CN1886442B - 表膜及新的含氟聚合物 - Google Patents

表膜及新的含氟聚合物 Download PDF

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Publication number
CN1886442B
CN1886442B CN2004800352397A CN200480035239A CN1886442B CN 1886442 B CN1886442 B CN 1886442B CN 2004800352397 A CN2004800352397 A CN 2004800352397A CN 200480035239 A CN200480035239 A CN 200480035239A CN 1886442 B CN1886442 B CN 1886442B
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CN
China
Prior art keywords
polymer
compound
unit
carbonatoms
pellicle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2004800352397A
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English (en)
Chinese (zh)
Other versions
CN1886442A (zh
Inventor
松仓郁生
山本弘贤
石桥雄一郎
冈田伸治
代田直子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of CN1886442A publication Critical patent/CN1886442A/zh
Application granted granted Critical
Publication of CN1886442B publication Critical patent/CN1886442B/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
    • C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
    • C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/22—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
    • C08G65/223—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring containing halogens
    • C08G65/226—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring containing halogens containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J171/00—Adhesives based on polyethers obtained by reactions forming an ether link in the main chain; Adhesives based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24322—Composite web or sheet
    • Y10T428/24331—Composite web or sheet including nonapertured component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Polyethers (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Graft Or Block Polymers (AREA)
CN2004800352397A 2003-12-03 2004-12-02 表膜及新的含氟聚合物 Expired - Fee Related CN1886442B (zh)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP404403/2003 2003-12-03
JP2003404403 2003-12-03
JP120237/2004 2004-04-15
JP2004120237 2004-04-15
JP2004225707 2004-08-02
JP225707/2004 2004-08-02
PCT/JP2004/017965 WO2005054336A1 (ja) 2003-12-03 2004-12-02 ペリクルおよび新規な含フッ素重合体

Publications (2)

Publication Number Publication Date
CN1886442A CN1886442A (zh) 2006-12-27
CN1886442B true CN1886442B (zh) 2010-09-08

Family

ID=34657738

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2004800352397A Expired - Fee Related CN1886442B (zh) 2003-12-03 2004-12-02 表膜及新的含氟聚合物

Country Status (9)

Country Link
US (1) US7790811B2 (https=)
EP (1) EP1690883B1 (https=)
JP (1) JP4415942B2 (https=)
KR (1) KR101141570B1 (https=)
CN (1) CN1886442B (https=)
AT (1) ATE438675T1 (https=)
DE (1) DE602004022451D1 (https=)
TW (1) TW200530300A (https=)
WO (1) WO2005054336A1 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101946295B (zh) 2008-02-22 2012-11-28 旭硝子株式会社 驻极体及静电感应型转换元件
JP5311331B2 (ja) * 2008-06-25 2013-10-09 ルネサスエレクトロニクス株式会社 液浸リソグラフィの現像処理方法および該現像処理方法を用いた電子デバイス
JP2011113033A (ja) * 2009-11-30 2011-06-09 Shin-Etsu Chemical Co Ltd ペリクル膜の製造方法および装置
KR20140042813A (ko) * 2011-07-29 2014-04-07 아사히 가라스 가부시키가이샤 리소그래피용 펠리클, 펠리클이 부착된 포토마스크 및 노광 처리 방법
US9958771B2 (en) * 2016-06-23 2018-05-01 Rave Llc Method and apparatus for pellicle removal
WO2018163442A1 (ja) * 2017-03-10 2018-09-13 Dic株式会社 含フッ素アセトフェノン誘導体、フッ素系添加剤及びこれを含有する硬化性組成物とその硬化物
KR101952871B1 (ko) 2017-04-13 2019-02-28 삼성전기주식회사 적층 세라믹 커패시터 및 그의 실장 기판
JP6863123B2 (ja) * 2017-06-21 2021-04-21 Dic株式会社 反射防止塗料組成物及び反射防止フィルム
CN112310302A (zh) * 2019-07-30 2021-02-02 陕西坤同半导体科技有限公司 一种有机发光器件

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4594399A (en) * 1981-09-28 1986-06-10 E. I. Du Pont De Nemours And Company Cyclic monomers derived from trifluoropyruvate esters, amended to polymers and polymer films from dioxoles
JP2951337B2 (ja) 1989-04-17 1999-09-20 古河電気工業株式会社 ペリクル
JP2952962B2 (ja) 1989-05-31 1999-09-27 旭硝子株式会社 汚染防止保護器具
JP3029323B2 (ja) 1990-06-01 2000-04-04 旭硝子株式会社 コーティング用含フッ素重合体組成物およびその用途
DE69111699T2 (de) 1990-06-01 1996-04-18 Asahi Glass Co Ltd Fluoropolymer-Überzugszusammensetzung und damit beschichteter Gegenstand.
JP3005040B2 (ja) 1990-11-22 2000-01-31 旭硝子株式会社 コーティング用樹脂組成物
JP3292534B2 (ja) 1993-01-27 2002-06-17 旭硝子株式会社 基材の被覆方法
JP4106723B2 (ja) * 1998-01-27 2008-06-25 旭硝子株式会社 反射防止フィルタ用コーティング組成物
JP3879279B2 (ja) 1998-06-15 2007-02-07 旭硝子株式会社 サイズ排除クロマトグラフ法
US6770404B1 (en) 1999-11-17 2004-08-03 E. I. Du Pont De Nemours And Company Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses
EP1238310A1 (en) 1999-11-17 2002-09-11 E.I. Du Pont De Nemours And Company Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses
US6824930B1 (en) 1999-11-17 2004-11-30 E. I. Du Pont De Nemours And Company Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses
JP4185233B2 (ja) 2000-03-10 2008-11-26 信越化学工業株式会社 リソグラフィー用ペリクル
US6548129B2 (en) 2000-03-15 2003-04-15 Asahi Glass Company, Limited Pellicle
JP2001330943A (ja) * 2000-03-15 2001-11-30 Asahi Glass Co Ltd ペリクル
DE60140679D1 (de) * 2000-08-30 2010-01-14 Asahi Glass Co Ltd Verfahren zur herstellung von fluorierten ketonen
AU2002221128A1 (en) * 2000-12-13 2002-06-24 Asahi Glass Company, Limited Process for producing product of decomposition of fluorinated ester compound
WO2002093261A1 (en) * 2001-05-14 2002-11-21 E.I. Du Pont De Nemours And Company Use of partially fluorinated polymers in applications requiring transparency in the ultraviolet and vacuum ultraviolet
AU2003257654A1 (en) 2002-08-21 2004-03-11 Asahi Glass Company, Limited Ultraviolet-permeable fluoropolymers and pellicles made by using the same
JP2004085713A (ja) 2002-08-23 2004-03-18 Asahi Glass Co Ltd ペリクル
JP4396525B2 (ja) * 2003-03-28 2010-01-13 旭硝子株式会社 含フッ素化合物および含フッ素重合体

Also Published As

Publication number Publication date
ATE438675T1 (de) 2009-08-15
CN1886442A (zh) 2006-12-27
EP1690883A4 (en) 2007-05-02
JPWO2005054336A1 (ja) 2007-06-28
DE602004022451D1 (de) 2009-09-17
KR20060123242A (ko) 2006-12-01
TWI359825B (https=) 2012-03-11
US7790811B2 (en) 2010-09-07
KR101141570B1 (ko) 2012-05-03
US20060240222A1 (en) 2006-10-26
WO2005054336A1 (ja) 2005-06-16
JP4415942B2 (ja) 2010-02-17
EP1690883B1 (en) 2009-08-05
TW200530300A (en) 2005-09-16
EP1690883A1 (en) 2006-08-16

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CP01 Change in the name or title of a patent holder

Address after: Tokyo, Japan

Patentee after: ASAHI GLASS Co.,Ltd.

Address before: Tokyo, Japan

Patentee before: ASAHI GLASS Co.,Ltd.

CP01 Change in the name or title of a patent holder
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20100908

CF01 Termination of patent right due to non-payment of annual fee