JP2003282525A - Substrate treatment device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a device which can prevent mist occurring by removing liquid from a substrate and can prevent the occurrence of turbulence in a treatment chamber and which can efficiently remove the mist which occurs by removing liquid from the substrate and liquid in a discharge route of the mist. <P>SOLUTION: The device is provided with an air knife 26 for spraying gas to the substrate 1 transported by transport rollers 18 in an oblique direction and blowing liquid from above the substrate, a mist guide member 40 having a guide slope 42 which faces an air knife and guides mist obliquely backward, an exhaust casing 28 which faces the air knife, whose front face is opened and which includes the mist guide member, an exhaust pipe which is channel- connected to the exhaust casing and a drainage means discharging liquid separated from gas by the collision of the mist to the inner wall face of the exhaust casing. <P>COPYRIGHT: (C)2004,JPO

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a glass substrate for a flat panel display (FPD), a semiconductor wafer,
A substrate drying device that blows a gas onto the substrate while transporting the substrate such as a printed circuit board and blows off a liquid such as a cleaning liquid adhering to the substrate to dry the substrate, or a gas mixed with droplets onto the substrate. The present invention relates to a substrate processing apparatus such as a substrate cleaning apparatus for removing minute foreign matter attached to a substrate.

[0002]

2. Description of the Related Art In manufacturing processes for FPDs, semiconductor devices, printed wiring boards, etc., glass substrates for FPDs,
As one of the methods of drying a substrate such as a semiconductor wafer or a printed circuit board with a cleaning liquid such as pure water, the substrate is transported and gas is blown to the substrate to blow away the cleaning liquid attached to the substrate to dry the substrate. There is a transport type drying method.

For example, in Japanese Unexamined Patent Publication No. 11-204490, a plurality of transfer rollers are arranged in parallel inside a processing chamber, and the transfer rollers transport the substrates horizontally in the middle of the transfer path. An apparatus for arranging an air knife so as to intersect the substrate transport direction, blowing a gas such as air from the air knife to the transported substrate, and blowing away the cleaning liquid adhering to the substrate to remove the liquid from the substrate. It is disclosed.

In the apparatus having such a structure, in order to completely remove the liquid droplets attached to the surface of the substrate, it is necessary to forcefully blow out a large amount of gas from the slit-shaped opening of the air knife. Therefore, there is a problem that a large amount of gas blown out from the air knife causes a positive pressure in the processing chamber, and the mist generated by the liquid being blown off from the substrate leaks from the processing chamber. Also, the gas blown vigorously from the air knife to the surface of the substrate hits the inner wall surface of the processing chamber, causing turbulence inside the processing chamber and causing mist to scatter.
There is a problem that the scattered mist redeposits on the surface of the substrate after drying, which may cause defects in the product. Therefore, in order to solve these problems, by sucking the atmospheric gas inside the processing chamber from the exhaust port at the lower part thereof, while introducing clean air into the processing chamber from the upper part of the processing chamber through a Hepa (HEPA) filter, The inside of the processing chamber is kept in a negative pressure state, and a downward airflow is generated inside the processing chamber.

Further, in Japanese Patent Laid-Open No. 2000-232087, a gas is blown onto the surface of the substrate from an air knife fixed near the surface of the substrate while transporting the substrate,
A substrate drying device that removes the droplets adhering to the surface of the substrate by sucking in the mist generated by the gas blown from the air knife to the surface of the substrate with the intake ducts provided on both sides of the air knife. It is disclosed.

[0006]

However, in the apparatus having the configuration disclosed in Japanese Patent Laid-Open No. 11-204490, when the substrate is passing through the inside of the processing chamber, the downward air flow inside the processing chamber causes the substrate to flow downward. As a result, the air cannot be efficiently drawn from the exhaust port at the bottom of the processing chamber. Therefore, it is not possible to completely eliminate the problem that the mist generated when the liquid is removed from the substrate leaks from the processing chamber.
Further, in order to effectively remove the liquid droplets from the substrate by the gas blown from the air knife, the air knife is inclined at a predetermined angle with respect to the substrate and the air knife is directed toward the substrate in the direction opposite to the substrate transport direction. It is necessary to blow the gas with the air, but this causes a part of the gas blown from the air knife to directly collide with the inner wall surface of the processing chamber, which causes turbulence inside the processing chamber. It cannot be completely eliminated.

Further, in the apparatus having the configuration disclosed in Japanese Unexamined Patent Publication No. 2000-232087, in order to completely suck a large amount of gas blown from the air knife to the substrate by the duct together with the mist, the exhaust amount of the duct must be reduced. It needs to be large and still may not completely eliminate the mist from the perimeter of the substrate. Further, when the mist collides with the inner wall surface of the duct, the liquid separated from the gas may flow back along the inner wall surface of the duct.

Further, such inconvenience is not limited to the substrate drying apparatus using the air knife, and, for example, substrate cleaning in which a mixture of droplets of cleaning liquid and gas is sprayed onto the substrate by a so-called two-fluid nozzle to clean the substrate. The same may occur in the device.

The present invention has been made in view of the above circumstances, and it is possible to prevent the generated mist from leaking from the inside of the processing chamber or to cause a turbulent flow inside the processing chamber, and at the same time, to generate it. An object of the present invention is to provide a substrate processing apparatus capable of efficiently removing the mist and the liquid in the mist discharge path.

[0010]

The invention according to claim 1 is
A substrate carrying means for carrying the substrate to which the liquid adheres, and a gas jetting means for blowing gas onto the substrate carried by the substrate carrying means and blowing out the liquid adhering to the substrate to remove it from the substrate are provided. In a substrate processing apparatus, a front end is disposed in the vicinity of a transfer surface of the substrate, and a mist guide having a guide slope for guiding the mist of the liquid blown off from the substrate obliquely rearward by the gas blown from the gas ejection means to the substrate A member, an exhaust housing having a front surface opened and containing the mist guide member, for discharging the gas blown from the gas jetting means to the substrate, and an exhaust pipe connected to the exhaust housing through a flow path. Is further provided.

According to a second aspect of the present invention, in the substrate processing apparatus according to the first aspect, the mist of the liquid blown off from the substrate collides with the inner wall surface of the exhaust housing to be separated from the gas, and the exhaust housing is separated. It is characterized by further comprising drainage means for draining the liquid accumulated inside the body.

According to a third aspect of the present invention, in the substrate processing apparatus according to the first or second aspect, the gas jetting direction is inclined so that the gas jetting means jets the gas obliquely to the surface of the substrate. The exhaust housing is provided along the surface of the substrate, in front of the gas ejection means in the gas blowing direction, and the front opening of the exhaust housing is provided so as to face the gas ejection means. It is characterized by

According to a fourth aspect of the present invention, in the substrate processing apparatus according to any one of the first to third aspects, the gas jetting means is an air knife for jetting gas from a slit-shaped opening elongated in one direction. Also, the front opening of the exhaust housing is also formed to be long in one direction, and the air knife is arranged such that the gas spraying direction intersects the surface of the substrate at a predetermined angle with respect to the upstream direction of the transport direction of the substrate. The exhaust housing is provided such that its front opening is substantially parallel to the slit-shaped opening of the air knife.

According to a fifth aspect of the present invention, there is provided a substrate carrying means for carrying the substrate, and a gas jetting means for blowing a gas mixed with the liquid into droplets onto the substrate carried by the substrate carrying means. In the substrate processing apparatus, the front end is arranged in the vicinity of the transfer surface of the substrate, and the mist guide has a guide slope that guides the mist of the liquid droplets mixed in the gas sprayed from the gas ejection means to the substrate obliquely rearward. Members,
An exhaust housing for opening the front surface and enclosing the mist guide member, for discharging the droplets and the gas sprayed from the gas ejection means, and an exhaust pipe connected to the exhaust housing by a flow path. It is further characterized by being equipped.

According to a sixth aspect of the present invention, in the substrate processing apparatus according to the fifth aspect, the mist of the liquid droplets mixed in the gas sprayed on the substrate collides with the inner wall surface of the exhaust housing, so that the gas is discharged. It is characterized by further comprising draining means for draining the liquid that is separated from the above and is collected inside the exhaust housing.

According to a seventh aspect of the present invention, in the substrate processing apparatus according to the fifth or sixth aspect, the gas jetting means is provided so as to blow the droplets and the gas substantially perpendicularly to the surface of the substrate. The exhaust casings are provided on the upstream side and the downstream side of the substrate in the transport direction with the gas ejecting unit interposed therebetween.

According to an eighth aspect of the present invention, in the substrate processing apparatus according to any one of the fifth to seventh aspects, the gas jetting means is a two-fluid nozzle for jetting gas mixed with droplets from an opening. A plurality of nozzles are arranged in a long line in one direction, and a front opening of the exhaust housing is also formed long in one direction.

The invention according to claim 9 is the substrate processing apparatus according to any one of claims 1 to 8, wherein the mist guide member has a wedge shape.

In the substrate processing apparatus of the first aspect of the present invention, the gas ejected from the gas ejecting means onto the substrate conveyed by the substrate conveying means blows off the liquid adhering to the substrate so that the liquid is adhered onto the substrate. To be removed. At this time, the mist generated by the liquid being blown from the substrate is guided obliquely rearward along the guide slope of the mist guide member whose front end is arranged in the vicinity of the transfer surface of the substrate, and the mist guide member is guided. It is introduced into the enclosed exhaust housing. Further, the gas blown from the gas ejection means onto the substrate flows into the exhaust housing through the front opening of the exhaust housing.
Then, the mist and the gas are discharged from the inside of the exhaust housing through the exhaust pipe.

In the substrate processing apparatus of the invention according to claim 2,
When the mist introduced into the exhaust housing collides with the inner wall surface of the exhaust housing to separate the liquid from the gas and collect the liquid inside the exhaust housing, the liquid is discharged by the draining means.

In the substrate processing apparatus of the invention according to claim 3,
Gas is blown obliquely to the surface of the substrate by the gas jetting means, the liquid adhering to the substrate is effectively blown off, and the blown mist is exhausted in front of the gas jetting direction of the gas jetting means. From the front opening of the housing, it effectively flows into the exhaust housing and is discharged.

In the substrate processing apparatus of the invention according to claim 4,
An air knife consisting of a slit-shaped opening that is long in one direction,
An exhaust housing having a front opening that is long in one direction is disposed substantially parallel to the air knife so that the gas blowing direction intersects the surface of the substrate at a predetermined angle with respect to the upstream direction of the transport direction of the substrate. Therefore, the liquid adhering to the entire substrate can be effectively removed.

In the substrate processing apparatus of the invention according to claim 5,
The mixed gas, which is a liquid droplet, is sprayed onto the substrate transported by the substrate transporting unit from the gas jetting unit to clean the substrate. At this time, the mist of the droplets mixed in the blown gas is guided obliquely rearward along the guide slope of the mist guide member whose front end is disposed in the vicinity of the transfer surface of the substrate, and the mist guide member is provided. Is introduced into the exhaust housing that contains the. Further, the gas blown from the gas jetting means onto the substrate is discharged from the inside of the exhaust housing through the exhaust pipe.

In the substrate processing apparatus of the invention according to claim 6,
When the mist introduced into the exhaust housing collides with the inner wall surface of the exhaust housing and is separated from the gas to collect the liquid inside the exhaust housing, the liquid is discharged by the draining means.

In the substrate processing apparatus of the invention according to claim 7,
The gas jetting means blows the droplets and the gas substantially perpendicularly to the surface of the substrate to effectively clean the substrate, and the generated mist is sandwiched between the gas jetting means to the upstream side and the downstream side in the substrate transport direction. It is effectively discharged by the provided exhaust housing.

In the substrate processing apparatus of the invention according to claim 8,
A plurality of two-fluid nozzles for ejecting gas mixed with droplets in a spot shape, which is a nozzle group formed by arranging long in one direction,
Since the opening of the exhaust housing is also elongated in one direction, the entire substrate can be processed, and the generated mist is effectively exhausted as a whole.

In the substrate processing apparatus of the invention according to claim 9,
The wedge-shaped mist guide member allows the mist to be efficiently discharged from the vicinity of the substrate surface, and the mist to be completely removed from the periphery of the substrate.

[0028]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to FIGS.

1 to 4 show a substrate drying apparatus which is a substrate processing apparatus as an example of an embodiment of the present invention,
FIG. 1 is a side sectional view showing a schematic configuration of a substrate drying device together with a part of a cleaning tank, FIG. 2 is a plan view showing a main part of the substrate drying device, and FIG. 3 is an arrow in FIG. It is the front view seen from the direction shown by A, and FIG. 4 is the front sectional view which expanded a part of substrate drying apparatus.

This substrate drying apparatus has a suction opening 1 at the bottom.
2 includes a processing chamber 10 having a port 2 and a loading port 14 and a loading port 16. Inside the processing chamber 10, a plurality of transport rollers 18 are arranged in parallel. A cleaning processing tank 20 is installed adjacent to the processing chamber 10 on the side of the carry-in port 14 of the processing chamber 10. A plurality of transfer rollers 22 are arranged in parallel inside the cleaning treatment tank 20, and the transfer path of the substrate 1 horizontally transferred by the transfer rollers 22 is sandwiched between the upper and lower sides of the transfer path. A plurality of water jet nozzles 24 for spraying a cleaning liquid, for example, pure water, are provided on each of the upper and lower surfaces of the nozzle 1. Then, the substrate 1 is transferred from the cleaning treatment tank 20 to the carry-in port 1
4 is carried in into the processing chamber 10, is supported by the carrying roller 18, is carried in the horizontal direction, and is carried out from the inside of the processing chamber 10 through the carry-out port 16.

Further, inside the processing chamber 10, air knives 26 for blowing a gas, for example, air, to the substrate 1 are provided on both upper and lower sides of the substrate 1 with the transfer path interposed therebetween. The air knife 26 is provided with a slit-shaped opening that is long in a direction substantially perpendicular to the paper surface (to be exact, slightly tilted as described later) in FIG. Is slightly inclined as will be described later). The slit-shaped openings formed on the tip surface of the air knife 26 are close to the upper and lower surfaces of the substrate 1, respectively, and
As shown in FIG. 1, the air knife 26 itself has a surface perpendicular to the substrate 1 so that the gas ejected from the slit-shaped openings is blown obliquely to the upstream side in the substrate transport direction with respect to the surface of the substrate 1. Is fixed so as to be tilted to the downstream side in the substrate transport direction. Also, the air knife 26
As shown in FIG. 2, the gas is blown on the surface of the substrate so as to intersect with the upstream direction (indicated by arrow A) of the substrate in the transport direction at a predetermined angle. The predetermined angle is, for example, about 3 ° to 45 °. And
The air blown from the air knife 26 is obliquely blown to the substrate 1 in the direction opposite to the substrate transport direction, and the cleaning liquid (pure water) attached to the substrate 1 is blown off by the air and removed from the substrate 1. It is supposed to be done.
The gas blown from the air knife 26 to the substrate 1 may be nitrogen gas or the like, and an air brush may be provided instead of the air knife 26, or a gas containing vapor of water-soluble alcohol may be blown out. May be.

Further, inside the processing chamber 10, on the rear (upstream) side in the substrate transport direction facing the air knife 26, exhaust chambers 28 are provided on both upper and lower sides of the transport path of the substrate 1 in between. Each is arranged. Exhaust housing 28
2 is provided substantially parallel to the corresponding air knife 26 in plan view as shown in FIG.
(In FIGS. 3 and 4, the exhaust housing 28 is shown only on the upper surface side of the substrate 1.
Of the exhaust casing 28 disposed on the upper surface side of the substrate 1), the bottom surface thereof is fixed in proximity to the transfer surface of the substrate 1, and the lower portion of the front surface facing the air knife 26 is opened to open the air inlet. It is 30. The exhaust housing 28 has an exhaust passage 32 that extends obliquely rearward and upward from the air inlet 30, and the upper portion of the exhaust passage 32 is connected to an exhaust pipe 34. An exhaust port 36 is formed at one end of the exhaust tube 34, and an exhaust pipe 38 is connected to and connected to the exhaust port 36.

A mist guide member 40 is disposed on the inner bottom of the exhaust housing 28 so as to face the air knife 26 and its front end to be close to the substrate transfer surface. The mist guide member 40 has a wedge shape having a guide slope 42 having a lower front end and a higher rear end. Further, at the inner bottom portion of the exhaust casing 28, the drain gutter 4 is provided on the rear side of the mist guide member 40.
4 are provided. The bottom surface of the drain gutter 44 is inclined from one end to the other end. Although not shown, the exhaust casing 28 disposed on the lower surface side of the substrate 1 does not include the drain gutter on the rear side of the mist guide member 40, and may include, for example, the exhaust passage 32 and the exhaust pipe 34. Are placed in the communication position. Further, a drain port 46 is formed on the lower side surface of the exhaust housing 28 on the side where the bottom face of the drain gutter 44 is the lowest, and a drain pipe 48 communicates with the drain port 46. It is connected. Although not shown, the drainage pipe 48 is connected to a collection tank through a flow path, and the pure water collected in the collection tank is sent by a pump to, for example, a water jet nozzle 24 installed inside the cleaning treatment tank 20. Be reused.

The front end of the mist guide member 40 and the substrate 1
In order to adjust the distance from the transfer surface of the substrate, for example, height adjusting eccentric pins 50 can be provided on both the left and right sides of the substrate transfer path as shown by the chain double-dashed line in FIG. Also,
A pure water discharge nozzle 52 may be installed on the rear side of the exhaust housing 28 in the substrate transport direction, and a liquid curtain 54 of pure water may suppress diffusion of mist.

In the substrate drying apparatus having the above-mentioned structure, air is blown obliquely from the air knife 26 onto the substrate 1 carried into the processing chamber 10 from the cleaning processing tank 20 and carried by the carrying roller 18. To be As a result, the pure water attached to the substrate 1 is blown off and removed from the substrate 1. At this time, the air knife 2
The air blown from 6 onto the substrate 1 is the air knife 2
6 flows in through the air inlet 30 into the exhaust housing 28 installed in the vicinity of 6 in opposition thereto. The mist generated by the pure water being blown off from the substrate 1 also flows into the exhaust housing 28 and is guided obliquely rearward along the guide slope 42 of the mist guide member 40. Then, the mist and the air pass through the exhaust passage 32 of the exhaust casing 28 and the exhaust passage 3
2 into the exhaust stack 34, and the exhaust port 3
6, flows into the exhaust pipe 38 through the exhaust port 36, and is discharged through the exhaust pipe 38.

When the mist introduced into the exhaust casing 28 collides with the inner wall surface of the rear side of the exhaust casing 28 to separate pure water from the air, the pure water is removed.
It flows down the inner wall surface of the tank to the inner bottom portion and flows into the drainage gutter 44. The pure water flows through the drainage trough 44 toward the drainage port 46, flows into the drainage pipe 48 through the drainage port 46, is discharged through the drainage pipe 48, and is collected.

FIG. 5 is a side sectional view showing a schematic structure of a substrate cleaning apparatus which is a substrate processing apparatus as a second example of the embodiment of the present invention. In addition, about the member which is the same as or corresponds to the substrate processing apparatus of the above-mentioned embodiment, the same code | symbol is attached to those members and the description is abbreviate | omitted.

In this substrate cleaning apparatus, as a means for cleaning the substrate, gas jetting means for spraying a mixture of droplets of a cleaning liquid as a liquid and a gas onto the substrate 1 transported by the transport roller 18 is used. Here, a so-called two-fluid nozzle 60 is used which mixes a liquid and a gas to make the liquid into fine liquid droplets (mist). The two-fluid nozzle 60 ejects a gas mixed with liquid droplets from a small opening into, for example, a conical shape or a fan shape. The shape may be oval, rectangular, or rectangular. The two-fluid nozzle 60 is used as the second cleaning tank for the processing chamber 10.
5, a plurality of nozzle groups are formed at predetermined intervals in the length direction of a nozzle pipe 62 extending in the direction perpendicular to the paper surface of FIG. 5, and droplets and gas ejected from the nozzle group are formed. It is configured such that the mixture of (1) acts on the entire width direction of the substrate 1. Then, the two-fluid nozzle 60 is provided so as to eject the mixture of the droplet and the gas in the direction perpendicular to the substrate 1. The mixture sprayed from the two-fluid nozzle 60 and sprayed on the substrate 1 wash away and removes fine foreign matter on the surface of the substrate 1. The exhaust housing 28 is provided on both the upstream side and the downstream side of the two-fluid nozzle 62 in the substrate transport direction. This is because the mixture of droplets and gas is sprayed almost perpendicularly to the substrate 1, so that the mixture that collides with the substrate 1 flows both upstream and downstream. Note that, in FIG. 5, the transport roller 22 is not drawn in a portion where the exhaust casing 28 and the like in the processing chamber 10 are arranged,
A transport roller that holds and transports the substrate 1 is also provided in a portion where the exhaust housing 28 and the like are drawn.

In this embodiment, the mist of the liquid droplets mixed in the blown gas is guided along the guide slope of the mist guide member 40 whose front end is arranged in the vicinity of the transfer surface of the substrate 1. It is guided obliquely rearward, introduced into the exhaust housing 28, and discharged through the exhaust pipe 38. Further, when the mist introduced into the exhaust housing 28 collides with the inner wall surface of the exhaust housing 28 and is separated from the gas to collect the liquid in the exhaust housing 28, the liquid is collected in the drain gutter 44. Is discharged. In this embodiment, as the cleaning liquid, ultrapure water, electrolytic ion water, or the like can be used.

[0040]

By using the substrate processing apparatus of each of the first and fifth aspects of the present invention, it is possible to prevent the generated mist from leaking from the inside of the processing chamber or causing turbulence inside the processing chamber. The generated mist can be efficiently removed.

In the substrate processing apparatus of each of the second and sixth aspects of the present invention, the liquid in the mist discharge path can be further efficiently discharged.

In the substrate processing apparatus of the invention according to claim 3,
The liquid adhering to the substrate can be effectively removed, and the blown mist can be effectively flowed into the exhaust housing and discharged.

In the substrate processing apparatus of the invention according to claim 4,
The liquid attached to the entire substrate can also be effectively removed.

In the substrate processing apparatus of the invention according to claim 7,
The substrate can be effectively cleaned, and the generated mist can be effectively discharged by the exhaust casing.

In the substrate processing apparatus of the invention according to claim 8,
The whole substrate can be treated and the generated mist can be effectively discharged.

In the substrate processing apparatus of the invention according to claim 9,
The mist can be efficiently separated from the surface of the substrate to completely eliminate the mist from the periphery of the substrate.

[Brief description of drawings]

FIG. 1 is a side sectional view showing a first example of an embodiment of the present invention and showing a schematic configuration of a substrate drying apparatus together with a part of a cleaning tank.

FIG. 2 is a plan view showing a main part of the substrate drying apparatus shown in FIG.

3 is a front view seen from the direction indicated by arrow A in FIG.

FIG. 4 is an enlarged front sectional view of a part of the substrate drying apparatus shown in FIG.

FIG. 5 is a side sectional view showing a second example of the embodiment of the present invention and showing a schematic configuration of a substrate cleaning apparatus.

[Explanation of symbols]

1 substrate 10 Processing chamber 18,22 Transport rollers 20 Cleaning tank 24 Water jet nozzle 26 Air knife 28 exhaust housing 30 Air inlet 32 exhaust passage 34 Exhaust stack 36 Exhaust port 38 Exhaust pipe 40 Mist guide member 42 Guide slope of mist guide member 44 drainage gutter 46 Drainage port 48 drainage pipe 60 two-fluid nozzle

Claims (9)

[Claims] 1. A substrate carrying means for carrying a substrate to which a liquid adheres, and a gas jetting means for blowing gas onto the substrate carried by the substrate carrying means to blow away the liquid adhering to the substrate and remove it from the substrate. In the substrate processing apparatus having the above, the front end is disposed in the vicinity of the transfer surface of the substrate, and guides the mist of the liquid blown off from the substrate obliquely backward by the gas blown to the substrate from the gas ejection means. A mist guide member having an inclined surface, an exhaust housing for opening the front surface and enclosing the mist guide member, for discharging the gas blown from the gas jetting means to the substrate, and a flow path connection to the exhaust housing. And a controlled exhaust pipe. 2. A drainage means is further provided for discharging the liquid separated from the gas by the mist of the liquid blown off from the substrate colliding with the inner wall surface of the exhaust housing and accumulating inside the exhaust housing. The substrate processing apparatus according to claim 1, wherein: 3. The gas ejection means is provided so that the gas ejection direction is inclined so that the gas is ejected obliquely to the surface of the substrate, and the exhaust housing ejects the gas along the surface of the substrate. 3. The substrate processing apparatus according to claim 1, wherein the substrate processing apparatus is provided in front of the means in a gas blowing direction and is provided so that a front opening of the exhaust housing faces the gas ejection means. 4. The gas ejecting means is an air knife that ejects gas from a slit-shaped opening that is long in one direction, and the front opening of the exhaust housing is also formed to be long in one direction. The blowing direction is arranged on the surface of the substrate so as to intersect with the upstream direction of the substrate transport direction at a predetermined angle, and the exhaust housing has a front opening that is substantially parallel to the slit-shaped opening of the air knife. The substrate processing apparatus according to any one of claims 1 to 3, wherein the substrate processing apparatus is provided. 5. A substrate processing apparatus comprising: a substrate carrying means for carrying a substrate; and a gas jetting means for blowing a gas mixed with liquid into droplets onto the substrate carried by the substrate carrying means, A mist guide member having a front end disposed in the vicinity of the transfer surface of the substrate and having a guide slope for guiding the mist of the liquid droplets mixed in the gas sprayed from the gas ejection means to the substrate obliquely rearward, and the front face being open And an exhaust casing for enclosing the mist guide member to discharge the droplets and the gas sprayed from the gas jetting means, and an exhaust pipe connected to the exhaust casing by a flow path. A substrate processing apparatus characterized by the above. 6. A drainage for discharging a liquid that is separated from the gas and is accumulated inside the exhaust housing when a mist of liquid droplets mixed in the gas sprayed on the substrate collides with the inner wall surface of the exhaust housing. The substrate processing apparatus according to claim 5, further comprising means. 7. The gas jetting means is provided so as to blow the droplets and the gas substantially perpendicularly to the surface of the substrate, and the exhaust casing is located upstream of the substrate jetting direction with the gas jetting means interposed therebetween. 7. The substrate processing apparatus according to claim 5, wherein the substrate processing apparatus is provided on the side of the substrate and on the downstream side. 8. The gas ejecting means is a nozzle group formed by arranging a plurality of two-fluid nozzles for ejecting a gas mixed with liquid droplets from an opening in a long line in one direction, and the front opening of the exhaust housing is also formed. The substrate processing apparatus according to claim 5, wherein the substrate processing apparatus is formed to be long in one direction. 9. The substrate processing apparatus according to claim 1, wherein the mist guide member has a wedge shape.