JPS57155368A - Method of recovering vacuum deposition liquid material and apparatus therefor - Google Patents

Method of recovering vacuum deposition liquid material and apparatus therefor

Info

Publication number
JPS57155368A
JPS57155368A JP4071881A JP4071881A JPS57155368A JP S57155368 A JPS57155368 A JP S57155368A JP 4071881 A JP4071881 A JP 4071881A JP 4071881 A JP4071881 A JP 4071881A JP S57155368 A JPS57155368 A JP S57155368A
Authority
JP
Japan
Prior art keywords
wall
deposition
recovering
hearth
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4071881A
Other languages
Japanese (ja)
Inventor
Makoto Nagao
Akira Nahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP4071881A priority Critical patent/JPS57155368A/en
Publication of JPS57155368A publication Critical patent/JPS57155368A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To prevent the loss of a material, and to allow deposition capable of being performed for a long period without supplying the material, by using, as a wall for recovering the material, a wall that guides a steam stream of the deposition material from a vessel to an object on which the deposition is performed. CONSTITUTION:While an elongate film 1 for a magnetic tape is being delivered from a payoff roll 2 via a cooling can 3 to a take-up roll 4, deposition is carried out to form a deposited film on the film 1 such that a deposition material 6 in the hearth 5 is heated by an electron beam 7 to evaporate, and the steam stream 8 is continuously deposited. The steam stream 8 is guided and rises along the guide and recovering wall 9 from the hearth 5 to the film 1, and part of the stream 8 adheres to the recovering wall 9. The recovering wall 9 is heated to at least the temperature of the melting point of the deposition material, and the lower end 9a of the wall is located above the hearth 5, so that the deposition material 6 adhered to the wall 9 can be recovered as a liquid into the hearth 5.
JP4071881A 1981-03-20 1981-03-20 Method of recovering vacuum deposition liquid material and apparatus therefor Pending JPS57155368A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4071881A JPS57155368A (en) 1981-03-20 1981-03-20 Method of recovering vacuum deposition liquid material and apparatus therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4071881A JPS57155368A (en) 1981-03-20 1981-03-20 Method of recovering vacuum deposition liquid material and apparatus therefor

Publications (1)

Publication Number Publication Date
JPS57155368A true JPS57155368A (en) 1982-09-25

Family

ID=12588370

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4071881A Pending JPS57155368A (en) 1981-03-20 1981-03-20 Method of recovering vacuum deposition liquid material and apparatus therefor

Country Status (1)

Country Link
JP (1) JPS57155368A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4648347A (en) * 1984-05-30 1987-03-10 Leybold-Heraeus Gmbh Vacuum depositing apparatus
JPS62157600A (en) * 1985-12-28 1987-07-13 コニカ株式会社 Manufacture of radiation image conversion panel
US4700660A (en) * 1984-06-12 1987-10-20 Kievsky Politekhnichesky Institut Evaporator for depositing films in a vacuum
JPH02107761A (en) * 1988-10-14 1990-04-19 Matsushita Electric Ind Co Ltd Oblique vapor deposition apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4648347A (en) * 1984-05-30 1987-03-10 Leybold-Heraeus Gmbh Vacuum depositing apparatus
US4700660A (en) * 1984-06-12 1987-10-20 Kievsky Politekhnichesky Institut Evaporator for depositing films in a vacuum
JPS62157600A (en) * 1985-12-28 1987-07-13 コニカ株式会社 Manufacture of radiation image conversion panel
JPH02107761A (en) * 1988-10-14 1990-04-19 Matsushita Electric Ind Co Ltd Oblique vapor deposition apparatus

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