CN1973157A - 闸门装置 - Google Patents

闸门装置 Download PDF

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Publication number
CN1973157A
CN1973157A CNA2005800187144A CN200580018714A CN1973157A CN 1973157 A CN1973157 A CN 1973157A CN A2005800187144 A CNA2005800187144 A CN A2005800187144A CN 200580018714 A CN200580018714 A CN 200580018714A CN 1973157 A CN1973157 A CN 1973157A
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magnet
gate opening
described device
locking mechanism
aforementioned
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M·罗德
A·穆勒
A·卡斯帕里
T·沃格特
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Buehler Alzenau GmbH
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Leybold Optics GmbH
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Priority to CN201210244824.4A priority Critical patent/CN102808995B/zh
Publication of CN1973157A publication Critical patent/CN1973157A/zh
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K1/00—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
    • F16K1/16—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with pivoted closure-members
    • F16K1/18—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with pivoted closure-members with pivoted discs or flaps
    • F16K1/20—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with pivoted closure-members with pivoted discs or flaps with axis of rotation arranged externally of valve member
    • F16K1/2007—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with pivoted closure-members with pivoted discs or flaps with axis of rotation arranged externally of valve member specially adapted operating means therefor
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K1/00—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
    • F16K1/16—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with pivoted closure-members
    • F16K1/18—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with pivoted closure-members with pivoted discs or flaps
    • F16K1/20—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with pivoted closure-members with pivoted discs or flaps with axis of rotation arranged externally of valve member
    • F16K1/2028—Details of bearings for the axis of rotation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K1/00—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
    • F16K1/16—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with pivoted closure-members
    • F16K1/18—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with pivoted closure-members with pivoted discs or flaps
    • F16K1/20—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with pivoted closure-members with pivoted discs or flaps with axis of rotation arranged externally of valve member
    • F16K1/2042—Special features or arrangements of the sealing
    • F16K1/2057—Special features or arrangements of the sealing the sealing being arranged on the valve seat
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
    • F16K3/04—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with pivoted closure members
    • F16K3/10—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with pivoted closure members with special arrangements for separating the sealing faces or for pressing them together
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
    • F16K31/06—Actuating devices; Operating means; Releasing devices electric; magnetic using a magnet, e.g. diaphragm valves, cutting off by means of a liquid
    • F16K31/08—Actuating devices; Operating means; Releasing devices electric; magnetic using a magnet, e.g. diaphragm valves, cutting off by means of a liquid using a permanent magnet
    • F16K31/082—Actuating devices; Operating means; Releasing devices electric; magnetic using a magnet, e.g. diaphragm valves, cutting off by means of a liquid using a permanent magnet using a electromagnet and a permanent magnet
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
    • F16K31/06—Actuating devices; Operating means; Releasing devices electric; magnetic using a magnet, e.g. diaphragm valves, cutting off by means of a liquid
    • F16K31/08—Actuating devices; Operating means; Releasing devices electric; magnetic using a magnet, e.g. diaphragm valves, cutting off by means of a liquid using a permanent magnet
    • F16K31/084—Actuating devices; Operating means; Releasing devices electric; magnetic using a magnet, e.g. diaphragm valves, cutting off by means of a liquid using a permanent magnet the magnet being used only as a holding element to maintain the valve in a specific position, e.g. check valves
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/7069—With lock or seal
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T70/00—Locks
    • Y10T70/50—Special application
    • Y10T70/5611—For control and machine elements
    • Y10T70/5615—Valve

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Sliding Valves (AREA)
  • Lift Valve (AREA)
  • Details Of Valves (AREA)
  • Gasket Seals (AREA)

Abstract

本发明涉及一种闸门装置，其用于在一个第一接受器和一个第二接受器之间的壁中设置的闸门开口，所述闸门装置具有一个设置在第一接受器的内腔中的闭锁机构和一个配属于该闭锁机构的配对板，其中在配对板的一个区域中设置一个第一磁体机构并且在闭锁机构的一个区域中设置一个配属于第一磁体机构的第二磁体机构，并且为了借助于所述第一和第二磁体机构来关闭和/或打开闸门开口，在闭锁机构和配对板之间可以产生一个正的和/或负的挤压力。

Description

闸门装置
技术领域
本发明涉及一种按照独立权利要求前序部分的闸门装置。
背景技术
在真空腔的隔离阀中，尤其是对于所述的用于涂覆基质的直列式设备在相对于所述接受器密封隔离阀舌门时经常出现问题。对于具有可回转的隔离阀舌门的隔离阀来说重要的影响因素是变形，尤其是在将所述舌门在隔离阀处于闭锁状态中压向接受器时回转轴和隔离阀舌门的扭曲。由此导致的变形的结果是隔离阀舌门的不均匀的压向包括闸门开口的弹性密封元件的挤压力，这导致了，沿着密封元件的走向不能保证在所有位置上为了可靠的密封所需要的最小挤压力。然而，为了保证一种足够的密封，一种通用的、但是费事的并且成本昂贵的方案在于使用尺寸非常大的构件，通过这些构件可以施加一个足够高的转矩和一个相应的压紧力。
由DE-OS 394 502已知一种具有一个负压腔和一个设置在负压腔两侧的隔离阀的装置。该阀板具有一种长的、平行六面体的形状，其中所述阀板与相应的三个轴承体固定连接。在所述轴承体中穿过一个轴，所述轴本身与摇杆连接并且可被一个具有电机的齿条传动机构回转。所述阀板相对于围绕位置固定的轴承可运动的杠杆可倾翻地保持住，使得阀板的密封面可压向在负压腔的壳体上的密封面。但是已经表明，利用该已知的隔离阀不能达到对于密封性的最高要求，因为所需要的密封环在闭锁状态非常不均匀地受到负荷并且密封板或者说驱动轴在闭锁状态以非常大的程度弯曲。这个问题特别是当阀板具有一个过度的长宽比时出现，如其典型地在用于平坦的大面积基质的直列式设备中所需要的那样。
此外，由DE 4203 473 A1已知一种用于将基质一方面引入相邻的处理腔和/或从大气腔引入较小压力的腔中的转动闸门，所述转动闸门具有一个门状的、保持在一个位置固定的轴承中的阀板和一个与该阀板作用连接的关闭电机并且具有一个包括该闸门开口的框形的密封元件。所述阀板在一个大致平行于该阀板延伸的阀门条中通过至少一个可弹性变形的中间构件铰接，其中所述阀门条本身具有两个相互在直径方向上对置的主轴颈，该主轴颈不可转动地与设置在所述腔外的驱动电机耦联。所述阀门条是不易弯曲的型材。这种闸门的缺点是复杂的结构以及颗粒污物在排出时由于阀板的扭曲带来的困难。
由US 5379 984中已知一种具有一个阀体的隔离阀，一个长的并且窄的缝隙通过该阀体延伸。在所述缝隙的开口侧设置一个阀板，该阀板向着窄的密封接触面逐渐变细。设有一个可运动的密封元件来将一个展开的软管作为密封的膜片铺在所述接触面上。因为所述密封元件铰接在一个回转轴上，在该已知的阀门装置中困难的是保证沿着开口走向统一的压力。从而该隔离阀要经受在真空和大气压力之间的压力差，此时设置所述阀门，将大气压力借助于关闭力沿着阀舌门的闭合方向作用。
由US 6263542 B1已知一种用于真空腔的、具有一个回转支架的舌门装置。所述舌门体通过一个结构复杂的柔性的、例如弹性的连接件与所述回转支架脱耦。从而避免了密封件的不均匀的、导致泄漏的压力。
发明内容
本发明的任务是提供一种开头所述类型的闸门装置，借助于该闸门装置可以实现设置在壁体中的闸门开口简单且可靠的密封。
按照本发明，本发明的任务通过独立权利要求的特征解决。本发明优选的改进方案来自从属权利要求。
按照本发明，对于一种用于在一个第一和第二接受器之间的壁中设置的闸门开口的闸门装置，其具有一个设置在第一接受器的内腔中的闭锁机构和一个配属于该闭锁机构的配对板，一个第一磁体机构设置在配对板的一个区域中。一个配属于第一磁体机构的第二磁体机构设在闭锁机构的一个区域中。为了关闭和/或打开闸门开口，借助于第一和第二磁体机构在闭锁机构和配对板之间产生一个正的和/或负的压紧力。按照本发明，引起密封的压紧力基本局部在那些实行密封的位置起作用。因此，原理上传力构件、如在力产生位置和密封位置之间的一个轴或者类似物没有变形。因此，总起来说所述构件非常细长、优选以轻型结构的形式实施。这具有另外的优点，即只需要驱动小的质量并且因此可以实现一种非常动态的系统，该系统可以实现非常短的关闭或者打开时间。优选两个接受器是真空腔。
当至少其中一个磁体机构具有至少一个可控的励磁线圈来产生磁场时，可以以特别简单的形式产生或中断一个关闭力和/或打开力。
当磁体机构中的一个包括一个铁磁性的组件并且另一个磁体机构具有一个可控的励磁线圈来产生磁场的时候，可以实现一种特别成本经济的可控制性和一种简单且坚固的结构的组合。
为了保证一种无流动的闭锁状态，磁体机构中的一个包括一个第一永久磁体-组件，另一个磁体机构包括一个第二永久磁体-组件或者一个铁磁性的组件，并且所述磁体机构中的至少一个附加地具有一个可控的励磁线圈来借助于一个反向磁场来产生一个打开冲量(ffnungsimpuls)，此时也在可能的电压消失的时候实现闸门开口的可靠的关闭。
在使用按照本发明的闸门装置的时候可以提高灵活性，此时设计所述磁体机构，使得它们能够克服大气压力可靠地密封闭锁机构，即使大气压力与关闭方向相反地作用到闭锁机构上。特别优选的是磁性机构的设计，所述机构即使在无流动的闭锁状态中也保证这样的密封。
优选设有一个非均匀形状的闸门开口，该闸门开口特别具有一个适合于输送在基质载体上垂直悬挂的基质的闸门开口轮廓，由此可以实现在闸门开口和通过该开口可运动的部件之间的最小缝隙。这种实施方式减小了在具有不同的压力和/或气体混合物的相邻腔之间的所不希望的溢流效应。
当所述磁体机构沿着闸门开口的走向设置，使得闭锁机构在闸门开口的闭锁状态中是无扭转的时，由此沿着闸门开口的不同的压紧力以及因此不紧密性或者溢流可以基本上避免。
根据位置关系和其它的影响因素，一个借助于回转机构可定位的、可回转的舌门或者一个滑块机构用作闭锁机构是合适的，其中所述滑块机构可借助于一个线性的运动机构定位。回转机构或线性的运动机构可以引入和结束关闭或者打开运动，该关闭或者打开运动通常优选是自动化的和/或可控制的。
如本身已知的那样，为了密封在一个配对板和/或闭锁机构的区域中设有一个可变形的密封元件，优选一个圆线环。优选橡胶弹性的圆环，其可以可靠地、成本经济地并且容易地更换。
特别优选的是一种装置的实施方式，其中所述闭锁机构具有一个组件，其由一种铁磁性的板制成。
为了改善密封功能，有利的是，所述闭锁机构是具有较小弯曲刚性的板，使得通过闭锁机构在闭锁状态中的有目的的变形也在所参与的组件的大的制造公差的情况下保证一种可靠的密封。
附图说明
本发明其它的实施方式和优点也与其在权利要求中的概括无关地在下文中不受一般性限制地借助于附图说明。
以极其示意的形式示出：
图1是按照本发明的闸门装置的水平剖面图，
图2是按照本发明的闸门装置的垂直剖面图，
图3是连同沿着闸门开口走向设置的磁体机构的闸门开口的细节图。
具体实施方式
在图1和图2中分别示出按照本发明的闸门装置的一个水平剖面A-A以及垂直于A-A的垂直剖面，所述闸门装置用于一个在第一和第二接受器之间的壁体中设置的闸门开口。所述接受器是真空腔。一种该类的闸门装置有利地在所述的直列式系统中用于制造用于平面显示器的基质。典型的是，这种基质大约1mm厚，是矩形的并且具有1000×1200mm或者更大的尺寸。所述基质在所述直列式系统中悬挂地沿着一个线性的或者U形的路径通过多个真空腔来导引，所述真空腔通过闸门相互是可分离的。由于所述基质尺寸，所述典型的闸门开口的特征在于一个过度的长宽比。但是可以理解的是，所述按照本发明的闸门装置也可用于其它的闸门开口轮廓。按照本发明的闸门装置可以由薄壁的并且轻的构件制成并且因此特别适于隔离阀的高通过率和相应快速同步地进行的自动化的基质-处理，因为只需带动小的质量。
在图1中在一个第一真空腔VK1和一个第二真空腔VK2之间设置一个作为矩形缝隙构成的闸门开口，该闸门开口在这种情况下包括一个配属于真空腔VK1的第一缝隙区域7和一个配属于真空腔VK2的第二缝隙区域17。在真空腔VK1和VK2之间延伸一个壁，其由真空腔VK1的一个连接法兰1a和真空腔VK2的一个连接法兰9a形成，所述连接法兰1a和连接法兰9a分别与真空腔VK1或VK2的腔壁1或9相连。所述闸门开口可以通过一个设计成矩形的舌门3的闭锁机构与配对板3a共同作用地闭锁。所述闸门开口在由缝隙区域7形成的区域中由配对板3a包围。此外，所述配对板3a具有一个可变形的密封元件，优选一个橡胶弹性的圆线环，该圆线环在闭锁状态变形并且保证了压力可靠的密封。
在本发明的一种改进方案中，所述闭锁机构具有一个不同于矩形的形状，该形状优选对应于闸门开口轮廓。
所述舌门3设置在回转轴2上，该回转轴可通过一个回转接头13利用回转驱动机构12进行运动。
为了固定并且支承回转驱动机构或回转轴设有一个轴承支承架11和一个支架14。所述回转驱动机构12用于引入以及结束关闭运动和打开运动。作为回转驱动机构设有一个气动缸，其中显然也可使用液压或者电动的驱动机构。
按照本发明，在配对板3a的区域中设有一个具有可控的励磁线圈5，5’的第一磁体机构并且在闭锁机构的区域中设有一个配属于第一磁体机构的第二磁体机构6。该第二磁体机构6是一种铁磁性的板或者带状机构6，该带状机构设置在舌门3的背面。在激活励磁线圈5，5’时，在舌门3和线圈5，5’之间，也就是在闭锁机构和配对板3a之间产生一个压紧力。
显然在本发明中舌门3可以包括不同的结构方式，特别是所述舌门3由一种铁磁性的板、优选具有较小的弯曲刚性的铁磁性的板制成。板厚优选在0.5mm和10mm之间，特别优选在1mm和8mm之间。在使用一种铁磁性的板3时可以取消铁磁性的板6，因为所述舌门3本身是第二磁体机构。此外，一个可变形的密封元件可替代地或者可附加地也设置在板3上。
在图3中示出在打开舌门时一个闸门开口7连同沿着闸门开口的开口走向设置的磁体机构5，5’，5a的细节。所述闸门开口具有一个开口轮廓，该开口轮廓具有一个第一缝隙区域7a和一个第二缝隙区域7b，其中所述第一缝隙区域7a具有比第二缝隙区域7b更大的宽度。一个这样的闸门开口轮廓适合于输送在基质载体上垂直悬挂的基质。该磁体机构5，5’在两侧包括第二闸门开口区域7b。磁体机构5a由于位置原因设置在第一闸门开口区域7a的上方。可变形的密封元件4，优选一个圆线环包围所述闸门开口以及所述磁体机构5，5’和5a。显然本发明也包括密封元件的另一种走向。
在闭锁状态，磁体机构沿着闸门开口的走向布置，使得闭锁机构无扭转地并且以足够的压紧力压向密封元件4。
此外，这样设计所述磁体机构，使得可以实现由闭锁机构施加到密封元件上的压紧力的设定的值。
在本发明的一种改进方案中，可控的磁体机构是一个优选整体式的励磁线圈，该励磁线圈单个或者多个地包围沿着开口走向的闸门开口。
特别有利的是，励磁线圈的固定通过将合适的对真空有用的铸造材料浇铸在容纳线圈的构件的相应设置的空腔中来实现。为此可以例如使用如名为阿拉尔狄特的环氧树脂或者类似材料。
在本发明的一种优选的实施方式中，磁体机构中的一个包括一个永久磁体-组件。另一个磁体机构同样可以包括一个永久磁体-组件。从而可以实现闸门开口的一种无流动的闭锁状态。至少其中一个磁体机构在此包括一个可控的励磁线圈，通过该励磁线圈可以产生一个反向磁场。由此可以在闭锁机构和配对板之间产生一个打开冲量或一个负的压紧力。特别优选的是设计用于相对于大气压力可靠的、无流动的闭锁状态的永久磁体-机构，即使当大气压力反向于闭锁方向作用在闭锁机构上。
在本发明的另一种实施方式中，两个磁体机构包括一个永久磁体-组件，使得可以引起闸门开口的无流动的闭锁状态。此外设有一个驱动轴，通过该驱动轴可以引入和结束关闭和打开运动。在此，显然驱动轴上的转矩必须足以在打开运动时克服两个磁体机构的永久磁体之间的吸力。
在前述说明书中得出，两个接受器是真空腔，显然本发明包括这样的实施方式，其中所述闭锁机构设置于在一个接受器和一个具有长久聚集的大气压力的区域之间的分开位置上。
附图标记列表
VK1    真空腔1
VK2    真空腔2
1      真空腔1的腔壁
1a     真空腔1的连接法兰
2      转轴
3      舌门
3a     配对板
4      密封元件
5      励磁线圈
5’    励磁线圈
5a     励磁线圈
6      铁磁性的板/带
7      闸门开口
7a     闸门开口区域
7b     闸门开口区域
9      真空腔2的腔壁
9a     真空腔2的连接法兰
11     转轴的轴承支承架
12     转驱动机构
13     转接头
14     用于回转驱动机构的支架
17     闸门开口

Claims (12)

1.闸门装置，其用于在一个第一接受器和一个第二接受器之间的壁中设置的闸门开口，所述闸门装置具有一个设置在第一接受器的内腔中的闭锁机构和一个配属于该闭锁机构的配对板，其特征在于，在配对板的一个区域中设置一个第一磁体机构并且在一个闭锁机构的区域中设置一个配属于第一磁体机构的第二磁体机构，并且为了借助于所述第一和第二磁体机构来关闭和/或打开闸门开口，在闭锁机构和配对板之间可以产生一个正的和/或负的挤压力。
2.按权利要求1所述的装置，其特征在于，至少其中一个所述的磁体机构具有至少一个可控的励磁线圈来产生一个磁场。
3.按权利要求1或者2所述的装置，其特征在于，所述磁体机构中的一个具有一个铁磁性的组件，并且所述另一个磁体机构具有一个可控的励磁线圈来产生磁场。
4.按前述权利要求中至少一项所述的装置，其特征在于，为了保证闸门开口的无流动的闭锁，所述磁体机构中的一个包括一个第一永久磁体-组件，使得所述另一个磁体机构包括一个第二永久磁体-组件并且磁体机构中的至少一个具有一个可控的励磁线圈来借助于一个反向磁场来产生一个打开冲量。
5.按权利要求4所述的装置，其特征在于，设计所述磁体机构用于相对于大气压力的无流动的闭锁状态。
6.按前述权利要求中至少一项所述的装置，其特征在于，设有一个非均匀的闸门开口、优选具有一个适于输送在基质载体上垂直悬挂的基质的闸门开口轮廓。
7.按前述权利要求中至少一项所述的装置，其特征在于，所述磁体机构沿着闸门开口的走向设置，使得所述闭锁机构在闸门开口的闭锁状态中是无扭转的。
8.按前述权利要求中至少一项所述的装置，其特征在于，设有一个可优选借助于一个回转机构定位的舌门作为闭锁机构。
9.按前述权利要求1至8中至少一项所述的装置，其特征在于，设有一个可优选借助于一个线性运动机构定位的滑块机构作为闭锁机构，所述滑块机构具有一个滑板。
10.按前述权利要求中至少一项所述的装置，其特征在于，所述回转机构可液压地、气动地和/或机电地进行操作。
11.按权利要求9所述的装置，其特征在于，所述线性运动机构可液压地、气动地和/或机电地运行。
12.按前述权利要求中至少一项所述的装置，其特征在于，在配对板和/或闭锁机构的区域里设有一个可变形的密封元件，优选一个圆线环。
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Application publication date: 20070530