AT387239B - Verdampfer zum aufbringen von duennschichten durch vakuumaufdampfen - Google Patents

Verdampfer zum aufbringen von duennschichten durch vakuumaufdampfen

Info

Publication number
AT387239B
AT387239B AT0901885A AT901885A AT387239B AT 387239 B AT387239 B AT 387239B AT 0901885 A AT0901885 A AT 0901885A AT 901885 A AT901885 A AT 901885A AT 387239 B AT387239 B AT 387239B
Authority
AT
Austria
Prior art keywords
vacuum
evaporator
thick films
applying thick
applying
Prior art date
Application number
AT0901885A
Other languages
English (en)
Other versions
ATA901885A (de
Inventor
Georgy Timofeevich Levchenko
Alexandr Nikolaevi Radzikovsky
Original Assignee
Ki Polt I
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ki Polt I filed Critical Ki Polt I
Publication of ATA901885A publication Critical patent/ATA901885A/de
Application granted granted Critical
Publication of AT387239B publication Critical patent/AT387239B/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
AT0901885A 1984-06-12 1985-04-24 Verdampfer zum aufbringen von duennschichten durch vakuumaufdampfen AT387239B (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SU3753279 1984-06-12
DD85280764A DD262552A3 (de) 1984-06-12 1985-09-19 Verdampfer

Publications (2)

Publication Number Publication Date
ATA901885A ATA901885A (de) 1988-05-15
AT387239B true AT387239B (de) 1988-12-27

Family

ID=25747994

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0901885A AT387239B (de) 1984-06-12 1985-04-24 Verdampfer zum aufbringen von duennschichten durch vakuumaufdampfen

Country Status (9)

Country Link
US (1) US4700660A (de)
JP (1) JPS62500110A (de)
AT (1) AT387239B (de)
BG (1) BG46224A1 (de)
DD (1) DD262552A3 (de)
DE (1) DE3590269T (de)
FR (1) FR2584100B1 (de)
GB (1) GB2172015B (de)
WO (1) WO1986000092A1 (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62260051A (ja) * 1986-05-02 1987-11-12 Hitachi Ltd 蒸気発生装置
US4847469A (en) * 1987-07-15 1989-07-11 The Boc Group, Inc. Controlled flow vaporizer
EP0386247A4 (en) * 1988-05-31 1990-12-05 Kievsky Politekhnichesky Institut Imeni 50-Letia Velikoi Oktyabrskoi Sotsialisticheskoi Revoljutsii Device for vacuum deposition of films
AT392486B (de) * 1988-08-29 1991-04-10 Hainzl Industriesysteme Ges M Verfahren und vorrichtung zum aufdampfen einer beschichtung auf einem traeger im vakuum
US5157240A (en) * 1989-09-13 1992-10-20 Chow Loren A Deposition heaters
US5031229A (en) * 1989-09-13 1991-07-09 Chow Loren A Deposition heaters
US5596673A (en) * 1994-11-18 1997-01-21 Xerox Corporation Evaporation crucible assembly
US5582393A (en) * 1995-04-21 1996-12-10 Xerox Corporation Method to maintain the levelness of a heated crucible
US5558720A (en) * 1996-01-11 1996-09-24 Thermacore, Inc. Rapid response vapor source
US5951769A (en) * 1997-06-04 1999-09-14 Crown Roll Leaf, Inc. Method and apparatus for making high refractive index (HRI) film
CH693746A5 (de) * 1999-05-04 2004-01-15 Satis Vacuum Ind Vetriebs Ag Elektronenstrahlverdampfer fuer Vacuum-Beschichtungsanlagen.
JP2006152395A (ja) * 2004-11-30 2006-06-15 Fuji Photo Film Co Ltd 真空蒸着方法および真空蒸着装置
US20230080207A1 (en) 2005-02-25 2023-03-16 Shoulder Innovations, Inc. Methods and devices for less invasive glenoid replacement
US20060270243A1 (en) * 2005-05-24 2006-11-30 Taiwan Micro Display Corporation Alignment shield for evaporator used in thin film deposition
DE102007035166B4 (de) * 2007-07-27 2010-07-29 Createc Fischer & Co. Gmbh Hochtemperatur-Verdampferzelle mit parallel geschalteten Heizbereichen, Verfahren zu deren Betrieb und deren Verwendung in Beschichtungsanlagen
US20100285218A1 (en) * 2008-12-18 2010-11-11 Veeco Instruments Inc. Linear Deposition Source
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
WO2011065998A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
JP5083285B2 (ja) * 2009-08-24 2012-11-28 東京エレクトロン株式会社 疎水化処理装置、疎水化処理方法及び記憶媒体
KR101094299B1 (ko) 2009-12-17 2011-12-19 삼성모바일디스플레이주식회사 선형 증발원 및 이를 포함하는 증착 장치
KR101182265B1 (ko) * 2009-12-22 2012-09-12 삼성디스플레이 주식회사 증발원 및 이를 포함하는 증착 장치
JP5542610B2 (ja) * 2010-10-19 2014-07-09 三菱伸銅株式会社 真空蒸着装置
EP2447393A1 (de) * 2010-10-27 2012-05-02 Applied Materials, Inc. Verdampfungssystem und Verfahren
US8888918B2 (en) * 2011-03-31 2014-11-18 Seagate Technology Llc Vapor collection
DE102011122591A1 (de) * 2011-12-30 2013-07-04 Dr. Eberl Mbe-Komponenten Gmbh Vorrichtung zum Verdampfen eines Verdampfungsguts
DE102014221561A1 (de) * 2014-10-23 2016-04-28 Beijing Apollo Ding Rong Solar Technology Co., Ltd. Vorrichtung zur Aufnahme von Verdampfungsgut und Verfahren zur Herstellung einer Vorrichtung
RU2615962C1 (ru) * 2015-12-04 2017-04-11 федеральное государственное автономное образовательное учреждение высшего образования "Самарский государственный аэрокосмический университет имени академика С.П. Королева (национальный исследовательский университет)" (СГАУ) Испаритель многокомпонентных растворов
RU2662914C2 (ru) * 2016-07-26 2018-07-31 федеральное государственное автономное образовательное учреждение высшего образования "Самарский национальный исследовательский университет имени академика С.П. Королева" Динамический испаритель твердых растворов
JP7036676B2 (ja) * 2018-06-13 2022-03-15 株式会社アルバック 真空蒸着装置用の蒸着源
JP7223632B2 (ja) * 2019-05-21 2023-02-16 株式会社アルバック 真空蒸着装置用の蒸着源

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU270432A1 (ru) * 1968-12-08 1970-05-08 Ф. А. Коледа УСТРОЙСТВО дл ИСПАРЕНИЯ МАТЕРИАЛОВ В ВАКУУМЕ
SU397567A1 (ru) * 1971-02-01 1973-09-17 Киевский ордена Ленина политехнический институт лети Великой Окт брьской социалистической революции Испаритель для вакуумных установок
SU413218A1 (de) * 1970-07-27 1974-01-30
SU466300A1 (ru) * 1973-01-22 1975-04-05 Научно-Исследовательский Институт Электрографии Испаритель
DD206499A3 (de) * 1981-07-14 1984-01-25 Guenter Jaesch Zinkverdampfer

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1489583A (fr) * 1965-08-24 1967-07-21 United States Steel Corp Creuset pour la vaporisation de métaux comportant des parois verticales servant à contenir et à condenser la vapeur
DE1621282A1 (de) * 1967-09-22 1971-06-03 Licentia Gmbh Verfahren und Anordnung zur Herstellung von Schichten durch Kondensation eines Dampfes auf einem Substrat
US3572672A (en) * 1968-11-22 1971-03-30 Rca Corp Vacuum evaporation apparatus
SU834245A1 (ru) * 1976-03-29 1981-05-30 Киевский Ордена Ленина Политехническийинститут Им. 50-Летия Великой Октябрьскойсоциалистической Революции Способ нанесени покрытий в вакууме
US4125086A (en) * 1977-01-06 1978-11-14 The United States Of America As Represented By The Secretary Of The Army Nozzle beam type metal vapor source
US4412508A (en) * 1980-12-15 1983-11-01 The United States Of America As Represented By The Secretary Of The Army Nozzle beam source for vapor deposition
JPS57134555A (en) * 1981-02-10 1982-08-19 Fuji Photo Film Co Ltd Method and device for forming thin film
JPS57155368A (en) * 1981-03-20 1982-09-25 Fuji Photo Film Co Ltd Method of recovering vacuum deposition liquid material and apparatus therefor
JPS6015698B2 (ja) * 1981-09-30 1985-04-20 日本真空技術株式会社 ノズル付蒸発器

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU270432A1 (ru) * 1968-12-08 1970-05-08 Ф. А. Коледа УСТРОЙСТВО дл ИСПАРЕНИЯ МАТЕРИАЛОВ В ВАКУУМЕ
SU413218A1 (de) * 1970-07-27 1974-01-30
SU397567A1 (ru) * 1971-02-01 1973-09-17 Киевский ордена Ленина политехнический институт лети Великой Окт брьской социалистической революции Испаритель для вакуумных установок
SU466300A1 (ru) * 1973-01-22 1975-04-05 Научно-Исследовательский Институт Электрографии Испаритель
DD206499A3 (de) * 1981-07-14 1984-01-25 Guenter Jaesch Zinkverdampfer

Also Published As

Publication number Publication date
BG46224A1 (en) 1989-11-15
WO1986000092A1 (en) 1986-01-03
ATA901885A (de) 1988-05-15
GB2172015A (en) 1986-09-10
JPH0377873B2 (de) 1991-12-11
DE3590269T (de) 1986-06-05
DD262552A3 (de) 1988-12-07
US4700660A (en) 1987-10-20
FR2584100A1 (fr) 1987-01-02
GB2172015B (en) 1988-06-08
GB8601316D0 (en) 1986-02-26
JPS62500110A (ja) 1987-01-16
FR2584100B1 (fr) 1987-09-18

Similar Documents

Publication Publication Date Title
AT387239B (de) Verdampfer zum aufbringen von duennschichten durch vakuumaufdampfen
AU550332B2 (en) Web aligning process
BR8107854A (pt) Evaporador de chapa
DE3684676D1 (de) Verfahren zum herstellen von halbleitersubstraten.
DE3671325D1 (de) Verfahren zum photochemischen aufdampfen von oxydschichten.
JPS576883A (en) Thin film el panel
AU4063085A (en) Verfahren zum herstellen von schuheinlege-sohlen mit genauer pabform
AU541754B2 (en) Test strip for antithrombin iii
DE3682568D1 (de) Verfahren zum herstellen von elektrischen dickschichtkomponenten.
DE3773869D1 (de) Verfahren zum eindampfen fotografischer ablaugen.
DE3773856D1 (de) Verfahren zum eindampfen fotografischer ablaugen.
AU7769881A (en) Washer strip for fasteners
DE2962153D1 (en) Immunoassay using ascitic fluid
DE3686738T2 (de) Verfahren zum herstellen von hochreinem niob.
DE3766635D1 (de) Verfahren zum praegen von filmen.
FI834465A0 (fi) Stoedplatta foer utgraevningar
JPS5746494A (en) Electrode structure for thin film el panel
ATA495680A (de) Einrichtung zur befestigung von verkleidungsplatten
AU537451B2 (en) 4-bis (phenylmethyl amino) benzene sulfonic acids
KR860004464A (ko) 반도체박막의 형성방법
DE3575885D1 (de) Verfahren zum herstellen von ausnehmungen.
AU2652384A (en) Verfahren zum materialeinsparenden herstellen von stanzteilen
DE3583457D1 (de) Polyimid-zusammensetzung zum verkleben metallischer folien.
JPS5746493A (en) Electrode structure for thin film el panel
GB2150884B (en) Applying register marks to articles

Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee