CN1920962A - 磁记录介质及其制造方法 - Google Patents
磁记录介质及其制造方法 Download PDFInfo
- Publication number
- CN1920962A CN1920962A CNA2006101160003A CN200610116000A CN1920962A CN 1920962 A CN1920962 A CN 1920962A CN A2006101160003 A CNA2006101160003 A CN A2006101160003A CN 200610116000 A CN200610116000 A CN 200610116000A CN 1920962 A CN1920962 A CN 1920962A
- Authority
- CN
- China
- Prior art keywords
- magnetic recording
- recording media
- lubricant
- magnetic
- manufacture method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8408—Processes or apparatus specially adapted for manufacturing record carriers protecting the magnetic layer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
Abstract
Description
Claims (6)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005239901 | 2005-08-22 | ||
JP2005239901A JP4534906B2 (ja) | 2005-08-22 | 2005-08-22 | 磁気記録媒体およびその製造方法 |
JP2005-239901 | 2005-08-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1920962A true CN1920962A (zh) | 2007-02-28 |
CN1920962B CN1920962B (zh) | 2011-04-13 |
Family
ID=37767649
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2006101160003A Expired - Fee Related CN1920962B (zh) | 2005-08-22 | 2006-08-22 | 磁记录介质及其制造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20070042228A1 (zh) |
JP (1) | JP4534906B2 (zh) |
CN (1) | CN1920962B (zh) |
MY (1) | MY145232A (zh) |
SG (1) | SG130096A1 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102754153A (zh) * | 2010-02-08 | 2012-10-24 | 昭和电工株式会社 | 磁记录介质的制造装置 |
CN112201281A (zh) * | 2016-08-10 | 2021-01-08 | 昭和电工株式会社 | 含氟醚化合物、磁记录介质用润滑剂及磁记录介质 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010092531A (ja) | 2008-10-07 | 2010-04-22 | Hitachi Global Storage Technologies Netherlands Bv | 磁気ディスクの製造方法およびクリーニング装置 |
US20100104742A1 (en) * | 2008-10-24 | 2010-04-29 | Hitachi Global Storage Technologies Netherlands Bv | System, method and apparatus for a neat state lubricant blend having improved processibility without diminishing performance of magnetic recording media |
JP5336151B2 (ja) * | 2008-10-31 | 2013-11-06 | キヤノンアネルバ株式会社 | 薄膜形成装置及び磁気記録媒体の製造方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0638964B2 (ja) * | 1985-12-28 | 1994-05-25 | 古河アルミニウム工業株式会社 | メモリデイスク用基板の製造方法 |
JPS62293515A (ja) * | 1986-06-12 | 1987-12-21 | Mitsubishi Electric Corp | 磁気デイスクの製造方法 |
JPH01166328A (ja) * | 1987-12-23 | 1989-06-30 | Hitachi Ltd | 拭取装置 |
JPH0445862A (ja) * | 1990-06-11 | 1992-02-14 | Mitsubishi Electric Corp | 潤滑剤塗布装置 |
JPH04125811A (ja) * | 1990-09-17 | 1992-04-27 | Mitsubishi Electric Corp | 磁気記録媒体及びその製造方法 |
JP2936915B2 (ja) * | 1992-09-30 | 1999-08-23 | 三菱化学株式会社 | ディスク支持体及び磁気記録媒体への潤滑剤の塗布方法 |
JPH0752019A (ja) * | 1993-08-10 | 1995-02-28 | Fuji Photo Film Co Ltd | 研磨テープを用いた清浄方法 |
JPH11203670A (ja) * | 1997-12-29 | 1999-07-30 | Sony Corp | 磁気記録媒体の製造方法 |
WO2001001403A1 (fr) * | 1999-06-24 | 2001-01-04 | Fujitsu Limited | Procede de production d'un support d'enregistrement magnetique et support d'enregistrement magnetique ainsi obtenu |
KR20030043747A (ko) * | 2001-11-28 | 2003-06-02 | 후지 샤신 필름 가부시기가이샤 | 자기전사용 마스터 담체 및 자기전사방법 |
JP4238341B2 (ja) * | 2003-04-23 | 2009-03-18 | 富士電機デバイステクノロジー株式会社 | 磁気記録媒体の製造方法および製造装置 |
JP4593128B2 (ja) * | 2004-02-26 | 2010-12-08 | Tdk株式会社 | 磁気記録媒体及び磁気記録再生装置 |
-
2005
- 2005-08-22 JP JP2005239901A patent/JP4534906B2/ja not_active Expired - Fee Related
-
2006
- 2006-07-17 SG SG200604757-5A patent/SG130096A1/en unknown
- 2006-08-10 MY MYPI20063878A patent/MY145232A/en unknown
- 2006-08-22 CN CN2006101160003A patent/CN1920962B/zh not_active Expired - Fee Related
- 2006-08-22 US US11/466,285 patent/US20070042228A1/en not_active Abandoned
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102754153A (zh) * | 2010-02-08 | 2012-10-24 | 昭和电工株式会社 | 磁记录介质的制造装置 |
CN102754153B (zh) * | 2010-02-08 | 2015-10-21 | 昭和电工株式会社 | 磁记录介质的制造装置 |
CN112201281A (zh) * | 2016-08-10 | 2021-01-08 | 昭和电工株式会社 | 含氟醚化合物、磁记录介质用润滑剂及磁记录介质 |
CN112201281B (zh) * | 2016-08-10 | 2022-03-18 | 昭和电工株式会社 | 含氟醚化合物、磁记录介质用润滑剂及磁记录介质 |
Also Published As
Publication number | Publication date |
---|---|
MY145232A (en) | 2012-01-13 |
SG130096A1 (en) | 2007-03-20 |
CN1920962B (zh) | 2011-04-13 |
US20070042228A1 (en) | 2007-02-22 |
JP4534906B2 (ja) | 2010-09-01 |
JP2007058935A (ja) | 2007-03-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
ASS | Succession or assignment of patent right |
Owner name: FUJI ELECTRIC & ELECTRONICS CO., LTD. Free format text: FORMER OWNER: FUJI ELECTRIC HOLDINGS Effective date: 20080801 |
|
C10 | Entry into substantive examination | ||
C41 | Transfer of patent application or patent right or utility model | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20080801 Address after: Tokyo, Japan, Japan Applicant after: Fuji Electronic Device Technol Address before: Kawasaki Applicant before: Fuji Electric Co., Ltd. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: FUJI ELECTRIC CO., LTD. Free format text: FORMER NAME: FUJI ELECTRONIC DEVICE TECHNOL |
|
CP03 | "change of name, title or address" |
Address after: Japan's Kawasaki City Patentee after: Fuji Electric Co., Ltd. Address before: Tokyo, Japan, Japan Patentee before: Fuji Electronic Device Technol |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110413 Termination date: 20150822 |
|
EXPY | Termination of patent right or utility model |