 2006-06-15 Fuji Photo Film Co Ltd 真空蒸着方法および真空蒸着装置
US11957595B2 (en) 2005-02-25 2024-04-16 Shoulder Innovations, Inc. Methods and devices for less invasive glenoid replacement
US8778028B2 (en) 2005-02-25 2014-07-15 Shoulder Innovations, Inc. Methods and devices for less invasive glenoid replacement
US20060270243A1 (en) * 2005-05-24 2006-11-30 Taiwan Micro Display Corporation Alignment shield for evaporator used in thin film deposition
DE102007035166B4 (de) * 2007-07-27 2010-07-29 Createc Fischer & Co. Gmbh Hochtemperatur-Verdampferzelle mit parallel geschalteten Heizbereichen, Verfahren zu deren Betrieb und deren Verwendung in Beschichtungsanlagen
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
WO2011065998A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
WO2011065999A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
JP5083285B2 (ja) * 2009-08-24 2012-11-28 東京エレクトロン株式会社 疎水化処理装置、疎水化処理方法及び記憶媒体
KR101094299B1 (ko) * 2009-12-17 2011-12-19 삼성모바일디스플레이주식회사 선형 증발원 및 이를 포함하는 증착 장치
KR101182265B1 (ko) * 2009-12-22 2012-09-12 삼성디스플레이 주식회사 증발원 및 이를 포함하는 증착 장치
JP5542610B2 (ja) * 2010-10-19 2014-07-09 三菱伸銅株式会社 真空蒸着装置
EP2447393A1 (de) * 2010-10-27 2012-05-02 Applied Materials, Inc. Verdampfungssystem und Verfahren
US8888918B2 (en) * 2011-03-31 2014-11-18 Seagate Technology Llc Vapor collection
DE102011122591A1 (de) * 2011-12-30 2013-07-04 Dr. Eberl Mbe-Komponenten Gmbh Vorrichtung zum Verdampfen eines Verdampfungsguts
DE102014221561A1 (de) * 2014-10-23 2016-04-28 Beijing Apollo Ding Rong Solar Technology Co., Ltd. Vorrichtung zur Aufnahme von Verdampfungsgut und Verfahren zur Herstellung einer Vorrichtung
RU2615962C1 (ru) * 2015-12-04 2017-04-11 федеральное государственное автономное образовательное учреждение высшего образования "Самарский государственный аэрокосмический университет имени академика С.П. Королева (национальный исследовательский университет)" (СГАУ) Испаритель многокомпонентных растворов
RU2662914C2 (ru) * 2016-07-26 2018-07-31 федеральное государственное автономное образовательное учреждение высшего образования "Самарский национальный исследовательский университет имени академика С.П. Королева" Динамический испаритель твердых растворов
JP7036676B2 (ja) * 2018-06-13 2022-03-15 株式会社アルバック 真空蒸着装置用の蒸着源
JP7223632B2 (ja) * 2019-05-21 2023-02-16 株式会社アルバック 真空蒸着装置用の蒸着源

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DE1621282A1 (de) * 1967-09-22 1971-06-03 Licentia Gmbh Verfahren und Anordnung zur Herstellung von Schichten durch Kondensation eines Dampfes auf einem Substrat
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DD206499A3 (de) * 1981-07-14 1984-01-25 Guenter Jaesch Zinkverdampfer
JPS6015698B2 (ja) * 1981-09-30 1985-04-20 日本真空技術株式会社 ノズル付蒸発器

Also Published As

Publication number Publication date
GB8601316D0 (en) 1986-02-26
FR2584100A1 (fr) 1987-01-02
US4700660A (en) 1987-10-20
AT387239B (de) 1988-12-27
GB2172015B (en) 1988-06-08
JPS62500110A (ja) 1987-01-16
WO1986000092A1 (en) 1986-01-03
ATA901885A (de) 1988-05-15
FR2584100B1 (fr) 1987-09-18
JPH0377873B2 (de) 1991-12-11
DE3590269T (de) 1986-06-05
BG46224A1 (en) 1989-11-15
GB2172015A (en) 1986-09-10

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