JPS5544579A - Continuous vacuum evaporation apparatus - Google Patents

Continuous vacuum evaporation apparatus

Info

Publication number
JPS5544579A
JPS5544579A JP11842278A JP11842278A JPS5544579A JP S5544579 A JPS5544579 A JP S5544579A JP 11842278 A JP11842278 A JP 11842278A JP 11842278 A JP11842278 A JP 11842278A JP S5544579 A JPS5544579 A JP S5544579A
Authority
JP
Japan
Prior art keywords
metal
crucible
end part
room
sticked
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11842278A
Other languages
Japanese (ja)
Other versions
JPS6046180B2 (en
Inventor
Daizo Yamazaki
Tetsuyoshi Wada
Shigeo Itano
Yoshikiyo Nakagawa
Seiji Nishikawa
Heizaburo Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP11842278A priority Critical patent/JPS6046180B2/en
Publication of JPS5544579A publication Critical patent/JPS5544579A/en
Publication of JPS6046180B2 publication Critical patent/JPS6046180B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To improve working ratio of the above mentioned apparatus, by providing moving type leaked evaporation metal collector plate along the total length of crucible, so as to cover the clearance formed by the end part of steel belt and upper end part of the crucible and also, removing by flaking off evaporated metal sticked on the collector plate in the other room. CONSTITUTION:The evaporated metal molecule flow 6 from the molten metal bath 5 in the crucible 3, is plated evaporating on the steel belt 2 in the vacuum evaporation room 1. On this occasion, the moving type collector plate 8.8 are provided so as to cover the clearance formed by the end part of the steel belt 2 and the upper end part of the crucible 3. The leaked metal molecule flow 7.7 from the clearance is sticked on the plate 8.8 and then, the sticked metal layer is flaked and removed by the flaking apparatus 15 in the flaking room 14 and next, the flaked powder 16 is recovered in the vessel 17. By the above method, leaked evaporation metal molucule is not deposited on the side wall of the evaporation room and a high productivity is able to obtain.
JP11842278A 1978-09-26 1978-09-26 Continuous vacuum evaporation equipment Expired JPS6046180B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11842278A JPS6046180B2 (en) 1978-09-26 1978-09-26 Continuous vacuum evaporation equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11842278A JPS6046180B2 (en) 1978-09-26 1978-09-26 Continuous vacuum evaporation equipment

Publications (2)

Publication Number Publication Date
JPS5544579A true JPS5544579A (en) 1980-03-28
JPS6046180B2 JPS6046180B2 (en) 1985-10-15

Family

ID=14736240

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11842278A Expired JPS6046180B2 (en) 1978-09-26 1978-09-26 Continuous vacuum evaporation equipment

Country Status (1)

Country Link
JP (1) JPS6046180B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62284074A (en) * 1985-12-27 1987-12-09 Arubatsuku Seimaku Kk Continuous sputtering device
JPH02238852A (en) * 1989-03-10 1990-09-21 Kowa Kogyo:Kk Baking of cracker and apparatus therefor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62284074A (en) * 1985-12-27 1987-12-09 Arubatsuku Seimaku Kk Continuous sputtering device
JPH02238852A (en) * 1989-03-10 1990-09-21 Kowa Kogyo:Kk Baking of cracker and apparatus therefor

Also Published As

Publication number Publication date
JPS6046180B2 (en) 1985-10-15

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