CN1840997A - Substrate treatment device - Google Patents
Substrate treatment device Download PDFInfo
- Publication number
- CN1840997A CN1840997A CNA2006100714929A CN200610071492A CN1840997A CN 1840997 A CN1840997 A CN 1840997A CN A2006100714929 A CNA2006100714929 A CN A2006100714929A CN 200610071492 A CN200610071492 A CN 200610071492A CN 1840997 A CN1840997 A CN 1840997A
- Authority
- CN
- China
- Prior art keywords
- substrate
- mentioned
- air knife
- process chamber
- jet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
Abstract
Description
Claims (6)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005097719 | 2005-03-30 | ||
JP2005097719A JP4494269B2 (en) | 2005-03-30 | 2005-03-30 | Substrate processing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1840997A true CN1840997A (en) | 2006-10-04 |
CN100440446C CN100440446C (en) | 2008-12-03 |
Family
ID=37030120
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2006100714929A Expired - Fee Related CN100440446C (en) | 2005-03-30 | 2006-03-29 | Substrate treatment device |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4494269B2 (en) |
KR (1) | KR100770503B1 (en) |
CN (1) | CN100440446C (en) |
TW (1) | TWI285136B (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101697665B (en) * | 2009-11-06 | 2011-04-06 | 深南电路有限公司 | Hot air levelling machine for processing circuit board |
CN102909205A (en) * | 2011-08-05 | 2013-02-06 | 睿纳有限责任公司 | Exhaust air system and method therefor |
CN103851887A (en) * | 2012-12-07 | 2014-06-11 | 深南电路有限公司 | PCB (printed circuit board) drying machine |
CN104442037A (en) * | 2014-11-29 | 2015-03-25 | 河南国花彩印包装有限公司 | Closed type dust removal device for printing press |
CN106925568A (en) * | 2017-05-16 | 2017-07-07 | 捷开通讯(深圳)有限公司 | Dust automatic clearing apparatus and board separator |
CN107144120A (en) * | 2017-05-19 | 2017-09-08 | 惠科股份有限公司 | Display panel drying device |
WO2017193653A1 (en) * | 2016-05-09 | 2017-11-16 | 京东方科技集团股份有限公司 | Substrate processing equipment |
CN107388785A (en) * | 2017-07-28 | 2017-11-24 | 武汉华星光电技术有限公司 | Substrate hot drying equipment |
CN108074835A (en) * | 2016-11-09 | 2018-05-25 | 盟立自动化股份有限公司 | Wet process device |
CN109427630A (en) * | 2017-09-05 | 2019-03-05 | 夏普株式会社 | Substrate board treatment |
CN110779320A (en) * | 2019-09-17 | 2020-02-11 | 苏州晶洲装备科技有限公司 | Novel air-dry system and OLED substrate stripping equipment with same |
CN112868090A (en) * | 2019-09-12 | 2021-05-28 | 铠侠股份有限公司 | Substrate processing apparatus |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4730286B2 (en) * | 2006-11-24 | 2011-07-20 | トヨタ自動車株式会社 | Foreign matter removing apparatus and foreign matter removing method |
KR101043830B1 (en) * | 2008-11-12 | 2011-06-22 | 주식회사 엘지실트론 | Equipment for manufacturing semiconductor device |
KR200452969Y1 (en) * | 2008-12-29 | 2011-04-04 | 주식회사 케이씨텍 | Dryer for large-area substrate |
CN102679696A (en) * | 2011-03-14 | 2012-09-19 | 无锡康力电子有限公司 | Drying device for cleaned ultrathin glass |
JP6259372B2 (en) * | 2014-07-31 | 2018-01-10 | AvanStrate株式会社 | Glass substrate manufacturing method and glass substrate manufacturing apparatus |
JP6209572B2 (en) * | 2015-01-28 | 2017-10-04 | 芝浦メカトロニクス株式会社 | Substrate processing equipment |
CN107008695A (en) * | 2016-01-28 | 2017-08-04 | 深圳长城开发科技股份有限公司 | Dust arrester |
CN107065433B (en) * | 2017-05-08 | 2021-01-26 | 京东方科技集团股份有限公司 | Drying device |
JP7055839B2 (en) * | 2020-06-25 | 2022-04-18 | 芝浦メカトロニクス株式会社 | Board processing equipment |
JP7031831B1 (en) | 2021-03-16 | 2022-03-08 | 株式会社アルフテクノ | Drying equipment |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05296572A (en) * | 1992-04-24 | 1993-11-09 | Nippon Upro Kk | Silencer structure for hot water supplying apparatus |
JP3526692B2 (en) * | 1995-07-21 | 2004-05-17 | 大日本スクリーン製造株式会社 | Substrate drainer |
JPH11354487A (en) * | 1998-06-03 | 1999-12-24 | Dainippon Screen Mfg Co Ltd | Method and equipment for drying substrate |
JP2000252254A (en) * | 1999-02-26 | 2000-09-14 | Dainippon Screen Mfg Co Ltd | Substrate processing equipment |
JP2002022359A (en) * | 2000-07-07 | 2002-01-23 | Matsushita Electric Ind Co Ltd | Substrate dryer |
JP2002130756A (en) * | 2000-10-24 | 2002-05-09 | Yoshinosuke Tabata | Ventilation fan |
JP2003017457A (en) * | 2001-07-03 | 2003-01-17 | Dainippon Screen Mfg Co Ltd | Method and apparatus for cleaning substrate |
KR100432053B1 (en) * | 2001-07-05 | 2004-05-17 | (주)케이.씨.텍 | Drying Apparatus |
JP3754905B2 (en) * | 2001-09-10 | 2006-03-15 | 東京エレクトロン株式会社 | Substrate dryer |
KR100904278B1 (en) * | 2001-11-12 | 2009-06-25 | 도쿄엘렉트론가부시키가이샤 | Substrate processing apparatus |
JP3865717B2 (en) * | 2003-06-27 | 2007-01-10 | 東京応化工業株式会社 | Substrate drying apparatus and substrate drying method |
KR100527789B1 (en) * | 2003-07-08 | 2005-11-09 | 태화일렉트론(주) | Air knife structure of a drier for LCD panel |
JP2005071632A (en) * | 2003-08-25 | 2005-03-17 | Fujitsu Hitachi Plasma Display Ltd | Method and device for manufacturing plasma display panel |
JP4152871B2 (en) * | 2003-12-03 | 2008-09-17 | 東京エレクトロン株式会社 | Nozzle and substrate processing apparatus |
-
2005
- 2005-03-30 JP JP2005097719A patent/JP4494269B2/en not_active Expired - Fee Related
-
2006
- 2006-03-03 TW TW095107164A patent/TWI285136B/en not_active IP Right Cessation
- 2006-03-29 CN CNB2006100714929A patent/CN100440446C/en not_active Expired - Fee Related
- 2006-03-29 KR KR1020060028426A patent/KR100770503B1/en not_active IP Right Cessation
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101697665B (en) * | 2009-11-06 | 2011-04-06 | 深南电路有限公司 | Hot air levelling machine for processing circuit board |
CN102909205A (en) * | 2011-08-05 | 2013-02-06 | 睿纳有限责任公司 | Exhaust air system and method therefor |
CN103851887A (en) * | 2012-12-07 | 2014-06-11 | 深南电路有限公司 | PCB (printed circuit board) drying machine |
CN103851887B (en) * | 2012-12-07 | 2016-01-27 | 深南电路有限公司 | PCB drying machine |
CN104442037A (en) * | 2014-11-29 | 2015-03-25 | 河南国花彩印包装有限公司 | Closed type dust removal device for printing press |
WO2017193653A1 (en) * | 2016-05-09 | 2017-11-16 | 京东方科技集团股份有限公司 | Substrate processing equipment |
CN108074835A (en) * | 2016-11-09 | 2018-05-25 | 盟立自动化股份有限公司 | Wet process device |
CN106925568A (en) * | 2017-05-16 | 2017-07-07 | 捷开通讯(深圳)有限公司 | Dust automatic clearing apparatus and board separator |
CN106925568B (en) * | 2017-05-16 | 2019-12-06 | 捷开通讯(深圳)有限公司 | Automatic dust removing device and plate separator |
CN107144120A (en) * | 2017-05-19 | 2017-09-08 | 惠科股份有限公司 | Display panel drying device |
CN107144120B (en) * | 2017-05-19 | 2019-06-28 | 惠科股份有限公司 | Display panel drying device |
CN107388785A (en) * | 2017-07-28 | 2017-11-24 | 武汉华星光电技术有限公司 | Substrate hot drying equipment |
CN109427630A (en) * | 2017-09-05 | 2019-03-05 | 夏普株式会社 | Substrate board treatment |
CN112868090A (en) * | 2019-09-12 | 2021-05-28 | 铠侠股份有限公司 | Substrate processing apparatus |
CN110779320A (en) * | 2019-09-17 | 2020-02-11 | 苏州晶洲装备科技有限公司 | Novel air-dry system and OLED substrate stripping equipment with same |
Also Published As
Publication number | Publication date |
---|---|
KR20060106754A (en) | 2006-10-12 |
JP2006278859A (en) | 2006-10-12 |
TW200637666A (en) | 2006-11-01 |
CN100440446C (en) | 2008-12-03 |
KR100770503B1 (en) | 2007-10-25 |
TWI285136B (en) | 2007-08-11 |
JP4494269B2 (en) | 2010-06-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: DAINIPPON SCREEN MFG. CO., LTD. Free format text: FORMER NAME: DAINIPPON MESH PLATE MFR. CO., LTD. Owner name: SCREEN GROUP CO., LTD. Free format text: FORMER NAME: DAINIPPON SCREEN MFG. CO., LTD. |
|
CP01 | Change in the name or title of a patent holder |
Address after: Kyoto Japan Patentee after: Skilling Group Address before: Kyoto Japan Patentee before: DAINIPPON SCREEN MFG Co.,Ltd. Address after: Kyoto Japan Patentee after: DAINIPPON SCREEN MFG Co.,Ltd. Address before: Kyoto Japan Patentee before: Dainippon Screen Mfg. Co.,Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20081203 Termination date: 20180329 |
|
CF01 | Termination of patent right due to non-payment of annual fee |