CN1962748B - 固化性树脂组合物及防反射膜 - Google Patents
固化性树脂组合物及防反射膜 Download PDFInfo
- Publication number
- CN1962748B CN1962748B CN200610144514XA CN200610144514A CN1962748B CN 1962748 B CN1962748 B CN 1962748B CN 200610144514X A CN200610144514X A CN 200610144514XA CN 200610144514 A CN200610144514 A CN 200610144514A CN 1962748 B CN1962748 B CN 1962748B
- Authority
- CN
- China
- Prior art keywords
- compound
- methyl
- resin composition
- curable resin
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
- C08L101/04—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing halogen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/10—Homopolymers or copolymers of methacrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
- C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2201/00—Properties
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005326009 | 2005-11-10 | ||
JP2005-326009 | 2005-11-10 | ||
JP2005326009 | 2005-11-10 | ||
JP2006049627 | 2006-02-27 | ||
JP2006049627 | 2006-02-27 | ||
JP2006-049627 | 2006-02-27 | ||
JP2006-273925 | 2006-10-05 | ||
JP2006273925 | 2006-10-05 | ||
JP2006273925A JP5045052B2 (ja) | 2005-11-10 | 2006-10-05 | 硬化性樹脂組成物及び反射防止膜 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1962748A CN1962748A (zh) | 2007-05-16 |
CN1962748B true CN1962748B (zh) | 2010-11-03 |
Family
ID=38273981
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200610144514XA Active CN1962748B (zh) | 2005-11-10 | 2006-11-08 | 固化性树脂组合物及防反射膜 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5045052B2 (de) |
KR (1) | KR101273688B1 (de) |
CN (1) | CN1962748B (de) |
TW (1) | TWI471376B (de) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4678399B2 (ja) * | 2006-12-01 | 2011-04-27 | Jsr株式会社 | 反射防止膜 |
JP2009143048A (ja) * | 2007-12-12 | 2009-07-02 | Tdk Corp | ハードコート層および光透過層を有する積層体およびその製造方法 |
JP5672661B2 (ja) * | 2008-04-25 | 2015-02-18 | 日立化成株式会社 | 樹脂組成物及びその硬化物を用いた光学部材 |
JP2009292898A (ja) * | 2008-06-03 | 2009-12-17 | Kaneka Corp | 硬化性組成物およびその硬化物 |
JP5441056B2 (ja) * | 2008-11-28 | 2014-03-12 | 日東電工株式会社 | ハードコート層形成用組成物、ハードコートフィルム、光学素子および画像表示装置 |
KR20130128469A (ko) | 2009-07-08 | 2013-11-26 | 닛토덴코 가부시키가이샤 | 투명 도전성 필름, 전자 기기 및 터치 패널 |
JP6128576B2 (ja) | 2011-04-22 | 2017-05-17 | 日東電工株式会社 | 光学積層体 |
JP2012234164A (ja) * | 2011-04-22 | 2012-11-29 | Nitto Denko Corp | 光学積層体 |
CN104245766A (zh) * | 2012-04-13 | 2014-12-24 | 横滨橡胶株式会社 | 光硬化性树脂组合物 |
JP5737466B1 (ja) * | 2013-08-02 | 2015-06-17 | ダイキン工業株式会社 | 重合性官能基及び架橋性官能基からなる群より選択される少なくとも1種の基を含有する含フッ素重合体を含む組成物及び塗装物品 |
CN104007618B (zh) * | 2014-06-18 | 2017-09-29 | 杭州福斯特应用材料股份有限公司 | 一种pcb用高粘附力感光干膜 |
US10471692B2 (en) * | 2015-08-06 | 2019-11-12 | Sharp Kabushiki Kaisha | Optical member and polymerizable composition for nanoimprinting |
CN106009021B (zh) * | 2016-05-18 | 2019-03-12 | 西南科技大学 | 一种适合塑料基材的减反射、防指纹涂覆膜的制备方法 |
WO2021230552A1 (ko) * | 2020-05-14 | 2021-11-18 | 삼성에스디아이 주식회사 | 경화형 수지 조성물, 그로부터 형성된 경화막, 및 상기 경화막을 갖는 전자 장치 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1608084A (zh) * | 2001-12-21 | 2005-04-20 | 捷时雅股份有限公司 | 含有乙烯性不饱和基团的含氟聚合物、以及使用它的固化性树脂组合物和防反射膜 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05279435A (ja) * | 1992-04-01 | 1993-10-26 | Asahi Glass Co Ltd | 活性エネルギー線硬化性組成物 |
JPH0729232A (ja) * | 1993-07-14 | 1995-01-31 | Kuraray Co Ltd | 光磁気記録媒体 |
JP3118389B2 (ja) * | 1995-02-28 | 2000-12-18 | 株式会社クラレ | 含水性眼用レンズ材料 |
JP3474330B2 (ja) * | 1995-10-03 | 2003-12-08 | Jsr株式会社 | 反応性シリカ粒子、その製法および用途 |
JP4271840B2 (ja) * | 1999-11-10 | 2009-06-03 | パナソニック株式会社 | 光ディスク |
JP2003185820A (ja) * | 2001-12-21 | 2003-07-03 | Jsr Corp | 感放射線性屈折率変化性組成物および屈折率変化法 |
JP4452909B2 (ja) * | 2003-03-27 | 2010-04-21 | Dic株式会社 | フッ素系界面活性剤 |
JP4213989B2 (ja) * | 2003-05-08 | 2009-01-28 | 富士フイルム株式会社 | 防眩性フィルムの製造方法 |
JP2005089536A (ja) * | 2003-09-12 | 2005-04-07 | Jsr Corp | 硬化性樹脂組成物及び反射防止膜 |
JP4784723B2 (ja) * | 2003-12-24 | 2011-10-05 | Tdk株式会社 | ハードコート剤組成物及びこれを用いた光情報媒体 |
JP2005186568A (ja) * | 2003-12-26 | 2005-07-14 | Fuji Photo Film Co Ltd | 反射防止フィルム、偏光板及び液晶表示装置 |
JP2005234476A (ja) * | 2004-02-23 | 2005-09-02 | Fuji Photo Film Co Ltd | 反射防止膜、反射防止フィルムおよび画像表示装置 |
JP2006036835A (ja) * | 2004-07-23 | 2006-02-09 | Jsr Corp | 硬化性樹脂組成物及び反射防止膜 |
-
2006
- 2006-10-05 JP JP2006273925A patent/JP5045052B2/ja active Active
- 2006-11-08 CN CN200610144514XA patent/CN1962748B/zh active Active
- 2006-11-09 KR KR1020060110365A patent/KR101273688B1/ko active IP Right Grant
- 2006-11-09 TW TW95141531A patent/TWI471376B/zh active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1608084A (zh) * | 2001-12-21 | 2005-04-20 | 捷时雅股份有限公司 | 含有乙烯性不饱和基团的含氟聚合物、以及使用它的固化性树脂组合物和防反射膜 |
Non-Patent Citations (2)
Title |
---|
JP特开2000-171603A 2000.06.23 |
JP特开2003-261797A 2003.09.19 |
Also Published As
Publication number | Publication date |
---|---|
KR101273688B1 (ko) | 2013-06-12 |
JP2007254706A (ja) | 2007-10-04 |
TWI471376B (zh) | 2015-02-01 |
KR20070050372A (ko) | 2007-05-15 |
JP5045052B2 (ja) | 2012-10-10 |
CN1962748A (zh) | 2007-05-16 |
TW200730576A (en) | 2007-08-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1962748B (zh) | 固化性树脂组合物及防反射膜 | |
TWI402281B (zh) | Radiation hardening resin composition and anti-reflection film | |
JP5433926B2 (ja) | 硬化性樹脂組成物及び反射防止膜 | |
TWI427116B (zh) | Hardened resin composition and antireflective film | |
CN101544764B (zh) | 具有聚二烷基聚硅氧烷基的化合物、含有其的固化性组合物及固化膜 | |
CN102381000B (zh) | 固化性组合物和防反射用层叠体 | |
JP2008019402A (ja) | 硬化性樹脂組成物及び反射防止膜 | |
JP5169236B2 (ja) | 硬化性樹脂組成物及び反射防止膜 | |
JP2008044979A (ja) | 硬化性樹脂組成物及び反射防止膜 | |
JP2009029979A (ja) | 硬化性樹脂組成物及び反射防止膜 | |
JP2006036835A (ja) | 硬化性樹脂組成物及び反射防止膜 | |
CN1922267B (zh) | 液状固化性树脂组合物及使用了它的叠层体的制造方法 | |
JP4301115B2 (ja) | 活性エネルギー線硬化性樹脂組成物及び反射防止膜 | |
JP2006097003A (ja) | 樹脂組成物及び反射防止膜 | |
CN100432140C (zh) | 液态固化性树脂组合物、固化膜及层叠体 | |
JP4899572B2 (ja) | 硬化性樹脂組成物及び反射防止膜 | |
CN102419515B (zh) | 聚硅氧烷组合物、聚硅氧烷组合物的制造方法、显示元件的固化膜及其形成方法 | |
CN102555387A (zh) | 硬涂层的形成方法 | |
JP2009163260A (ja) | 硬化性樹脂組成物及び反射防止膜 | |
JP2007327018A (ja) | 硬化性樹脂組成物及び反射防止膜 | |
JP5050435B2 (ja) | 積層体 | |
CN102463723A (zh) | 层积膜 | |
WO2006137365A1 (ja) | 硬化性樹脂組成物及び反射防止膜 | |
JP2007262127A (ja) | 硬化性樹脂組成物及び反射防止膜 | |
JP2009209328A (ja) | 硬化性組成物、硬化膜及び硬化膜の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20180129 Address after: Osaka Patentee after: Arakawa Chemical Industries, Ltd. Address before: Tokyo, Japan Patentee before: JSR Corp. |